JPH01121923U - - Google Patents

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Publication number
JPH01121923U
JPH01121923U JP1723788U JP1723788U JPH01121923U JP H01121923 U JPH01121923 U JP H01121923U JP 1723788 U JP1723788 U JP 1723788U JP 1723788 U JP1723788 U JP 1723788U JP H01121923 U JPH01121923 U JP H01121923U
Authority
JP
Japan
Prior art keywords
control
cassette
wafer
reaction chamber
wafers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1723788U
Other languages
English (en)
Japanese (ja)
Other versions
JP2570756Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1988017237U priority Critical patent/JP2570756Y2/ja
Publication of JPH01121923U publication Critical patent/JPH01121923U/ja
Application granted granted Critical
Publication of JP2570756Y2 publication Critical patent/JP2570756Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Chemical Vapour Deposition (AREA)
JP1988017237U 1988-02-12 1988-02-12 縦型ｃｖｄ・拡散装置 Expired - Lifetime JP2570756Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988017237U JP2570756Y2 (ja) 1988-02-12 1988-02-12 縦型ｃｖｄ・拡散装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988017237U JP2570756Y2 (ja) 1988-02-12 1988-02-12 縦型ｃｖｄ・拡散装置

Publications (2)

Publication Number Publication Date
JPH01121923U true JPH01121923U (enrdf_load_stackoverflow) 1989-08-18
JP2570756Y2 JP2570756Y2 (ja) 1998-05-13

Family

ID=31230840

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988017237U Expired - Lifetime JP2570756Y2 (ja) 1988-02-12 1988-02-12 縦型ｃｖｄ・拡散装置

Country Status (1)

Country Link
JP (1) JP2570756Y2 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03244121A (ja) * 1990-02-21 1991-10-30 Kokusai Electric Co Ltd 縦型半導体製造装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52139378A (en) * 1976-05-17 1977-11-21 Hitachi Ltd Integrated treatment apparatus for semiconductor wafers
JPS6324615A (ja) * 1986-05-16 1988-02-02 シリコン・バレイ・グル−プ・インコ−ポレイテッド ウェーハ移送方法及び装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52139378A (en) * 1976-05-17 1977-11-21 Hitachi Ltd Integrated treatment apparatus for semiconductor wafers
JPS6324615A (ja) * 1986-05-16 1988-02-02 シリコン・バレイ・グル−プ・インコ−ポレイテッド ウェーハ移送方法及び装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03244121A (ja) * 1990-02-21 1991-10-30 Kokusai Electric Co Ltd 縦型半導体製造装置

Also Published As

Publication number Publication date
JP2570756Y2 (ja) 1998-05-13

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