JPH01321664A - 樹脂封止型半導体装置 - Google Patents
樹脂封止型半導体装置Info
- Publication number
- JPH01321664A JPH01321664A JP63156101A JP15610188A JPH01321664A JP H01321664 A JPH01321664 A JP H01321664A JP 63156101 A JP63156101 A JP 63156101A JP 15610188 A JP15610188 A JP 15610188A JP H01321664 A JPH01321664 A JP H01321664A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- resin
- faces
- metal
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 36
- 229920005989 resin Polymers 0.000 title abstract description 18
- 239000011347 resin Substances 0.000 title abstract description 18
- 229910052751 metal Inorganic materials 0.000 claims abstract description 14
- 239000002184 metal Substances 0.000 claims abstract description 14
- 239000003822 epoxy resin Substances 0.000 abstract description 3
- 229920000647 polyepoxide Polymers 0.000 abstract description 3
- 239000011248 coating agent Substances 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 abstract description 2
- 238000000034 method Methods 0.000 abstract description 2
- WQJQOUPTWCFRMM-UHFFFAOYSA-N tungsten disilicide Chemical compound [Si]#[W]#[Si] WQJQOUPTWCFRMM-UHFFFAOYSA-N 0.000 abstract description 2
- 229910021342 tungsten silicide Inorganic materials 0.000 abstract description 2
- 229910008938 W—Si Inorganic materials 0.000 abstract 1
- 238000000465 moulding Methods 0.000 abstract 1
- 230000002829 reductive effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 8
- 238000007789 sealing Methods 0.000 description 7
- 230000006866 deterioration Effects 0.000 description 3
- 230000035939 shock Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
Classifications
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- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/04042—Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
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- Engineering & Computer Science (AREA)
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Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
め要約のデータは記録されません。
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は樹脂封止型半導体装置に関する。
従来から、半導体装置は安価で、しかも量産性に適して
いることから樹脂封止型が主流となっていた。
いることから樹脂封止型が主流となっていた。
第3図は従来の樹脂封止型半導体装置の一例の断面図で
ある。
ある。
樹脂封止型半導体装置は、アイランド8の表面にA、ペ
ースト9で固着された半導体チップ1と、その表面の周
縁上に設けられたAeパッド2にボンディングワイヤの
A、線4を介して接続された内部リード6とを有するエ
ポキシ樹脂等の樹脂部11を含んで構成されていた。
ースト9で固着された半導体チップ1と、その表面の周
縁上に設けられたAeパッド2にボンディングワイヤの
A、線4を介して接続された内部リード6とを有するエ
ポキシ樹脂等の樹脂部11を含んで構成されていた。
上述した従来の樹脂封止型半導体装置では、封止樹脂部
とリードフレームの各部との熱膨張係数が異なるために
密着性が悪く、半導体装置をプリント基板に実装する際
に熱衝撃が加える場合に、樹脂と内部リードや吊りビン
等のリードフレーム界面に間隔を生じ、この間隔から水
