JPH0135075B2 - - Google Patents
Info
- Publication number
- JPH0135075B2 JPH0135075B2 JP15094681A JP15094681A JPH0135075B2 JP H0135075 B2 JPH0135075 B2 JP H0135075B2 JP 15094681 A JP15094681 A JP 15094681A JP 15094681 A JP15094681 A JP 15094681A JP H0135075 B2 JPH0135075 B2 JP H0135075B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- electrode
- cylindrical
- drum
- photosensitive layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5093—Coaxial electrodes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Photoreceptors In Electrophotography (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15094681A JPS5852471A (ja) | 1981-09-24 | 1981-09-24 | 電子写真用感光体の製造装置 |
US06/387,221 US4438188A (en) | 1981-06-15 | 1982-06-10 | Method for producing photosensitive film for electrophotography |
DE3222491A DE3222491A1 (de) | 1981-06-15 | 1982-06-15 | Verfahren und vorrichtung zur herstellung eines lichtempfindlichen films auf einem substrat fuer elektrofotographie |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15094681A JPS5852471A (ja) | 1981-09-24 | 1981-09-24 | 電子写真用感光体の製造装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5852471A JPS5852471A (ja) | 1983-03-28 |
JPH0135075B2 true JPH0135075B2 (enrdf_load_stackoverflow) | 1989-07-24 |
Family
ID=15507867
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15094681A Granted JPS5852471A (ja) | 1981-06-15 | 1981-09-24 | 電子写真用感光体の製造装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5852471A (enrdf_load_stackoverflow) |
-
1981
- 1981-09-24 JP JP15094681A patent/JPS5852471A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5852471A (ja) | 1983-03-28 |