CN119384526A - 镀覆组合物的再生方法和再生装置 - Google Patents

镀覆组合物的再生方法和再生装置 Download PDF

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Publication number
CN119384526A
CN119384526A CN202380047995.4A CN202380047995A CN119384526A CN 119384526 A CN119384526 A CN 119384526A CN 202380047995 A CN202380047995 A CN 202380047995A CN 119384526 A CN119384526 A CN 119384526A
Authority
CN
China
Prior art keywords
plating composition
tin
ions
surfactant
working electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202380047995.4A
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English (en)
Chinese (zh)
Inventor
小川诚
西本孝宣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Publication of CN119384526A publication Critical patent/CN119384526A/zh
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/30—Electroplating: Baths therefor from solutions of tin

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
CN202380047995.4A 2022-11-28 2023-07-14 镀覆组合物的再生方法和再生装置 Pending CN119384526A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022189216 2022-11-28
JP2022-189216 2022-11-28
PCT/JP2023/026074 WO2024116456A1 (ja) 2022-11-28 2023-07-14 めっき組成物の再生方法および再生装置

Publications (1)

Publication Number Publication Date
CN119384526A true CN119384526A (zh) 2025-01-28

Family

ID=91323243

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202380047995.4A Pending CN119384526A (zh) 2022-11-28 2023-07-14 镀覆组合物的再生方法和再生装置

Country Status (4)

Country Link
JP (2) JP7761165B2 (https=)
CN (1) CN119384526A (https=)
TW (1) TWI875301B (https=)
WO (2) WO2024116456A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025169771A1 (ja) * 2024-02-06 2025-08-14 株式会社村田製作所 めっき組成物の製造方法および製造装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6263692A (ja) * 1985-05-10 1987-03-20 C Uyemura & Co Ltd 表面処理液中の４価の錫イオンの除去方法
JPH05186899A (ja) * 1992-01-10 1993-07-27 Kawasaki Steel Corp 成分管理装置付錫めっき装置
JPH05320926A (ja) * 1992-05-19 1993-12-07 Mitsubishi Electric Corp 無電解めっき液の再生方法
JPH06256999A (ja) * 1993-03-05 1994-09-13 Kawasaki Steel Corp 錫めっき液を回収再生する方法
CA2389343A1 (en) * 1999-10-29 2001-05-10 Henkel Corporation Composition and process for treating metals
DE10132478C1 (de) * 2001-07-03 2003-04-30 Atotech Deutschland Gmbh Verfahren zum Abscheiden einer Metallschicht sowie Verfahren zum Regenerieren einer Metallionen in einer hohen Oxidationsstufe enthaltenden Lösung
EP2671968B1 (en) * 2012-06-05 2014-11-26 ATOTECH Deutschland GmbH Method and regeneration apparatus for regenerating a plating composition

Also Published As

Publication number Publication date
TW202428933A (zh) 2024-07-16
WO2024116456A1 (ja) 2024-06-06
WO2024117086A1 (ja) 2024-06-06
JP7761165B2 (ja) 2025-10-28
JP7841621B2 (ja) 2026-04-07
TWI875301B (zh) 2025-03-01
JPWO2024116456A1 (https=) 2024-06-06
JPWO2024117086A1 (https=) 2024-06-06

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