分や不純物が半導体装置内に侵入して、チップのボンデ
ィングパッドのAeバッドを腐食させるという耐湿性の
欠点があった。
とリードフレームの各部との熱膨張係数が異なるために
密着性が悪く、半導体装置をプリント基板に実装する際
に熱衝撃が加える場合に、樹脂と内部リードや吊りビン
等のリードフレーム界面に間隔を生じ、この間隔から水
分や不純物が半導体装置内に侵入して、チップのボンデ
ィングパッドのAeバッドを腐食させるという耐湿性の
欠点があった。
特に、表面実装型の樹脂封止型半導体装置は小型でかつ
薄型化であるので、実装時の熱衝撃により、封止樹脂に
亀裂が生じ、耐熱性が著しく劣化するという欠点を有し
ていた。
薄型化であるので、実装時の熱衝撃により、封止樹脂に
亀裂が生じ、耐熱性が著しく劣化するという欠点を有し
ていた。
本発明の目的は、耐湿性のよい樹脂封止型半導体装置を
提供することにある。
提供することにある。
本発明の樹脂封止型半導体装置は、アイランドに載置さ
れた半導体チップと、該半導体チップのボンディングパ
ッドにボンディングワイヤを介して接続する内部リード
とを封止する樹脂封止半導体装置において、前記ボンデ
ィングパッドとボンディングワイヤとを含む金属部の表
面を被覆する金属膜を設けて構成されている。
れた半導体チップと、該半導体チップのボンディングパ
ッドにボンディングワイヤを介して接続する内部リード
とを封止する樹脂封止半導体装置において、前記ボンデ
ィングパッドとボンディングワイヤとを含む金属部の表
面を被覆する金属膜を設けて構成されている。
次に、本発明の実施例について図面を参照しながら説明
する。
する。
第1図は本発明の第1の実施例の断面図である。
樹脂封止型半導体装置は、アイランド8と半導体チップ
1とそのA!!パッド2とAu線4と内部リード6の実
装部の金属部表面にW−3l膜10を被覆したことが異
なる点以外は第3図の従来の樹脂封止半導体装置と同一
である。
1とそのA!!パッド2とAu線4と内部リード6の実
装部の金属部表面にW−3l膜10を被覆したことが異
なる点以外は第3図の従来の樹脂封止半導体装置と同一
である。
すなわち、半導体チップ1の表面のAlパッド2とAu
線4と内部リード6と外部リード5が電気的に接続され
ており、また、アイランド8と半導体チップの側面もA
、ペースト9を介して金属面を有している。
線4と内部リード6と外部リード5が電気的に接続され
ており、また、アイランド8と半導体チップの側面もA
、ペースト9を介して金属面を有している。
樹脂部11と各部の界面のうち、上記の金属面を選択的
にWF6のS、H4ガスによる還元反応を用いたW選択
CVDにより、W S+ (タングステンシリサイ
ド)膜で約0.5〜1μm程度被覆する。
にWF6のS、H4ガスによる還元反応を用いたW選択
CVDにより、W S+ (タングステンシリサイ
ド)膜で約0.5〜1μm程度被覆する。
このWS+膜は半導体チップへの影響、ボンディング剥
がれ(パープル・ブレーグ)、量産性等を考慮に入れて
低温・短時間・常圧下で行なわれるのが望ましい。
がれ(パープル・ブレーグ)、量産性等を考慮に入れて
低温・短時間・常圧下で行なわれるのが望ましい。
なお、外部リード5はマスク等で被覆を防ぐ必要がある
。
。
W−3l膜で被覆した後、従来と同様にエポキシ樹脂で
封止し、外部リード5の成形加工を行なう。
封止し、外部リード5の成形加工を行なう。
上記のような#4遣にして、従来は樹脂部11と内部リ
ード6及びAU線4との界面を通して侵入してAlバッ
ド2を腐食させていた水分の経路を遮断することができ
、特に、プリント基板に実装した後の半導体装置の耐湿
性が向上する。
ード6及びAU線4との界面を通して侵入してAlバッ
ド2を腐食させていた水分の経路を遮断することができ
、特に、プリント基板に実装した後の半導体装置の耐湿
性が向上する。
例えば外部リード6の半田熱処理後の125℃、2気圧
の耐湿時間が従来の約6倍改善した。
の耐湿時間が従来の約6倍改善した。
第2図は本発明の第2の実施例の断面図である。
第1の実施例と同様にAU線4のボンディング後に金属
薄膜としてWStp14を形成するが、樹脂封止工程前
に、封止樹脂との密着性が良好な絶縁膜として5ID2
膜12をCVDにより形成する。
薄膜としてWStp14を形成するが、樹脂封止工程前
に、封止樹脂との密着性が良好な絶縁膜として5ID2
膜12をCVDにより形成する。
この際、外部リード5はマスク等で被覆′を防ぐほうが
好ましい。
好ましい。
上記のような構造にすることにより、封止樹脂部との密
着性をより一層均−に高めて界面の劣化を防ぎ、半導体
装置の実装後の耐熱性劣化をより良く防止することがで
きる。
着性をより一層均−に高めて界面の劣化を防ぎ、半導体
装置の実装後の耐熱性劣化をより良く防止することがで
きる。
例えば、本実施例によれば125℃、2気圧の耐熱時間
が第1の実施例の場合の約2倍に改善される。
が第1の実施例の場合の約2倍に改善される。
なお、上述の第1及び第2の実施例では、アイランド8
及び半導体チップ1の側面及び内部リード6の表面もW
−S+膜で覆ったが、省いてもよい。
及び半導体チップ1の側面及び内部リード6の表面もW
−S+膜で覆ったが、省いてもよい。
以上説明したように本発明は、ボンディングワイヤの接
続に、封止樹脂との接触面のうち少くとも半導体チップ
のボンディングパッドとボンディングワイヤとの表面を
選択的に、封止樹脂との密着性が良好で安定な金属薄膜
で被覆することにより、実装時の熱衝撃で発生しやすい
樹脂クラックや界面間隔を低減し、しかも、水分・不純
物の侵入に起因するチップのAlパッドの腐食を防ぐの
で、半導体装置の耐湿性劣化を防止して高品質を維持で
きる効果がある。
続に、封止樹脂との接触面のうち少くとも半導体チップ
