JPWO2024038535A1 - - Google Patents
Info
- Publication number
- JPWO2024038535A1 JPWO2024038535A1 JP2024541341A JP2024541341A JPWO2024038535A1 JP WO2024038535 A1 JPWO2024038535 A1 JP WO2024038535A1 JP 2024541341 A JP2024541341 A JP 2024541341A JP 2024541341 A JP2024541341 A JP 2024541341A JP WO2024038535 A1 JPWO2024038535 A1 JP WO2024038535A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70183—Zoom systems for adjusting beam diameter
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2022/031205 WO2024038535A1 (ja) | 2022-08-18 | 2022-08-18 | 照明ユニット、露光装置、及び露光方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2024038535A1 true JPWO2024038535A1 (https=) | 2024-02-22 |
| JPWO2024038535A5 JPWO2024038535A5 (https=) | 2025-05-16 |
| JP7806909B2 JP7806909B2 (ja) | 2026-01-27 |
Family
ID=89941584
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024541341A Active JP7806909B2 (ja) | 2022-08-18 | 2022-08-18 | 照明ユニット、露光装置、及び露光方法 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7806909B2 (https=) |
| KR (1) | KR20250022862A (https=) |
| CN (1) | CN119585677A (https=) |
| TW (1) | TWI885424B (https=) |
| WO (1) | WO2024038535A1 (https=) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004335952A (ja) * | 2002-12-27 | 2004-11-25 | Nikon Corp | 照明光源装置、照明装置、露光装置、及び露光方法 |
| JP2006332077A (ja) * | 2005-05-23 | 2006-12-07 | Nikon Corp | 光源ユニット、照明光学装置、露光装置、および露光方法 |
| JP2012063390A (ja) * | 2010-09-14 | 2012-03-29 | Dainippon Screen Mfg Co Ltd | 露光装置および光源装置 |
| JP2014207300A (ja) * | 2013-04-12 | 2014-10-30 | 株式会社オーク製作所 | 光源装置および露光装置 |
| JP2021189395A (ja) * | 2020-06-04 | 2021-12-13 | セイコーエプソン株式会社 | 照明装置およびプロジェクター |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3950553B2 (ja) | 1998-06-30 | 2007-08-01 | キヤノン株式会社 | 照明光学系及びそれを有する露光装置 |
| JP2012049226A (ja) * | 2010-08-25 | 2012-03-08 | Ushio Inc | 光源装置 |
-
2022
- 2022-08-18 WO PCT/JP2022/031205 patent/WO2024038535A1/ja not_active Ceased
- 2022-08-18 KR KR1020257001691A patent/KR20250022862A/ko active Pending
- 2022-08-18 JP JP2024541341A patent/JP7806909B2/ja active Active
- 2022-08-18 CN CN202280098378.2A patent/CN119585677A/zh active Pending
-
2023
- 2023-07-21 TW TW112127264A patent/TWI885424B/zh active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004335952A (ja) * | 2002-12-27 | 2004-11-25 | Nikon Corp | 照明光源装置、照明装置、露光装置、及び露光方法 |
| JP2006332077A (ja) * | 2005-05-23 | 2006-12-07 | Nikon Corp | 光源ユニット、照明光学装置、露光装置、および露光方法 |
| JP2012063390A (ja) * | 2010-09-14 | 2012-03-29 | Dainippon Screen Mfg Co Ltd | 露光装置および光源装置 |
| JP2014207300A (ja) * | 2013-04-12 | 2014-10-30 | 株式会社オーク製作所 | 光源装置および露光装置 |
| JP2021189395A (ja) * | 2020-06-04 | 2021-12-13 | セイコーエプソン株式会社 | 照明装置およびプロジェクター |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20250022862A (ko) | 2025-02-17 |
| TW202427060A (zh) | 2024-07-01 |
| JP7806909B2 (ja) | 2026-01-27 |
| TWI885424B (zh) | 2025-06-01 |
| CN119585677A (zh) | 2025-03-07 |
| WO2024038535A1 (ja) | 2024-02-22 |
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