JP7761165B2 - めっき組成物の再生方法および再生装置 - Google Patents

めっき組成物の再生方法および再生装置

Info

Publication number
JP7761165B2
JP7761165B2 JP2024561152A JP2024561152A JP7761165B2 JP 7761165 B2 JP7761165 B2 JP 7761165B2 JP 2024561152 A JP2024561152 A JP 2024561152A JP 2024561152 A JP2024561152 A JP 2024561152A JP 7761165 B2 JP7761165 B2 JP 7761165B2
Authority
JP
Japan
Prior art keywords
tin
ions
plating composition
surfactant
working electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2024561152A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2024116456A5 (https=
JPWO2024116456A1 (https=
Inventor
誠 小川
孝宣 西本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Publication of JPWO2024116456A1 publication Critical patent/JPWO2024116456A1/ja
Publication of JPWO2024116456A5 publication Critical patent/JPWO2024116456A5/ja
Application granted granted Critical
Publication of JP7761165B2 publication Critical patent/JP7761165B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/30—Electroplating: Baths therefor from solutions of tin

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
JP2024561152A 2022-11-28 2023-07-14 めっき組成物の再生方法および再生装置 Active JP7761165B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022189216 2022-11-28
JP2022189216 2022-11-28
PCT/JP2023/026074 WO2024116456A1 (ja) 2022-11-28 2023-07-14 めっき組成物の再生方法および再生装置

Publications (3)

Publication Number Publication Date
JPWO2024116456A1 JPWO2024116456A1 (https=) 2024-06-06
JPWO2024116456A5 JPWO2024116456A5 (https=) 2025-01-17
JP7761165B2 true JP7761165B2 (ja) 2025-10-28

Family

ID=91323243

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2024561152A Active JP7761165B2 (ja) 2022-11-28 2023-07-14 めっき組成物の再生方法および再生装置
JP2024561476A Active JP7841621B2 (ja) 2022-11-28 2023-11-27 めっき方法および電子部品の製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2024561476A Active JP7841621B2 (ja) 2022-11-28 2023-11-27 めっき方法および電子部品の製造方法

Country Status (4)

Country Link
JP (2) JP7761165B2 (https=)
CN (1) CN119384526A (https=)
TW (1) TWI875301B (https=)
WO (2) WO2024116456A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025169771A1 (ja) * 2024-02-06 2025-08-14 株式会社村田製作所 めっき組成物の製造方法および製造装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004534151A (ja) 2001-07-03 2004-11-11 アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング めっき溶液の再生方法
JP2015518923A (ja) 2012-06-05 2015-07-06 アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング めっき組成物を再生するための方法および再生設備

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6263692A (ja) * 1985-05-10 1987-03-20 C Uyemura & Co Ltd 表面処理液中の４価の錫イオンの除去方法
JPH05186899A (ja) * 1992-01-10 1993-07-27 Kawasaki Steel Corp 成分管理装置付錫めっき装置
JPH05320926A (ja) * 1992-05-19 1993-12-07 Mitsubishi Electric Corp 無電解めっき液の再生方法
JPH06256999A (ja) * 1993-03-05 1994-09-13 Kawasaki Steel Corp 錫めっき液を回収再生する方法
CA2389343A1 (en) * 1999-10-29 2001-05-10 Henkel Corporation Composition and process for treating metals

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004534151A (ja) 2001-07-03 2004-11-11 アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング めっき溶液の再生方法
JP2015518923A (ja) 2012-06-05 2015-07-06 アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング めっき組成物を再生するための方法および再生設備

Also Published As

Publication number Publication date
TW202428933A (zh) 2024-07-16
CN119384526A (zh) 2025-01-28
WO2024116456A1 (ja) 2024-06-06
WO2024117086A1 (ja) 2024-06-06
JP7841621B2 (ja) 2026-04-07
TWI875301B (zh) 2025-03-01
JPWO2024116456A1 (https=) 2024-06-06
JPWO2024117086A1 (https=) 2024-06-06

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