TWI885424B - 照明單元、曝光裝置、及曝光方法 - Google Patents

照明單元、曝光裝置、及曝光方法 Download PDF

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Publication number
TWI885424B
TWI885424B TW112127264A TW112127264A TWI885424B TW I885424 B TWI885424 B TW I885424B TW 112127264 A TW112127264 A TW 112127264A TW 112127264 A TW112127264 A TW 112127264A TW I885424 B TWI885424 B TW I885424B
Authority
TW
Taiwan
Prior art keywords
light
optical system
emitting portion
light source
lighting unit
Prior art date
Application number
TW112127264A
Other languages
English (en)
Chinese (zh)
Other versions
TW202427060A (zh
Inventor
岩永正也
川戸聡
大川智之
中臣聡
Original Assignee
日商尼康股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商尼康股份有限公司 filed Critical 日商尼康股份有限公司
Publication of TW202427060A publication Critical patent/TW202427060A/zh
Application granted granted Critical
Publication of TWI885424B publication Critical patent/TWI885424B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70183—Zoom systems for adjusting beam diameter
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
TW112127264A 2022-08-18 2023-07-21 照明單元、曝光裝置、及曝光方法 TWI885424B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
WOPCT/JP2022/031205 2022-08-18
PCT/JP2022/031205 WO2024038535A1 (ja) 2022-08-18 2022-08-18 照明ユニット、露光装置、及び露光方法

Publications (2)

Publication Number Publication Date
TW202427060A TW202427060A (zh) 2024-07-01
TWI885424B true TWI885424B (zh) 2025-06-01

Family

ID=89941584

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112127264A TWI885424B (zh) 2022-08-18 2023-07-21 照明單元、曝光裝置、及曝光方法

Country Status (5)

Country Link
JP (1) JP7806909B2 (https=)
KR (1) KR20250022862A (https=)
CN (1) CN119585677A (https=)
TW (1) TWI885424B (https=)
WO (1) WO2024038535A1 (https=)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012049226A (ja) * 2010-08-25 2012-03-08 Ushio Inc 光源装置
TW201506549A (zh) * 2013-04-12 2015-02-16 奧克製作所股份有限公司 光源裝置及曝光裝置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3950553B2 (ja) 1998-06-30 2007-08-01 キヤノン株式会社 照明光学系及びそれを有する露光装置
JP2004335952A (ja) * 2002-12-27 2004-11-25 Nikon Corp 照明光源装置、照明装置、露光装置、及び露光方法
JP4678493B2 (ja) * 2005-05-23 2011-04-27 株式会社ニコン 光源ユニット、照明光学装置、露光装置、および露光方法
JP5687013B2 (ja) * 2010-09-14 2015-03-18 株式会社Ｓｃｒｅｅｎホールディングス 露光装置および光源装置
JP7400632B2 (ja) * 2020-06-04 2023-12-19 セイコーエプソン株式会社 照明装置およびプロジェクター

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012049226A (ja) * 2010-08-25 2012-03-08 Ushio Inc 光源装置
TW201506549A (zh) * 2013-04-12 2015-02-16 奧克製作所股份有限公司 光源裝置及曝光裝置

Also Published As

Publication number Publication date
KR20250022862A (ko) 2025-02-17
TW202427060A (zh) 2024-07-01
JP7806909B2 (ja) 2026-01-27
CN119585677A (zh) 2025-03-07
WO2024038535A1 (ja) 2024-02-22
JPWO2024038535A1 (https=) 2024-02-22

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