JPH0128370B2 - - Google Patents

Info

Publication number
JPH0128370B2
JPH0128370B2 JP55043384A JP4338480A JPH0128370B2 JP H0128370 B2 JPH0128370 B2 JP H0128370B2 JP 55043384 A JP55043384 A JP 55043384A JP 4338480 A JP4338480 A JP 4338480A JP H0128370 B2 JPH0128370 B2 JP H0128370B2
Authority
JP
Japan
Prior art keywords
weight
parts
positive photoresist
image forming
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55043384A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56140342A (en
Inventor
Yukio Ishida
Keizo Ishii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP4338480A priority Critical patent/JPS56140342A/ja
Publication of JPS56140342A publication Critical patent/JPS56140342A/ja
Publication of JPH0128370B2 publication Critical patent/JPH0128370B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP4338480A 1980-04-02 1980-04-02 Image forming composition and formation of resist image Granted JPS56140342A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4338480A JPS56140342A (en) 1980-04-02 1980-04-02 Image forming composition and formation of resist image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4338480A JPS56140342A (en) 1980-04-02 1980-04-02 Image forming composition and formation of resist image

Publications (2)

Publication Number Publication Date
JPS56140342A JPS56140342A (en) 1981-11-02
JPH0128370B2 true JPH0128370B2 (en, 2012) 1989-06-02

Family

ID=12662312

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4338480A Granted JPS56140342A (en) 1980-04-02 1980-04-02 Image forming composition and formation of resist image

Country Status (1)

Country Link
JP (1) JPS56140342A (en, 2012)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6024545A (ja) * 1983-07-21 1985-02-07 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS62123444A (ja) * 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPH0693115B2 (ja) * 1988-10-18 1994-11-16 日本合成ゴム株式会社 ネガ型感放射線性樹脂組成物
JP4854080B2 (ja) * 2006-10-10 2012-01-11 株式会社伸晃 仕切り

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2331377C2 (de) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Kopiermaterial
JPS5723253B2 (en, 2012) * 1974-03-25 1982-05-18
CA1119447A (en) * 1978-09-06 1982-03-09 John P. Vikesland Positive-acting photoresist composition containing a crosslinked urethane resin, a cured epoxy resin and a photosensitizer

Also Published As

Publication number Publication date
JPS56140342A (en) 1981-11-02

Similar Documents

Publication Publication Date Title
KR100593280B1 (ko) 평판인쇄용 린싱 및 스트리핑 방법
JPH041340B2 (en, 2012)
JP2002258479A (ja) 厚膜用ポジ型ホトレジスト組成物、ホトレジスト膜およびこれを用いたバンプ形成方法
US4610953A (en) Aqueous developer solution for positive type photoresists with tetramethyl ammonium hydroxide and trimethyl hydroxyethyl ammonium hydroxide
US4873177A (en) Method for forming a resist pattern on a substrate surface and a scum-remover therefor
JPS63305348A (ja) ポジ型フオトレジスト組成物
JPH0284414A (ja) ノボラック樹脂、フォトレジスト及びレジストパターンの形成方法
JPS62105137A (ja) 放射感光性ポジティブ型フォトレジスト組成物及びその製法
JPH06321835A (ja) ４−（４−ヒドロキシフェニル）シクロヘキサノンの選択されたフェノール系誘導体及び放射線感受性混合物のための感受性増強剤としてのその使用
JPH08507093A (ja) フォトレジスト用ノボラック樹脂混合物
TWI234051B (en) A mixed solvent system for positive photoresists
JP3549882B2 (ja) ノボラック樹脂混合物
JPH0128370B2 (en, 2012)
JP2628615B2 (ja) 迅速なジアゾキノンポジレジスト
JPH0683051A (ja) 放射線に感光性の混合物のための増感剤としてのポリラクチド化合物
JP2002508415A (ja) 分別したノボラック樹脂およびそれから得られるフォトレジスト組成物
JP2002502055A (ja) 粒子形成傾向の低下したフォトレジスト組成物の製造方法
US5208138A (en) High contrast high thermal stability positive photoresists having novolak resins of lowered hydroxyl content
JPH04232954A (ja) 微細レジストパターンの形成方法
JPS6139041A (ja) ポジ型レジスト現像液
JPS62255937A (ja) ポジ型フオトレジスト組成物
JP3066068B2 (ja) 陽画フォトレジスト組成物
JP3592332B2 (ja) ポジ型感光性組成物
JP3312341B2 (ja) ポジ型フォトレジスト組成物
CN1171123C (zh) 制造光活性化合物以及由其制造光刻胶的方法