JPH0126548B2 - - Google Patents
Info
- Publication number
- JPH0126548B2 JPH0126548B2 JP56202231A JP20223181A JPH0126548B2 JP H0126548 B2 JPH0126548 B2 JP H0126548B2 JP 56202231 A JP56202231 A JP 56202231A JP 20223181 A JP20223181 A JP 20223181A JP H0126548 B2 JPH0126548 B2 JP H0126548B2
- Authority
- JP
- Japan
- Prior art keywords
- oxide film
- region
- base oxide
- film
- nitride film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/74—Making of localized buried regions, e.g. buried collector layers, internal connections substrate contacts
- H01L21/743—Making of internal connections, substrate contacts
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Bipolar Transistors (AREA)
- Semiconductor Integrated Circuits (AREA)
- Bipolar Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56202231A JPS58102557A (ja) | 1981-12-14 | 1981-12-14 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56202231A JPS58102557A (ja) | 1981-12-14 | 1981-12-14 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58102557A JPS58102557A (ja) | 1983-06-18 |
| JPH0126548B2 true JPH0126548B2 (enrdf_load_stackoverflow) | 1989-05-24 |
Family
ID=16454127
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56202231A Granted JPS58102557A (ja) | 1981-12-14 | 1981-12-14 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58102557A (enrdf_load_stackoverflow) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56140644A (en) * | 1980-04-02 | 1981-11-04 | Fujitsu Ltd | Semiconductor device and manufacture thereof |
| JPS5810834A (ja) * | 1981-07-10 | 1983-01-21 | Nec Corp | 半導体装置 |
-
1981
- 1981-12-14 JP JP56202231A patent/JPS58102557A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58102557A (ja) | 1983-06-18 |
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