JP7812843B2 - 積層体及び積層体の製造方法 - Google Patents

積層体及び積層体の製造方法

Info

Publication number
JP7812843B2
JP7812843B2 JP2023510585A JP2023510585A JP7812843B2 JP 7812843 B2 JP7812843 B2 JP 7812843B2 JP 2023510585 A JP2023510585 A JP 2023510585A JP 2023510585 A JP2023510585 A JP 2023510585A JP 7812843 B2 JP7812843 B2 JP 7812843B2
Authority
JP
Japan
Prior art keywords
resin pattern
mass
group
meth
photosensitive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2023510585A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2022209307A1 (https=
Inventor
陽平 有年
健太郎 豊岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of JPWO2022209307A1 publication Critical patent/JPWO2022209307A1/ja
Application granted granted Critical
Publication of JP7812843B2 publication Critical patent/JP7812843B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/16—Layered products comprising a layer of synthetic resin specially treated, e.g. irradiated
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Laminated Bodies (AREA)
JP2023510585A 2021-03-30 2022-02-07 積層体及び積層体の製造方法 Active JP7812843B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021058108 2021-03-30
JP2021058108 2021-03-30
PCT/JP2022/004743 WO2022209307A1 (ja) 2021-03-30 2022-02-07 積層体及び積層体の製造方法

Publications (2)

Publication Number Publication Date
JPWO2022209307A1 JPWO2022209307A1 (https=) 2022-10-06
JP7812843B2 true JP7812843B2 (ja) 2026-02-10

Family

ID=83455862

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023510585A Active JP7812843B2 (ja) 2021-03-30 2022-02-07 積層体及び積層体の製造方法

Country Status (3)

Country Link
US (1) US20240027897A1 (https=)
JP (1) JP7812843B2 (https=)
WO (1) WO2022209307A1 (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018105313A1 (ja) 2016-12-08 2018-06-14 富士フイルム株式会社 転写フィルム、電極保護膜、積層体、静電容量型入力装置、及び、タッチパネルの製造方法
WO2020196802A1 (ja) 2019-03-26 2020-10-01 富士フイルム株式会社 銀導電性材料保護膜用転写フィルム、パターン付き銀導電性材料の製造方法、積層体、及び、タッチパネル
WO2021010058A1 (ja) 2019-07-12 2021-01-21 富士フイルム株式会社 転写フィルム、積層体の製造方法およびタッチパネルの製造方法
WO2021014914A1 (ja) 2019-07-24 2021-01-28 富士フイルム株式会社 感光性樹脂組成物、転写フィルム、硬化膜、積層体、及び、タッチパネルの製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018105313A1 (ja) 2016-12-08 2018-06-14 富士フイルム株式会社 転写フィルム、電極保護膜、積層体、静電容量型入力装置、及び、タッチパネルの製造方法
WO2020196802A1 (ja) 2019-03-26 2020-10-01 富士フイルム株式会社 銀導電性材料保護膜用転写フィルム、パターン付き銀導電性材料の製造方法、積層体、及び、タッチパネル
WO2021010058A1 (ja) 2019-07-12 2021-01-21 富士フイルム株式会社 転写フィルム、積層体の製造方法およびタッチパネルの製造方法
WO2021014914A1 (ja) 2019-07-24 2021-01-28 富士フイルム株式会社 感光性樹脂組成物、転写フィルム、硬化膜、積層体、及び、タッチパネルの製造方法

Also Published As

Publication number Publication date
JPWO2022209307A1 (https=) 2022-10-06
US20240027897A1 (en) 2024-01-25
WO2022209307A1 (ja) 2022-10-06

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