JPH0128366B2 - - Google Patents

Info

Publication number
JPH0128366B2
JPH0128366B2 JP54079298A JP7929879A JPH0128366B2 JP H0128366 B2 JPH0128366 B2 JP H0128366B2 JP 54079298 A JP54079298 A JP 54079298A JP 7929879 A JP7929879 A JP 7929879A JP H0128366 B2 JPH0128366 B2 JP H0128366B2
Authority
JP
Japan
Prior art keywords
photosensitive composition
weight
diazo
acid
alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54079298A
Other languages
English (en)
Japanese (ja)
Other versions
JPS564144A (en
Inventor
Katsuyuki Oota
Shigeru Ootawa
Shunichi Kasukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP7929879A priority Critical patent/JPS564144A/ja
Priority to US06/158,290 priority patent/US4304832A/en
Priority to GB8019439A priority patent/GB2057704B/en
Publication of JPS564144A publication Critical patent/JPS564144A/ja
Publication of JPH0128366B2 publication Critical patent/JPH0128366B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP7929879A 1979-06-23 1979-06-23 Photosensitive composition Granted JPS564144A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP7929879A JPS564144A (en) 1979-06-23 1979-06-23 Photosensitive composition
US06/158,290 US4304832A (en) 1979-06-23 1980-06-10 Photosensitive resin composition containing diazodiphenylamine-aldehyde condensate
GB8019439A GB2057704B (en) 1979-06-23 1980-06-13 Photosensitive resin composition and planographic printing plates therewith

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7929879A JPS564144A (en) 1979-06-23 1979-06-23 Photosensitive composition

Publications (2)

Publication Number Publication Date
JPS564144A JPS564144A (en) 1981-01-17
JPH0128366B2 true JPH0128366B2 (en, 2012) 1989-06-02

Family

ID=13685930

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7929879A Granted JPS564144A (en) 1979-06-23 1979-06-23 Photosensitive composition

Country Status (3)

Country Link
US (1) US4304832A (en, 2012)
JP (1) JPS564144A (en, 2012)
GB (1) GB2057704B (en, 2012)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4539285A (en) * 1984-03-14 1985-09-03 American Hoechst Corporation Photosensitive negative diazo composition with two acrylic polymers for photolithography
EP0353873B1 (en) * 1988-07-11 1993-12-29 Konica Corporation Photsensitive composition
JP2671406B2 (ja) * 1988-07-19 1997-10-29 三菱化学株式会社 感光性組成物
US5698361A (en) * 1991-10-07 1997-12-16 Fuji Photo Film Co., Ltd. Photosensitive composition
EP0583962B1 (en) * 1992-08-17 1997-07-16 Konica Corporation Light-sensitive composition
DE19518118C2 (de) * 1995-05-17 1998-06-18 Sun Chemical Corp Lichtempfindliche Zusammensetzung
DE19524851C2 (de) * 1995-07-07 1998-05-07 Sun Chemical Corp Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und für lithographische Druckplatten
DE19525050C2 (de) * 1995-07-10 1999-11-11 Kodak Polychrome Graphics Llc Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten
DE19644515A1 (de) * 1996-10-25 1998-06-25 Sun Chemical Corp Amidosubstituierte Acetalpolymere und Verwendung derselben in photoempfindlichen Zusammensetzungen und lithographischen Druckplatten
DE19847616C2 (de) * 1998-10-15 2001-05-10 Kodak Polychrome Graphics Gmbh Polyvinylacetale mit Imidogruppen sowie die Verwendung derselben in lichtempfindlichen Zusammensetzungen
US6270938B1 (en) 2000-06-09 2001-08-07 Kodak Polychrome Graphics Llc Acetal copolymers and use thereof in photosensitive compositions
JP4410714B2 (ja) 2004-08-13 2010-02-03 富士フイルム株式会社 平版印刷版用支持体の製造方法
JP4499507B2 (ja) 2004-08-23 2010-07-07 コダック株式会社 平版印刷版原版
EP1712368B1 (en) 2005-04-13 2008-05-14 FUJIFILM Corporation Method of manufacturing a support for a lithographic printing plate
JP2009208140A (ja) 2008-03-06 2009-09-17 Fujifilm Corp 平版印刷版用アルミニウム合金板の製造方法、ならびに該製造方法により得られる平版印刷版用アルミニウム合金板および平版印刷版用支持体

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2826501A (en) * 1956-12-20 1958-03-11 Litho Chemical And Supply Co I Lithographic coating solution and lithographic plates coated therewith
GB964875A (en) * 1959-02-26 1964-07-22 Gevaert Photo Prod Nv Improvements in or relating to electrophotography
JPS4825050B1 (en, 2012) * 1968-11-07 1973-07-26
US4123276A (en) * 1974-02-28 1978-10-31 Fuji Photo Film Co., Ltd. Photosensitive composition
JPS5534929B2 (en, 2012) * 1974-02-28 1980-09-10
JPS52110103A (en) * 1976-03-11 1977-09-16 Toray Industries Photoosensitive resin composition
JPS5942862B2 (ja) * 1977-08-03 1984-10-18 三菱化学株式会社 感光性組成物

Also Published As

Publication number Publication date
US4304832A (en) 1981-12-08
JPS564144A (en) 1981-01-17
GB2057704B (en) 1983-06-22
GB2057704A (en) 1981-04-01

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