JPS6279465A - マスク白色欠陥修正方法 - Google Patents

マスク白色欠陥修正方法

Info

Publication number
JPS6279465A
JPS6279465A JP60219845A JP21984585A JPS6279465A JP S6279465 A JPS6279465 A JP S6279465A JP 60219845 A JP60219845 A JP 60219845A JP 21984585 A JP21984585 A JP 21984585A JP S6279465 A JPS6279465 A JP S6279465A
Authority
JP
Japan
Prior art keywords
mask
ion beam
white defect
nozzle
defect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60219845A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0135342B2 (enExample
Inventor
Mitsuyoshi Sato
佐藤　光義
Yoshitomo Nakagawa
良知 中川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments and Electronics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments and Electronics Ltd filed Critical Seiko Instruments and Electronics Ltd
Priority to JP60219845A priority Critical patent/JPS6279465A/ja
Publication of JPS6279465A publication Critical patent/JPS6279465A/ja
Publication of JPH0135342B2 publication Critical patent/JPH0135342B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G03F1/74—Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60219845A 1985-10-02 1985-10-02 マスク白色欠陥修正方法 Granted JPS6279465A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60219845A JPS6279465A (ja) 1985-10-02 1985-10-02 マスク白色欠陥修正方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60219845A JPS6279465A (ja) 1985-10-02 1985-10-02 マスク白色欠陥修正方法

Publications (2)

Publication Number Publication Date
JPS6279465A true JPS6279465A (ja) 1987-04-11
JPH0135342B2 JPH0135342B2 (enExample) 1989-07-25

Family

ID=16741960

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60219845A Granted JPS6279465A (ja) 1985-10-02 1985-10-02 マスク白色欠陥修正方法

Country Status (1)

Country Link
JP (1) JPS6279465A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0218561A (ja) * 1988-07-06 1990-01-22 Seiko Instr Inc 集束イオンビーム装置
EP1079273A3 (en) * 1999-08-27 2001-05-02 Lucent Technologies Inc. Mask repair
KR100700408B1 (ko) * 1998-03-06 2007-03-27 에스아이아이 나노 테크놀로지 가부시키가이샤 집속 이온 빔 시스템

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0218561A (ja) * 1988-07-06 1990-01-22 Seiko Instr Inc 集束イオンビーム装置
KR100700408B1 (ko) * 1998-03-06 2007-03-27 에스아이아이 나노 테크놀로지 가부시키가이샤 집속 이온 빔 시스템
EP1079273A3 (en) * 1999-08-27 2001-05-02 Lucent Technologies Inc. Mask repair
US6368753B1 (en) * 1999-08-27 2002-04-09 Agere Systems Guardian Corp. Mask repair

Also Published As

Publication number Publication date
JPH0135342B2 (enExample) 1989-07-25

Similar Documents

Publication Publication Date Title
JP4730875B2 (ja) 近接堆積方法とそのシステム
JPH07122484A (ja) 電子線描画装置のパターン修正装置におけるパターン修正方法
JPH01257351A (ja) 配線形成方法
US6525317B1 (en) Reduction of charging effect and carbon deposition caused by electron beam devices
JPH0135342B2 (enExample)
JP3739573B2 (ja) フォトマスクの欠陥修正方法及びそれに用いる装置
JP2543680B2 (ja) マスクリペア装置
TWI869729B (zh) 用於檢查及/或處理微影物件的方法和裝置、以及包括指令的電腦程式
JP2939906B1 (ja) イオンビーム加工装置
JPS6352429B2 (enExample)
JPS61123841A (ja) イオンビ−ムマスクリペア−装置
JPH0320831Y2 (enExample)
JPH10241618A (ja) 荷電ビームによる観察，加工方法及びその装置
JP3849498B2 (ja) ステンシルマスクの欠陥修正装置およびステンシルマスクの欠陥修正方法
EP0571727A1 (en) Apparatus and method for focussed ion beam deposition by controlling beam parameters
JPS6136928A (ja) 真空装置
JP3908530B2 (ja) フォトマスクの白欠陥修正方法
JPH0135340B2 (enExample)
JPH0573052B2 (enExample)
JPS59169133A (ja) パタ−ン修正装置
JPS63236251A (ja) 電子ビ−ム−イオンビ−ム複合装置
JPS61183470A (ja) 電子ビ−ムデポジシヨン装置
JPH0315068A (ja) パターン修正方法
JPS6242156A (ja) マスクリペア装置
JP2799861B2 (ja) パターン膜修正方法

Legal Events

Date Code Title Description
S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term