JPH01321664A - 樹脂封止型半導体装置 - Google Patents

樹脂封止型半導体装置

Info

Publication number
JPH01321664A
JPH01321664A JP63156101A JP15610188A JPH01321664A JP H01321664 A JPH01321664 A JP H01321664A JP 63156101 A JP63156101 A JP 63156101A JP 15610188 A JP15610188 A JP 15610188A JP H01321664 A JPH01321664 A JP H01321664A
Authority
JP
Japan
Prior art keywords
semiconductor device
resin
faces
metal
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63156101A
Other languages
English (en)
Inventor
Taku Nakamura
卓 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP63156101A priority Critical patent/JPH01321664A/ja
Publication of JPH01321664A publication Critical patent/JPH01321664A/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04042Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/05599Material
    • H01L2224/056Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/05617Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
    • H01L2224/05624Aluminium [Al] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/29198Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29298Fillers
    • H01L2224/29299Base material
    • H01L2224/293Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/29338Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/29339Silver [Ag] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48465Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/4847Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/485Material
    • H01L2224/48505Material at the bonding interface
    • H01L2224/48599Principal constituent of the connecting portion of the wire connector being Gold (Au)
    • H01L2224/486Principal constituent of the connecting portion of the wire connector being Gold (Au) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/48617Principal constituent of the connecting portion of the wire connector being Gold (Au) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950 °C
    • H01L2224/48624Aluminium (Al) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/85909Post-treatment of the connector or wire bonding area
    • H01L2224/8592Applying permanent coating, e.g. protective coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01013Aluminum [Al]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01014Silicon [Si]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01047Silver [Ag]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01074Tungsten [W]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Wire Bonding (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は樹脂封止型半導体装置に関する。
〔従来の技術〕
従来から、半導体装置は安価で、しかも量産性に適して
いることから樹脂封止型が主流となっていた。
第3図は従来の樹脂封止型半導体装置の一例の断面図で
ある。
樹脂封止型半導体装置は、アイランド8の表面にA、ペ
ースト9で固着された半導体チップ1と、その表面の周
縁上に設けられたAeパッド2にボンディングワイヤの
A、線4を介して接続された内部リード6とを有するエ
ポキシ樹脂等の樹脂部11を含んで構成されていた。
〔発明が解決しようとする課題〕
上述した従来の樹脂封止型半導体装置では、封止樹脂部
とリードフレームの各部との熱膨張係数が異なるために
密着性が悪く、半導体装置をプリント基板に実装する際
に熱衝撃が加える場合に、樹脂と内部リードや吊りビン
等のリードフレーム界面に間隔を生じ、この間隔から水
分や不純物が半導体装置内に侵入して、チップのボンデ
ィングパッドのAeバッドを腐食させるという耐湿性の
欠点があった。
特に、表面実装型の樹脂封止型半導体装置は小型でかつ
薄型化であるので、実装時の熱衝撃により、封止樹脂に
亀裂が生じ、耐熱性が著しく劣化するという欠点を有し
ていた。
本発明の目的は、耐湿性のよい樹脂封止型半導体装置を
提供することにある。
〔課題を解決するための手段〕
本発明の樹脂封止型半導体装置は、アイランドに載置さ
れた半導体チップと、該半導体チップのボンディングパ
ッドにボンディングワイヤを介して接続する内部リード
とを封止する樹脂封止半導体装置において、前記ボンデ
ィングパッドとボンディングワイヤとを含む金属部の表
面を被覆する金属膜を設けて構成されている。
〔実施例〕
次に、本発明の実施例について図面を参照しながら説明
する。
第1図は本発明の第1の実施例の断面図である。
樹脂封止型半導体装置は、アイランド8と半導体チップ
1とそのA!!パッド2とAu線4と内部リード6の実
装部の金属部表面にW−3l膜10を被覆したことが異
なる点以外は第3図の従来の樹脂封止半導体装置と同一
である。
すなわち、半導体チップ1の表面のAlパッド2とAu
線4と内部リード6と外部リード5が電気的に接続され
ており、また、アイランド8と半導体チップの側面もA
、ペースト9を介して金属面を有している。
樹脂部11と各部の界面のうち、上記の金属面を選択的
にWF6のS、H4ガスによる還元反応を用いたW選択
CVDにより、W  S+  (タングステンシリサイ
ド)膜で約0.5〜1μm程度被覆する。
このWS+膜は半導体チップへの影響、ボンディング剥
がれ(パープル・ブレーグ)、量産性等を考慮に入れて
低温・短時間・常圧下で行なわれるのが望ましい。
なお、外部リード5はマスク等で被覆を防ぐ必要がある
W−3l膜で被覆した後、従来と同様にエポキシ樹脂で
封止し、外部リード5の成形加工を行なう。
上記のような#4遣にして、従来は樹脂部11と内部リ
ード6及びAU線4との界面を通して侵入してAlバッ
ド2を腐食させていた水分の経路を遮断することができ
、特に、プリント基板に実装した後の半導体装置の耐湿
性が向上する。
例えば外部リード6の半田熱処理後の125℃、2気圧
の耐湿時間が従来の約6倍改善した。
第2図は本発明の第2の実施例の断面図である。
第1の実施例と同様にAU線4のボンディング後に金属
薄膜としてWStp14を形成するが、樹脂封止工程前
に、封止樹脂との密着性が良好な絶縁膜として5ID2
膜12をCVDにより形成する。
この際、外部リード5はマスク等で被覆′を防ぐほうが
好ましい。
上記のような構造にすることにより、封止樹脂部との密
着性をより一層均−に高めて界面の劣化を防ぎ、半導体
装置の実装後の耐熱性劣化をより良く防止することがで
きる。
例えば、本実施例によれば125℃、2気圧の耐熱時間
が第1の実施例の場合の約2倍に改善される。
なお、上述の第1及び第2の実施例では、アイランド8
及び半導体チップ1の側面及び内部リード6の表面もW
−S+膜で覆ったが、省いてもよい。
〔発明の効果〕
以上説明したように本発明は、ボンディングワイヤの接
続に、封止樹脂との接触面のうち少くとも半導体チップ
のボンディングパッドとボンディングワイヤとの表面を
選択的に、封止樹脂との密着性が良好で安定な金属薄膜
で被覆することにより、実装時の熱衝撃で発生しやすい
樹脂クラックや界面間隔を低減し、しかも、水分・不純
物の侵入に起因するチップのAlパッドの腐食を防ぐの
で、半導体装置の耐湿性劣化を防止して高品質を維持で
きる効果がある。
【図面の簡単な説明】 第1図は本発明の第1の実施例の断面図、第2図は本発
明の第2の実施例の断面図、第3図は従来の樹脂封止型
半導体装置の一例の断面図である。 1・・・半導体チップ、2・・・Aeバッド、4・・・
Au線、6・・・内部リード、11・・・樹脂部、8・
・・アイランド、9・・・Agペースト、10・・・W
−S、膜、11・・・5102膜。

