JP7780803B2 - 金属ガス封入セル及びその製造方法 - Google Patents

金属ガス封入セル及びその製造方法

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Publication number
JP7780803B2
JP7780803B2 JP2022560741A JP2022560741A JP7780803B2 JP 7780803 B2 JP7780803 B2 JP 7780803B2 JP 2022560741 A JP2022560741 A JP 2022560741A JP 2022560741 A JP2022560741 A JP 2022560741A JP 7780803 B2 JP7780803 B2 JP 7780803B2
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JP
Japan
Prior art keywords
gas
metal gas
cell body
cell
metal
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Application number
JP2022560741A
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English (en)
Japanese (ja)
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JPWO2022097557A1 (https=
Inventor
義和 平井
俊 清瀬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyoto University NUC
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Kyoto University NUC
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Publication of JPWO2022097557A1 publication Critical patent/JPWO2022097557A1/ja
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Classifications

    • G—PHYSICS
    • G04—HOROLOGY
    • G04F—TIME-INTERVAL MEASURING
    • G04F5/00—Apparatus for producing preselected time intervals for use as timing standards
    • G04F5/14—Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03L—AUTOMATIC CONTROL, STARTING, SYNCHRONISATION OR STABILISATION OF GENERATORS OF ELECTRONIC OSCILLATIONS OR PULSES
    • H03L7/00—Automatic control of frequency or phase; Synchronisation
    • H03L7/26—Automatic control of frequency or phase; Synchronisation using energy levels of molecules, atoms, or subatomic particles as a frequency reference
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N21/03—Cuvette constructions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/20—Arrangements or instruments for measuring magnetic variables involving magnetic resonance
    • G01R33/24—Arrangements or instruments for measuring magnetic variables involving magnetic resonance for measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/26—Arrangements or instruments for measuring magnetic variables involving magnetic resonance for measuring direction or magnitude of magnetic fields or magnetic flux using optical pumping
    • G—PHYSICS
    • G04—HOROLOGY
    • G04F—TIME-INTERVAL MEASURING
    • G04F5/00—Apparatus for producing preselected time intervals for use as timing standards
    • G04F5/14—Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
    • G04F5/145—Apparatus for producing preselected time intervals for use as timing standards using atomic clocks using Coherent Population Trapping

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Ecology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Chemical & Material Sciences (AREA)
  • Optical Measuring Cells (AREA)
JP2022560741A 2020-11-06 2021-10-27 金属ガス封入セル及びその製造方法 Active JP7780803B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020185571 2020-11-06
JP2020185571 2020-11-06
PCT/JP2021/039690 WO2022097557A1 (ja) 2020-11-06 2021-10-27 金属ガス封入セル及びその製造方法

Publications (2)

Publication Number Publication Date
JPWO2022097557A1 JPWO2022097557A1 (https=) 2022-05-12
JP7780803B2 true JP7780803B2 (ja) 2025-12-05

Family

ID=81457859

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022560741A Active JP7780803B2 (ja) 2020-11-06 2021-10-27 金属ガス封入セル及びその製造方法

Country Status (4)

Country Link
US (1) US20230412178A1 (https=)
EP (1) EP4243225A4 (https=)
JP (1) JP7780803B2 (https=)
WO (1) WO2022097557A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2024053527A1 (https=) 2022-09-09 2024-03-14

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150027908A1 (en) 2013-07-23 2015-01-29 Texas Instruments Incorporated Multiple-cavity vapor cell structure for micro-fabricated atomic clocks, magnetometers, and other devices
US20150028866A1 (en) 2013-07-23 2015-01-29 Texas Instruments Incorporated Vapor cell structure having cavities connected by channels for micro-fabricated atomic clocks, magnetometers, and other devices
JP2016207695A (ja) 2015-04-15 2016-12-08 セイコーエプソン株式会社 原子セル、原子セルの製造方法、量子干渉装置、原子発振器、電子機器および移動体
JP2018163910A (ja) 2017-03-24 2018-10-18 セイコーエプソン株式会社 ガスセルの製造方法、ガスセル、磁気計測装置、および原子発振器

Family Cites Families (19)