のボンディングパッドとボンディングワイヤとの表面を
選択的に、封止樹脂との密着性が良好で安定な金属薄膜
で被覆することにより、実装時の熱衝撃で発生しやすい
樹脂クラックや界面間隔を低減し、しかも、水分・不純
物の侵入に起因するチップのAlパッドの腐食を防ぐの
で、半導体装置の耐湿性劣化を防止して高品質を維持で
きる効果がある。
【図面の簡単な説明】
第1図は本発明の第1の実施例の断面図、第2図は本発
明の第2の実施例の断面図、第3図は従来の樹脂封止型
半導体装置の一例の断面図である。 1・・・半導体チップ、2・・・Aeバッド、4・・・
Au線、6・・・内部リード、11・・・樹脂部、8・
・・アイランド、9・・・Agペースト、10・・・W
−S、膜、11・・・5102膜。
明の第2の実施例の断面図、第3図は従来の樹脂封止型
半導体装置の一例の断面図である。 1・・・半導体チップ、2・・・Aeバッド、4・・・
Au線、6・・・内部リード、11・・・樹脂部、8・
・・アイランド、9・・・Agペースト、10・・・W
−S、膜、11・・・5102膜。
Claims (1)
- アイランドに載置された半導体チップと、該半導体チ
ップのボンディングパッドにボンディングワイヤを介し
て接続する内部リードとを封止する樹脂封止半導体装置
において、前記ボンディングパッドとボンディングワイ
ヤとを含む金属部の表面を被覆する金属膜を設けたこと
を特徴とする樹脂封止型半導体装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63156101A JPH01321664A (ja) | 1988-06-23 | 1988-06-23 | 樹脂封止型半導体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63156101A JPH01321664A (ja) | 1988-06-23 | 1988-06-23 | 樹脂封止型半導体装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01321664A true JPH01321664A (ja) | 1989-12-27 |
Family
ID=15620333
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63156101A Pending JPH01321664A (ja) | 1988-06-23 | 1988-06-23 | 樹脂封止型半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01321664A (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1992004729A1 (en) * | 1990-09-10 | 1992-03-19 | Olin Corporation | Leadframe for molded plastic electronic packages |
KR100306230B1 (ko) * | 1998-12-30 | 2001-12-17 | 마이클 디. 오브라이언 | 반도체 패키지 구조 |
JP2014116333A (ja) * | 2012-12-06 | 2014-06-26 | Mitsubishi Electric Corp | 半導体装置 |
JP2016086047A (ja) * | 2014-10-24 | 2016-05-19 | 日亜化学工業株式会社 | 発光装置の製造方法 |
WO2017209055A1 (ja) | 2016-05-31 | 2017-12-07 | 株式会社小松製作所 | 作業車両 |
WO2017209058A1 (ja) | 2016-05-31 | 2017-12-07 | 株式会社小松製作所 | 作業車両および作業車両の制御方法 |
WO2018038268A1 (ja) | 2016-08-26 | 2018-03-01 | 株式会社小松製作所 | 作業車両および作業車両の制御方法 |
-
1988
- 1988-06-23 JP JP63156101A patent/JPH01321664A/ja active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1992004729A1 (en) * | 1990-09-10 | 1992-03-19 | Olin Corporation | Leadframe for molded plastic electronic packages |
KR100306230B1 (ko) * | 1998-12-30 | 2001-12-17 | 마이클 디. 오브라이언 | 반도체 패키지 구조 |
JP2014116333A (ja) * | 2012-12-06 | 2014-06-26 | Mitsubishi Electric Corp | 半導体装置 |
JP2016086047A (ja) * | 2014-10-24 | 2016-05-19 | 日亜化学工業株式会社 | 発光装置の製造方法 |
WO2017209055A1 (ja) | 2016-05-31 | 2017-12-07 | 株式会社小松製作所 | 作業車両 |
WO2017209058A1 (ja) | 2016-05-31 | 2017-12-07 | 株式会社小松製作所 | 作業車両および作業車両の制御方法 |
WO2018038268A1 (ja) | 2016-08-26 | 2018-03-01 | 株式会社小松製作所 | 作業車両および作業車両の制御方法 |
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