Claims (1)

    【特許請求の範囲】
  1.  アイランドに載置された半導体チップと、該半導体チ
    ップのボンディングパッドにボンディングワイヤを介し
    て接続する内部リードとを封止する樹脂封止半導体装置
    において、前記ボンディングパッドとボンディングワイ
    ヤとを含む金属部の表面を被覆する金属膜を設けたこと
    を特徴とする樹脂封止型半導体装置。
JP63156101A 1988-06-23 1988-06-23 樹脂封止型半導体装置 Pending JPH01321664A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63156101A JPH01321664A (ja) 1988-06-23 1988-06-23 樹脂封止型半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63156101A JPH01321664A (ja) 1988-06-23 1988-06-23 樹脂封止型半導体装置

Publications (1)

Publication Number Publication Date
JPH01321664A true JPH01321664A (ja) 1989-12-27

Family

ID=15620333

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63156101A Pending JPH01321664A (ja) 1988-06-23 1988-06-23 樹脂封止型半導体装置

Country Status (1)

Country Link
JP (1) JPH01321664A (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992004729A1 (en) * 1990-09-10 1992-03-19 Olin Corporation Leadframe for molded plastic electronic packages
KR100306230B1 (ko) * 1998-12-30 2001-12-17 마이클 디. 오브라이언 반도체 패키지 구조
JP2014116333A (ja) * 2012-12-06 2014-06-26 Mitsubishi Electric Corp 半導体装置
JP2016086047A (ja) * 2014-10-24 2016-05-19 日亜化学工業株式会社 発光装置の製造方法
WO2017209055A1 (ja) 2016-05-31 2017-12-07 株式会社小松製作所 作業車両
WO2017209058A1 (ja) 2016-05-31 2017-12-07 株式会社小松製作所 作業車両および作業車両の制御方法
WO2018038268A1 (ja) 2016-08-26 2018-03-01 株式会社小松製作所 作業車両および作業車両の制御方法

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992004729A1 (en) * 1990-09-10 1992-03-19 Olin Corporation Leadframe for molded plastic electronic packages
KR100306230B1 (ko) * 1998-12-30 2001-12-17 마이클 디. 오브라이언 반도체 패키지 구조
JP2014116333A (ja) * 2012-12-06 2014-06-26 Mitsubishi Electric Corp 半導体装置
JP2016086047A (ja) * 2014-10-24 2016-05-19 日亜化学工業株式会社 発光装置の製造方法
WO2017209055A1 (ja) 2016-05-31 2017-12-07 株式会社小松製作所 作業車両
WO2017209058A1 (ja) 2016-05-31 2017-12-07 株式会社小松製作所 作業車両および作業車両の制御方法
WO2018038268A1 (ja) 2016-08-26 2018-03-01 株式会社小松製作所 作業車両および作業車両の制御方法

Similar Documents

Publication Publication Date Title
KR100318818B1 (ko) 리드프레임에대한보호피막결합
JPH01321664A (ja) 樹脂封止型半導体装置
JPH06268107A (ja) 半導体デバイスパッケージ
JPS6050343B2 (ja) 半導体装置製造用リ−ドフレ−ム
JPH0263148A (ja) 半導体装置
JPH01282844A (ja) 樹脂封止型半導体装置
JP2506429B2 (ja) 樹脂封止型半導体装置
JPH10289973A (ja) リードフレームの表面処理方法
JPS63114242A (ja) 半導体装置
JPH02178953A (ja) 樹脂封止型半導体装置
JPS60218863A (ja) 半導体リ−ドフレ−ム
JPS6050342B2 (ja) 半導体装置製造用リ−ドフレ−ム
JPH05166871A (ja) 半導体装置
JPH01187954A (ja) 樹脂封止型半導体装置
JPH09275176A (ja) 樹脂封止型半導体装置
JP2743567B2 (ja) 樹脂封止型集積回路
JPS63308357A (ja) 半導体装置用リ−ドフレ−ム
JPH02266553A (ja) 半導体装置の製造方法
JPS61128551A (ja) 半導体装置用リ−ドフレ−ム
JPH0325959A (ja) 樹脂封止型半導体装置
JPS59154047A (ja) 半導体用リ−ドフレ−ム
JPH06140525A (ja) 半導体装置
JPH03169057A (ja) 半導体装置
JPS63124553A (ja) 半導体装置用セラミツク基板
JPS6321862A (ja) Icセラミツクパツケ−ジ用リ−ドフレ−ムの製造方法