JPWO2024053527A1 - - Google Patents

Info

Publication number
JPWO2024053527A1
JPWO2024053527A1 JP2024545616A JP2024545616A JPWO2024053527A1 JP WO2024053527 A1 JPWO2024053527 A1 JP WO2024053527A1 JP 2024545616 A JP2024545616 A JP 2024545616A JP 2024545616 A JP2024545616 A JP 2024545616A JP WO2024053527 A1 JPWO2024053527 A1 JP WO2024053527A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024545616A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2024053527A1 publication Critical patent/JPWO2024053527A1/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G04HOROLOGY
    • G04FTIME-INTERVAL MEASURING
    • G04F5/00Apparatus for producing preselected time intervals for use as timing standards
    • G04F5/14Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
    • G04F5/145Apparatus for producing preselected time intervals for use as timing standards using atomic clocks using Coherent Population Trapping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00119Arrangement of basic structures like cavities or channels, e.g. suitable for microfluidic systems
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00Arrangements or instruments for measuring magnetic variables
    • G01R33/20Arrangements or instruments for measuring magnetic variables involving magnetic resonance
    • G01R33/24Arrangements or instruments for measuring magnetic variables involving magnetic resonance for measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/26Arrangements or instruments for measuring magnetic variables involving magnetic resonance for measuring direction or magnitude of magnetic fields or magnetic flux using optical pumping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00Basic microelectromechanical structures
    • B81B2203/03Static structures
    • B81B2203/0315Cavities
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00Basic microelectromechanical structures
    • B81B2203/03Static structures
    • B81B2203/0361Tips, pillars
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00Manufacture or treatment of microstructural devices or systems
    • B81C2201/01Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0128Processes for removing material
    • B81C2201/013Etching
    • B81C2201/0132Dry etching, i.e. plasma etching, barrel etching, reactive ion etching [RIE], sputter etching or ion milling
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00Forming microstructural systems
    • B81C2203/03Bonding two components
    • B81C2203/031Anodic bondings

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Ecology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Dispersion Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optical Measuring Cells (AREA)
  • Stabilization Of Oscillater, Synchronisation, Frequency Synthesizers (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2024545616A 2022-09-09 2023-08-30 Pending JPWO2024053527A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022143731 2022-09-09
PCT/JP2023/031643 WO2024053527A1 (ja) 2022-09-09 2023-08-30 金属ガス封入セル

Publications (1)

Publication Number Publication Date
JPWO2024053527A1 true JPWO2024053527A1 (https=) 2024-03-14

Family

ID=90190992

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024545616A Pending JPWO2024053527A1 (https=) 2022-09-09 2023-08-30

Country Status (5)

Country Link
US (1) US20260079451A1 (https=)
EP (1) EP4586419A1 (https=)
JP (1) JPWO2024053527A1 (https=)
CN (1) CN119585961A (https=)
WO (1) WO2024053527A1 (https=)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6031787B2 (ja) 2011-07-13 2016-11-24 株式会社リコー 原子発振器の製造方法
JP7528597B2 (ja) * 2020-07-20 2024-08-06 日本電気硝子株式会社 原子セル及びその製造方法
EP4243225A4 (en) 2020-11-06 2024-09-04 Kyoto University METAL GAS SEALED CELL AND ITS MANUFACTURING METHOD

Also Published As

Publication number Publication date
US20260079451A1 (en) 2026-03-19
CN119585961A (zh) 2025-03-07
EP4586419A1 (en) 2025-07-16
WO2024053527A1 (ja) 2024-03-14

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Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20250304