JPWO2024053527A1 - - Google Patents
Info
- Publication number
- JPWO2024053527A1 JPWO2024053527A1 JP2024545616A JP2024545616A JPWO2024053527A1 JP WO2024053527 A1 JPWO2024053527 A1 JP WO2024053527A1 JP 2024545616 A JP2024545616 A JP 2024545616A JP 2024545616 A JP2024545616 A JP 2024545616A JP WO2024053527 A1 JPWO2024053527 A1 JP WO2024053527A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G04—HOROLOGY
- G04F—TIME-INTERVAL MEASURING
- G04F5/00—Apparatus for producing preselected time intervals for use as timing standards
- G04F5/14—Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
- G04F5/145—Apparatus for producing preselected time intervals for use as timing standards using atomic clocks using Coherent Population Trapping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00119—Arrangement of basic structures like cavities or channels, e.g. suitable for microfluidic systems
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/20—Arrangements or instruments for measuring magnetic variables involving magnetic resonance
- G01R33/24—Arrangements or instruments for measuring magnetic variables involving magnetic resonance for measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/26—Arrangements or instruments for measuring magnetic variables involving magnetic resonance for measuring direction or magnitude of magnetic fields or magnetic flux using optical pumping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/03—Static structures
- B81B2203/0315—Cavities
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/03—Static structures
- B81B2203/0361—Tips, pillars
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0128—Processes for removing material
- B81C2201/013—Etching
- B81C2201/0132—Dry etching, i.e. plasma etching, barrel etching, reactive ion etching [RIE], sputter etching or ion milling
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/03—Bonding two components
- B81C2203/031—Anodic bondings
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Ecology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Dispersion Chemistry (AREA)
- Analytical Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optical Measuring Cells (AREA)
- Stabilization Of Oscillater, Synchronisation, Frequency Synthesizers (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022143731 | 2022-09-09 | ||
| PCT/JP2023/031643 WO2024053527A1 (ja) | 2022-09-09 | 2023-08-30 | 金属ガス封入セル |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024053527A1 true JPWO2024053527A1 (https=) | 2024-03-14 |
Family
ID=90190992
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024545616A Pending JPWO2024053527A1 (https=) | 2022-09-09 | 2023-08-30 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20260079451A1 (https=) |
| EP (1) | EP4586419A1 (https=) |
| JP (1) | JPWO2024053527A1 (https=) |
| CN (1) | CN119585961A (https=) |
| WO (1) | WO2024053527A1 (https=) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6031787B2 (ja) | 2011-07-13 | 2016-11-24 | 株式会社リコー | 原子発振器の製造方法 |
| JP7528597B2 (ja) * | 2020-07-20 | 2024-08-06 | 日本電気硝子株式会社 | 原子セル及びその製造方法 |
| EP4243225A4 (en) | 2020-11-06 | 2024-09-04 | Kyoto University | METAL GAS SEALED CELL AND ITS MANUFACTURING METHOD |
-
2023
- 2023-08-30 JP JP2024545616A patent/JPWO2024053527A1/ja active Pending
- 2023-08-30 US US19/109,995 patent/US20260079451A1/en active Pending
- 2023-08-30 EP EP23863065.1A patent/EP4586419A1/en active Pending
- 2023-08-30 WO PCT/JP2023/031643 patent/WO2024053527A1/ja not_active Ceased
- 2023-08-30 CN CN202380058027.3A patent/CN119585961A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US20260079451A1 (en) | 2026-03-19 |
| CN119585961A (zh) | 2025-03-07 |
| EP4586419A1 (en) | 2025-07-16 |
| WO2024053527A1 (ja) | 2024-03-14 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20250304 |