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Publication number Priority date Publication date Assignee Title
US8218590B2 (en) * 2010-02-04 2012-07-10 Honeywell International Inc. Designs and processes for thermally stabilizing a vertical cavity surface emitting laser (vcsel) in a chip-scale atomic clock
US8299860B2 (en) * 2010-02-04 2012-10-30 Honeywell International Inc. Fabrication techniques to enhance pressure uniformity in anodically bonded vapor cells
US8941442B2 (en) * 2010-02-04 2015-01-27 Honeywell International Inc. Fabrication techniques to enhance pressure uniformity in anodically bonded vapor cells
JP5821439B2 (ja) * 2011-02-16 2015-11-24 セイコーエプソン株式会社 ガスセルの製造方法
JP5699725B2 (ja) * 2011-03-23 2015-04-15 セイコーエプソン株式会社 ガスセル製造装置およびガスセルの製造方法
JP6031787B2 (ja) 2011-07-13 2016-11-24 株式会社リコー 原子発振器の製造方法
JP6036230B2 (ja) * 2012-11-30 2016-11-30 株式会社リコー アルカリ金属セルの製造方法及び原子発振器の製造方法
JP6179277B2 (ja) * 2013-08-29 2017-08-16 株式会社リコー アルカリ金属セルの製造方法及び原子発振器の製造方法
JP6171748B2 (ja) * 2013-09-05 2017-08-02 セイコーエプソン株式会社 原子セル、量子干渉装置、原子発振器、電子機器および移動体
JP6435617B2 (ja) * 2014-03-20 2018-12-12 セイコーエプソン株式会社 原子セル、量子干渉装置、原子発振器および電子機器
JP2016070900A (ja) * 2014-10-02 2016-05-09 セイコーエプソン株式会社 磁気計測装置の製造方法、ガスセルの製造方法、磁気計測装置、およびガスセル
JP2016080613A (ja) * 2014-10-21 2016-05-16 セイコーエプソン株式会社 磁気計測装置、ガスセル、磁気計測装置の製造方法、およびガスセルの製造方法
JP6476751B2 (ja) * 2014-10-29 2019-03-06 セイコーエプソン株式会社 原子セルの製造方法、原子セル、量子干渉装置、原子発振器および電子機器
JP2016092465A (ja) * 2014-10-30 2016-05-23 セイコーエプソン株式会社 原子セルの製造方法、原子セル、量子干渉装置、原子発振器、電子機器および移動体
FR3038892B1 (fr) * 2015-07-16 2017-08-11 Centre Nat Rech Scient Cellule a gaz pour un capteur atomique et procede de remplissage d'une cellule a gaz
JP2017098373A (ja) * 2015-11-20 2017-06-01 株式会社リコー ガスセル、ガスセルの製造方法、及び原子発振器
US10396809B2 (en) * 2016-02-19 2019-08-27 Seiko Epson Corporation Atomic cell, atomic cell manufacturing method, quantum interference device, atomic oscillator, electronic apparatus, and vehicle
WO2018096730A1 (ja) * 2016-11-22 2018-05-31 株式会社村田製作所 原子発振器および電子機器
JP6841190B2 (ja) * 2017-08-31 2021-03-10 セイコーエプソン株式会社 周波数信号生成装置および周波数信号生成システム

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150027908A1 (en) 2013-07-23 2015-01-29 Texas Instruments Incorporated Multiple-cavity vapor cell structure for micro-fabricated atomic clocks, magnetometers, and other devices
US20150028866A1 (en) 2013-07-23 2015-01-29 Texas Instruments Incorporated Vapor cell structure having cavities connected by channels for micro-fabricated atomic clocks, magnetometers, and other devices
JP2016207695A (ja) 2015-04-15 2016-12-08 セイコーエプソン株式会社 原子セル、原子セルの製造方法、量子干渉装置、原子発振器、電子機器および移動体
JP2018163910A (ja) 2017-03-24 2018-10-18 セイコーエプソン株式会社 ガスセルの製造方法、ガスセル、磁気計測装置、および原子発振器

Also Published As

Publication number Publication date
EP4243225A4 (en) 2024-09-04
WO2022097557A1 (ja) 2022-05-12
EP4243225A1 (en) 2023-09-13
JPWO2022097557A1 (https=) 2022-05-12
US20230412178A1 (en) 2023-12-21

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