JP7806909B2 - 照明ユニット、露光装置、及び露光方法 - Google Patents

照明ユニット、露光装置、及び露光方法

Info

Publication number
JP7806909B2
JP7806909B2 JP2024541341A JP2024541341A JP7806909B2 JP 7806909 B2 JP7806909 B2 JP 7806909B2 JP 2024541341 A JP2024541341 A JP 2024541341A JP 2024541341 A JP2024541341 A JP 2024541341A JP 7806909 B2 JP7806909 B2 JP 7806909B2
Authority
JP
Japan
Prior art keywords
light
optical system
emitting
light source
lighting unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2024541341A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2024038535A5 (https=
JPWO2024038535A1 (https=
Inventor
正也 岩永
聡 川戸
智之 大川
聡 中臣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of JPWO2024038535A1 publication Critical patent/JPWO2024038535A1/ja
Publication of JPWO2024038535A5 publication Critical patent/JPWO2024038535A5/ja
Application granted granted Critical
Publication of JP7806909B2 publication Critical patent/JP7806909B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70183—Zoom systems for adjusting beam diameter
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
JP2024541341A 2022-08-18 2022-08-18 照明ユニット、露光装置、及び露光方法 Active JP7806909B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/031205 WO2024038535A1 (ja) 2022-08-18 2022-08-18 照明ユニット、露光装置、及び露光方法

Publications (3)

Publication Number Publication Date
JPWO2024038535A1 JPWO2024038535A1 (https=) 2024-02-22
JPWO2024038535A5 JPWO2024038535A5 (https=) 2025-05-16
JP7806909B2 true JP7806909B2 (ja) 2026-01-27

Family

ID=89941584

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024541341A Active JP7806909B2 (ja) 2022-08-18 2022-08-18 照明ユニット、露光装置、及び露光方法

Country Status (5)

Country Link
JP (1) JP7806909B2 (https=)
KR (1) KR20250022862A (https=)
CN (1) CN119585677A (https=)
TW (1) TWI885424B (https=)
WO (1) WO2024038535A1 (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004335952A (ja) 2002-12-27 2004-11-25 Nikon Corp 照明光源装置、照明装置、露光装置、及び露光方法
JP2006332077A (ja) 2005-05-23 2006-12-07 Nikon Corp 光源ユニット、照明光学装置、露光装置、および露光方法
JP2014207300A (ja) 2013-04-12 2014-10-30 株式会社オーク製作所 光源装置および露光装置
JP2021189395A (ja) 2020-06-04 2021-12-13 セイコーエプソン株式会社 照明装置およびプロジェクター

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3950553B2 (ja) 1998-06-30 2007-08-01 キヤノン株式会社 照明光学系及びそれを有する露光装置
JP2012049226A (ja) * 2010-08-25 2012-03-08 Ushio Inc 光源装置
JP5687013B2 (ja) * 2010-09-14 2015-03-18 株式会社Ｓｃｒｅｅｎホールディングス 露光装置および光源装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004335952A (ja) 2002-12-27 2004-11-25 Nikon Corp 照明光源装置、照明装置、露光装置、及び露光方法
JP2006332077A (ja) 2005-05-23 2006-12-07 Nikon Corp 光源ユニット、照明光学装置、露光装置、および露光方法
JP2014207300A (ja) 2013-04-12 2014-10-30 株式会社オーク製作所 光源装置および露光装置
JP2021189395A (ja) 2020-06-04 2021-12-13 セイコーエプソン株式会社 照明装置およびプロジェクター

Also Published As

Publication number Publication date
KR20250022862A (ko) 2025-02-17
TW202427060A (zh) 2024-07-01
TWI885424B (zh) 2025-06-01
CN119585677A (zh) 2025-03-07
WO2024038535A1 (ja) 2024-02-22
JPWO2024038535A1 (https=) 2024-02-22

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