JP7721643B2 - 基板収納容器 - Google Patents
基板収納容器Info
- Publication number
- JP7721643B2 JP7721643B2 JP2023529244A JP2023529244A JP7721643B2 JP 7721643 B2 JP7721643 B2 JP 7721643B2 JP 2023529244 A JP2023529244 A JP 2023529244A JP 2023529244 A JP2023529244 A JP 2023529244A JP 7721643 B2 JP7721643 B2 JP 7721643B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- substrate storage
- chamber
- container body
- wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
- H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
- H10P72/1924—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
- H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
- H10P72/1911—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by materials, roughness, coatings or the like
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
- H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
- H10P72/1924—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control
- H10P72/1926—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrier
Landscapes
- Packaging Frangible Articles (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2021/023474 WO2022269718A1 (ja) | 2021-06-21 | 2021-06-21 | 基板収納容器 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2022269718A1 JPWO2022269718A1 (https=) | 2022-12-29 |
| JPWO2022269718A5 JPWO2022269718A5 (https=) | 2024-04-18 |
| JP7721643B2 true JP7721643B2 (ja) | 2025-08-12 |
Family
ID=84545304
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023529244A Active JP7721643B2 (ja) | 2021-06-21 | 2021-06-21 | 基板収納容器 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US12374573B2 (https=) |
| JP (1) | JP7721643B2 (https=) |
| KR (1) | KR102798614B1 (https=) |
| CN (1) | CN117296140A (https=) |
| TW (1) | TW202301528A (https=) |
| WO (1) | WO2022269718A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12424472B2 (en) * | 2021-03-29 | 2025-09-23 | Miraial Co., Ltd. | Substrate storing container |
| US12347711B2 (en) | 2021-08-17 | 2025-07-01 | Gudeng Precision Industrial Co., Ltd. | Gas diffusion device, and wafer container including the same |
| TWI858804B (zh) * | 2022-12-01 | 2024-10-11 | 家登精密工業股份有限公司 | 晶圓載具量測裝置 |
| TWI897695B (zh) * | 2024-02-20 | 2025-09-11 | 中勤實業股份有限公司 | 具有供流體進入之氣體擴散裝置的基板容器 |
| WO2026009428A1 (ja) * | 2024-07-05 | 2026-01-08 | ミライアル株式会社 | 基板収納容器及び気体噴出ノズル部 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011514014A (ja) | 2008-03-13 | 2011-04-28 | インテグリス インコーポレーテッド | 管状制御要素を有するウエハーコンテナ |
| JP2013513951A (ja) | 2009-12-10 | 2013-04-22 | インテグリス・インコーポレーテッド | 微小環境中に均一に分布した浄化ガスを得るための多孔質バリア |
| JP3198841U (ja) | 2014-06-09 | 2015-07-23 | 家登精密工業股▲ふん▼有限公司 | ウエハポッドの気体拡散装置 |
| WO2018179964A1 (ja) | 2017-03-27 | 2018-10-04 | 信越ポリマー株式会社 | 基板収納容器 |
| JP2019216258A (ja) | 2015-03-24 | 2019-12-19 | ピコ アンド テラ カンパニー リミテッドPico & Tera Co., Ltd | ウェハー収納容器 |
| WO2021014653A1 (ja) | 2019-07-25 | 2021-01-28 | ミライアル株式会社 | 基板収納容器 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5879458A (en) * | 1996-09-13 | 1999-03-09 | Semifab Incorporated | Molecular contamination control system |
| SG11201602916VA (en) | 2013-10-14 | 2016-05-30 | Entegris Inc | Towers for substrate carriers |
| JP6265844B2 (ja) | 2014-06-18 | 2018-01-24 | 信越ポリマー株式会社 | 基板収納容器 |
| JP6424728B2 (ja) | 2014-07-03 | 2018-11-21 | Tdk株式会社 | 半導体磁器組成物およびｐｔｃサーミスタ |
| JP6400534B2 (ja) | 2015-07-06 | 2018-10-03 | 信越ポリマー株式会社 | 基板収納容器 |
| SG11201901884RA (en) * | 2016-09-06 | 2019-04-29 | Shin Etsu Polymer Co Ltd | Substrate Storage Container and Gas Replacement Unit |
| WO2018203384A1 (ja) * | 2017-05-02 | 2018-11-08 | ミライアル株式会社 | 基板収納容器 |
| US10937677B2 (en) * | 2018-04-02 | 2021-03-02 | Bum Je WOO | Wafer storage container |
| US11948821B2 (en) * | 2018-04-25 | 2024-04-02 | Miraial Co., Ltd. | Substrate storing container |
| KR20200011290A (ko) | 2018-07-24 | 2020-02-03 | 세메스 주식회사 | 기판 처리 장치 |
| US10879099B2 (en) * | 2018-08-15 | 2020-12-29 | Taiwan Semiconductor Manufacturing Co., Ltd. | Humidity control in storage device |
| CN112289718A (zh) | 2019-07-13 | 2021-01-29 | 家登精密工业股份有限公司 | 基板载具及其气体扩散模块 |
| US11820575B2 (en) * | 2020-10-23 | 2023-11-21 | Miraial Co., Ltd. | Substrate storing container, method for manufacturing the same, and filter unit |
-
2021
- 2021-06-21 CN CN202180097767.9A patent/CN117296140A/zh active Pending
- 2021-06-21 US US18/573,927 patent/US12374573B2/en active Active
- 2021-06-21 WO PCT/JP2021/023474 patent/WO2022269718A1/ja not_active Ceased
- 2021-06-21 KR KR1020237038160A patent/KR102798614B1/ko active Active
- 2021-06-21 JP JP2023529244A patent/JP7721643B2/ja active Active
-
2022
- 2022-06-15 TW TW111122156A patent/TW202301528A/zh unknown
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011514014A (ja) | 2008-03-13 | 2011-04-28 | インテグリス インコーポレーテッド | 管状制御要素を有するウエハーコンテナ |
| JP2013513951A (ja) | 2009-12-10 | 2013-04-22 | インテグリス・インコーポレーテッド | 微小環境中に均一に分布した浄化ガスを得るための多孔質バリア |
| JP3198841U (ja) | 2014-06-09 | 2015-07-23 | 家登精密工業股▲ふん▼有限公司 | ウエハポッドの気体拡散装置 |
| JP2019216258A (ja) | 2015-03-24 | 2019-12-19 | ピコ アンド テラ カンパニー リミテッドPico & Tera Co., Ltd | ウェハー収納容器 |
| WO2018179964A1 (ja) | 2017-03-27 | 2018-10-04 | 信越ポリマー株式会社 | 基板収納容器 |
| WO2021014653A1 (ja) | 2019-07-25 | 2021-01-28 | ミライアル株式会社 | 基板収納容器 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022269718A1 (ja) | 2022-12-29 |
| US20240145284A1 (en) | 2024-05-02 |
| TW202301528A (zh) | 2023-01-01 |
| KR102798614B1 (ko) | 2025-04-18 |
| US12374573B2 (en) | 2025-07-29 |
| CN117296140A (zh) | 2023-12-26 |
| JPWO2022269718A1 (https=) | 2022-12-29 |
| KR20240024780A (ko) | 2024-02-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
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| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
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| A61 | First payment of annual fees (during grant procedure) |
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| R150 | Certificate of patent or registration of utility model |
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