JPH0135342B2 - - Google Patents

Info

Publication number
JPH0135342B2
JPH0135342B2 JP21984585A JP21984585A JPH0135342B2 JP H0135342 B2 JPH0135342 B2 JP H0135342B2 JP 21984585 A JP21984585 A JP 21984585A JP 21984585 A JP21984585 A JP 21984585A JP H0135342 B2 JPH0135342 B2 JP H0135342B2
Authority
JP
Japan
Prior art keywords
mask
ion beam
white defect
gas gun
white
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP21984585A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6279465A (ja
Inventor
Mitsuyoshi Sato
Yoshitomo Nakagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP60219845A priority Critical patent/JPS6279465A/ja
Publication of JPS6279465A publication Critical patent/JPS6279465A/ja
Publication of JPH0135342B2 publication Critical patent/JPH0135342B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G03F1/74—Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60219845A 1985-10-02 1985-10-02 マスク白色欠陥修正方法 Granted JPS6279465A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60219845A JPS6279465A (ja) 1985-10-02 1985-10-02 マスク白色欠陥修正方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60219845A JPS6279465A (ja) 1985-10-02 1985-10-02 マスク白色欠陥修正方法

Publications (2)

Publication Number Publication Date
JPS6279465A JPS6279465A (ja) 1987-04-11
JPH0135342B2 true JPH0135342B2 (enExample) 1989-07-25

Family

ID=16741960

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60219845A Granted JPS6279465A (ja) 1985-10-02 1985-10-02 マスク白色欠陥修正方法

Country Status (1)

Country Link
JP (1) JPS6279465A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2522992B2 (ja) * 1988-07-06 1996-08-07 セイコー電子工業株式会社 集束イオンビ―ム装置
US6225627B1 (en) * 1998-03-06 2001-05-01 Seiko Instruments Inc. Focused ion beam system
US6368753B1 (en) * 1999-08-27 2002-04-09 Agere Systems Guardian Corp. Mask repair

Also Published As

Publication number Publication date
JPS6279465A (ja) 1987-04-11

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