JPH0110927Y2 - - Google Patents
Info
- Publication number
- JPH0110927Y2 JPH0110927Y2 JP3469082U JP3469082U JPH0110927Y2 JP H0110927 Y2 JPH0110927 Y2 JP H0110927Y2 JP 3469082 U JP3469082 U JP 3469082U JP 3469082 U JP3469082 U JP 3469082U JP H0110927 Y2 JPH0110927 Y2 JP H0110927Y2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- wafer holder
- wafers
- cassette carrier
- vertical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 235000012431 wafers Nutrition 0.000 claims description 73
- 238000004518 low pressure chemical vapour deposition Methods 0.000 claims description 5
- 238000012545 processing Methods 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000000576 coating method Methods 0.000 description 3
- 239000000969 carrier Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3469082U JPS58138334U (ja) | 1982-03-12 | 1982-03-12 | ウエハ自動給材機構 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3469082U JPS58138334U (ja) | 1982-03-12 | 1982-03-12 | ウエハ自動給材機構 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58138334U JPS58138334U (ja) | 1983-09-17 |
| JPH0110927Y2 true JPH0110927Y2 (en, 2012) | 1989-03-29 |
Family
ID=30046179
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3469082U Granted JPS58138334U (ja) | 1982-03-12 | 1982-03-12 | ウエハ自動給材機構 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58138334U (en, 2012) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0630342B2 (ja) * | 1984-12-25 | 1994-04-20 | 富士通株式会社 | 縦型炉 |
| JPH0539624Y2 (en, 2012) * | 1985-01-18 | 1993-10-07 |
-
1982
- 1982-03-12 JP JP3469082U patent/JPS58138334U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58138334U (ja) | 1983-09-17 |
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