JPH0131705B2 - - Google Patents
Info
- Publication number
- JPH0131705B2 JPH0131705B2 JP58144789A JP14478983A JPH0131705B2 JP H0131705 B2 JPH0131705 B2 JP H0131705B2 JP 58144789 A JP58144789 A JP 58144789A JP 14478983 A JP14478983 A JP 14478983A JP H0131705 B2 JPH0131705 B2 JP H0131705B2
- Authority
- JP
- Japan
- Prior art keywords
- gate
- transistors
- region
- mos
- integrated circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58144789A JPS6037158A (ja) | 1983-08-08 | 1983-08-08 | Mos型集積回路 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58144789A JPS6037158A (ja) | 1983-08-08 | 1983-08-08 | Mos型集積回路 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6037158A JPS6037158A (ja) | 1985-02-26 |
JPH0131705B2 true JPH0131705B2 (enrdf_load_stackoverflow) | 1989-06-27 |
Family
ID=15370483
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58144789A Granted JPS6037158A (ja) | 1983-08-08 | 1983-08-08 | Mos型集積回路 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6037158A (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6197861U (enrdf_load_stackoverflow) * | 1984-12-03 | 1986-06-23 | ||
JPH05175497A (ja) * | 1991-12-25 | 1993-07-13 | Nec Corp | 半導体トランジスタチップ |
US6598214B2 (en) * | 2000-12-21 | 2003-07-22 | Texas Instruments Incorporated | Design method and system for providing transistors with varying active region lengths |
-
1983
- 1983-08-08 JP JP58144789A patent/JPS6037158A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6037158A (ja) | 1985-02-26 |
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