KR102798614B1 - 기판수납용기 - Google Patents

기판수납용기 Download PDF

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Publication number
KR102798614B1
KR102798614B1 KR1020237038160A KR20237038160A KR102798614B1 KR 102798614 B1 KR102798614 B1 KR 102798614B1 KR 1020237038160 A KR1020237038160 A KR 1020237038160A KR 20237038160 A KR20237038160 A KR 20237038160A KR 102798614 B1 KR102798614 B1 KR 102798614B1
Authority
KR
South Korea
Prior art keywords
gas
substrate storage
container body
room
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020237038160A
Other languages
English (en)
Korean (ko)
Other versions
KR20240024780A (ko
Inventor
지아키 마쓰토리
Original Assignee
미라이얼 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미라이얼 가부시키가이샤 filed Critical 미라이얼 가부시키가이샤
Publication of KR20240024780A publication Critical patent/KR20240024780A/ko
Application granted granted Critical
Publication of KR102798614B1 publication Critical patent/KR102798614B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H01L21/67393
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1924Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control
    • H01L21/67366
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1911Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by materials, roughness, coatings or the like
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1924Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control
    • H10P72/1926Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrier

Landscapes

  • Packaging Frangible Articles (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020237038160A 2021-06-21 2021-06-21 기판수납용기 Active KR102798614B1 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/023474 WO2022269718A1 (ja) 2021-06-21 2021-06-21 基板収納容器

Publications (2)

Publication Number Publication Date
KR20240024780A KR20240024780A (ko) 2024-02-26
KR102798614B1 true KR102798614B1 (ko) 2025-04-18

Family

ID=84545304

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237038160A Active KR102798614B1 (ko) 2021-06-21 2021-06-21 기판수납용기

Country Status (6)

Country Link
US (1) US12374573B2 (https=)
JP (1) JP7721643B2 (https=)
KR (1) KR102798614B1 (https=)
CN (1) CN117296140A (https=)
TW (1) TW202301528A (https=)
WO (1) WO2022269718A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12424472B2 (en) * 2021-03-29 2025-09-23 Miraial Co., Ltd. Substrate storing container
US12347711B2 (en) 2021-08-17 2025-07-01 Gudeng Precision Industrial Co., Ltd. Gas diffusion device, and wafer container including the same
TWI858804B (zh) * 2022-12-01 2024-10-11 家登精密工業股份有限公司 晶圓載具量測裝置
TWI897695B (zh) * 2024-02-20 2025-09-11 中勤實業股份有限公司 具有供流體進入之氣體擴散裝置的基板容器
WO2026009428A1 (ja) * 2024-07-05 2026-01-08 ミライアル株式会社 基板収納容器及び気体噴出ノズル部

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20210013076A1 (en) 2019-07-13 2021-01-14 Gudeng Precision Industrial Co., Ltd Substrate container system
WO2021014653A1 (ja) 2019-07-25 2021-01-28 ミライアル株式会社 基板収納容器

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5879458A (en) * 1996-09-13 1999-03-09 Semifab Incorporated Molecular contamination control system
EP2272088B1 (en) 2008-03-13 2016-12-07 Entegris, Inc. Wafer container with tubular environmental control components
TWI515159B (zh) 2009-12-10 2016-01-01 安堤格里斯公司 用於微環境之可供滌洗氣穿透之多孔壁
SG11201602916VA (en) 2013-10-14 2016-05-30 Entegris Inc Towers for substrate carriers
TWM489155U (en) * 2014-06-09 2014-11-01 Gudeng Precision Industrial Co Ltd Gas diffusion device of wafer pod
JP6265844B2 (ja) 2014-06-18 2018-01-24 信越ポリマー株式会社 基板収納容器
JP6424728B2 (ja) 2014-07-03 2018-11-21 Tdk株式会社 半導体磁器組成物およびptcサーミスタ
KR101637498B1 (ko) 2015-03-24 2016-07-07 피코앤테라(주) 웨이퍼 수납용기
JP6400534B2 (ja) 2015-07-06 2018-10-03 信越ポリマー株式会社 基板収納容器
SG11201901884RA (en) * 2016-09-06 2019-04-29 Shin Etsu Polymer Co Ltd Substrate Storage Container and Gas Replacement Unit
SG11201908168WA (en) * 2017-03-27 2019-10-30 Shin Etsu Polymer Co Ltd Substrate storage container
WO2018203384A1 (ja) * 2017-05-02 2018-11-08 ミライアル株式会社 基板収納容器
US10937677B2 (en) * 2018-04-02 2021-03-02 Bum Je WOO Wafer storage container
US11948821B2 (en) * 2018-04-25 2024-04-02 Miraial Co., Ltd. Substrate storing container
KR20200011290A (ko) 2018-07-24 2020-02-03 세메스 주식회사 기판 처리 장치
US10879099B2 (en) * 2018-08-15 2020-12-29 Taiwan Semiconductor Manufacturing Co., Ltd. Humidity control in storage device
US11820575B2 (en) * 2020-10-23 2023-11-21 Miraial Co., Ltd. Substrate storing container, method for manufacturing the same, and filter unit

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20210013076A1 (en) 2019-07-13 2021-01-14 Gudeng Precision Industrial Co., Ltd Substrate container system
WO2021014653A1 (ja) 2019-07-25 2021-01-28 ミライアル株式会社 基板収納容器

Also Published As

Publication number Publication date
JP7721643B2 (ja) 2025-08-12
WO2022269718A1 (ja) 2022-12-29
US20240145284A1 (en) 2024-05-02
TW202301528A (zh) 2023-01-01
US12374573B2 (en) 2025-07-29
CN117296140A (zh) 2023-12-26
JPWO2022269718A1 (https=) 2022-12-29
KR20240024780A (ko) 2024-02-26

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A201 Request for examination
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P13-X000 Application amended

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E701 Decision to grant or registration of patent right
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GRNT Written decision to grant
PR0701 Registration of establishment

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PG1601 Publication of registration

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