JPH0141962B2 - - Google Patents

Info

Publication number
JPH0141962B2
JPH0141962B2 JP54117844A JP11784479A JPH0141962B2 JP H0141962 B2 JPH0141962 B2 JP H0141962B2 JP 54117844 A JP54117844 A JP 54117844A JP 11784479 A JP11784479 A JP 11784479A JP H0141962 B2 JPH0141962 B2 JP H0141962B2
Authority
JP
Japan
Prior art keywords
pattern
light
object surface
light beam
predetermined
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54117844A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5642205A (en
Inventor
Toshio Matsura
Kyoichi Suwa
Shoichi Tanimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP11784479A priority Critical patent/JPS5642205A/ja
Publication of JPS5642205A publication Critical patent/JPS5642205A/ja
Publication of JPH0141962B2 publication Critical patent/JPH0141962B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Automatic Focus Adjustment (AREA)
JP11784479A 1979-09-17 1979-09-17 Focus detecting method Granted JPS5642205A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11784479A JPS5642205A (en) 1979-09-17 1979-09-17 Focus detecting method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11784479A JPS5642205A (en) 1979-09-17 1979-09-17 Focus detecting method

Publications (2)

Publication Number Publication Date
JPS5642205A JPS5642205A (en) 1981-04-20
JPH0141962B2 true JPH0141962B2 (enrdf_load_stackoverflow) 1989-09-08

Family

ID=14721663

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11784479A Granted JPS5642205A (en) 1979-09-17 1979-09-17 Focus detecting method

Country Status (1)

Country Link
JP (1) JPS5642205A (enrdf_load_stackoverflow)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4650983A (en) * 1983-11-07 1987-03-17 Nippon Kogaku K. K. Focusing apparatus for projection optical system
JPH0652708B2 (ja) * 1984-11-01 1994-07-06 株式会社ニコン 投影光学装置
JPS61183928A (ja) * 1985-02-12 1986-08-16 Nippon Kogaku Kk <Nikon> 投影光学装置
JPS61287229A (ja) * 1985-06-14 1986-12-17 Nippon Kogaku Kk <Nikon> 露光装置、及び該露光装置を用いた回路パターン製造方法
US5162642A (en) * 1985-11-18 1992-11-10 Canon Kabushiki Kaisha Device for detecting the position of a surface
JPH07113548B2 (ja) * 1986-06-19 1995-12-06 株式会社ニコン 表面変位検出装置
US4748333A (en) * 1986-03-31 1988-05-31 Nippon Kogaku K. K. Surface displacement sensor with opening angle control
US4864123A (en) * 1987-05-08 1989-09-05 Nikon Corporation Apparatus for detecting the level of an object surface
JPH0732118B2 (ja) * 1990-11-28 1995-04-10 松下電器産業株式会社 合焦装置
JP3158446B2 (ja) * 1990-12-13 2001-04-23 株式会社ニコン 表面位置検出装置及び表面位置検出方法、並びに露光装置、露光方法及び半導体製造方法
US5488230A (en) * 1992-07-15 1996-01-30 Nikon Corporation Double-beam light source apparatus, position detecting apparatus and aligning apparatus
US5559582A (en) * 1992-08-28 1996-09-24 Nikon Corporation Exposure apparatus
US5602399A (en) * 1993-06-23 1997-02-11 Nikon Corporation Surface position detecting apparatus and method
US6034780A (en) * 1997-03-28 2000-03-07 Nikon Corporation Surface position detection apparatus and method
US6768124B2 (en) 1999-10-19 2004-07-27 Nikon Corporation Reticle-focus detector, and charged-particle-beam microlithography apparatus and methods comprising same
JP2001296105A (ja) 2000-04-12 2001-10-26 Nikon Corp 面位置検出装置、並びに該検出装置を用いた露光装置および露光方法
JP2002194302A (ja) * 2000-12-27 2002-07-10 Nitto Denko Corp 粘着剤式鑑識用シート
JP4737617B2 (ja) * 2006-01-05 2011-08-03 日東電工株式会社 鑑識用粘着シートおよびその製造方法、ならびに痕跡採取方法
JP4737618B2 (ja) * 2006-01-10 2011-08-03 日東電工株式会社 鑑識用粘着シート
CN103365099B (zh) * 2012-03-31 2015-02-11 上海微电子装备有限公司 一种调焦调平信号处理方法
CN109426093B (zh) * 2017-08-31 2020-12-11 上海微电子装备（集团）股份有限公司 一种调焦调平检测装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51131648A (en) * 1975-05-13 1976-11-16 Seiko Instr & Electronics Ltd Optical height measuring apparatus
JPS522547A (en) * 1975-06-24 1977-01-10 Toshiba Corp Optical method to measure displacement of plane
JPS5232324A (en) * 1975-09-08 1977-03-11 Nippon Kogaku Kk <Nikon> Photoelectric detecting device for in or out of focus in the optical s ystem
JPS5267323A (en) * 1975-12-02 1977-06-03 Nippon Chemical Ind Device for photoelectrically detecting propriety of focus in optical system
JPS6029161B2 (ja) * 1976-10-12 1985-07-09 ユリアン・ボリソヴイチ・アイゼンベルグ 照明装置

Also Published As

Publication number Publication date
JPS5642205A (en) 1981-04-20

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