JP7700860B2 - 露光装置、露光方法、デバイス製造方法およびフラットパネルディスプレイの製造方法 - Google Patents

露光装置、露光方法、デバイス製造方法およびフラットパネルディスプレイの製造方法 Download PDF

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Publication number
JP7700860B2
JP7700860B2 JP2023533109A JP2023533109A JP7700860B2 JP 7700860 B2 JP7700860 B2 JP 7700860B2 JP 2023533109 A JP2023533109 A JP 2023533109A JP 2023533109 A JP2023533109 A JP 2023533109A JP 7700860 B2 JP7700860 B2 JP 7700860B2
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Japan
Prior art keywords
exposure
substrate
pattern
modules
light modulator
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JP2023533109A
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Japanese (ja)
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JPWO2023282211A1 (https=
JPWO2023282211A5 (https=
Inventor
正紀 加藤
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Nikon Corp
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Nikon Corp
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Publication of JPWO2023282211A5 publication Critical patent/JPWO2023282211A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Liquid Crystal (AREA)
JP2023533109A 2021-07-05 2022-07-01 露光装置、露光方法、デバイス製造方法およびフラットパネルディスプレイの製造方法 Active JP7700860B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021111777 2021-07-05
JP2021111777 2021-07-05
PCT/JP2022/026497 WO2023282211A1 (ja) 2021-07-05 2022-07-01 露光装置、デバイス製造方法およびフラットパネルディスプレイの製造方法

Publications (3)

Publication Number Publication Date
JPWO2023282211A1 JPWO2023282211A1 (https=) 2023-01-12
JPWO2023282211A5 JPWO2023282211A5 (https=) 2024-03-12
JP7700860B2 true JP7700860B2 (ja) 2025-07-01

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JP2023533109A Active JP7700860B2 (ja) 2021-07-05 2022-07-01 露光装置、露光方法、デバイス製造方法およびフラットパネルディスプレイの製造方法

Country Status (5)

Country Link
JP (1) JP7700860B2 (https=)
KR (1) KR20240019240A (https=)
CN (1) CN117795423A (https=)
TW (1) TW202309672A (https=)
WO (1) WO2023282211A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118732416B (zh) * 2024-07-26 2025-01-14 东莞市桓灿微纳米科技有限公司 自动uv曝光拼模设备

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000267294A (ja) 1999-03-12 2000-09-29 Orc Mfg Co Ltd 露光装置
JP2005266779A (ja) 2004-02-18 2005-09-29 Fuji Photo Film Co Ltd 露光装置及び方法
JP2018060001A (ja) 2016-10-04 2018-04-12 東京エレクトロン株式会社 補助露光装置及び露光量分布取得方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000267294A (ja) 1999-03-12 2000-09-29 Orc Mfg Co Ltd 露光装置
JP2005266779A (ja) 2004-02-18 2005-09-29 Fuji Photo Film Co Ltd 露光装置及び方法
JP2018060001A (ja) 2016-10-04 2018-04-12 東京エレクトロン株式会社 補助露光装置及び露光量分布取得方法

Also Published As

Publication number Publication date
TW202309672A (zh) 2023-03-01
WO2023282211A1 (ja) 2023-01-12
JPWO2023282211A1 (https=) 2023-01-12
KR20240019240A (ko) 2024-02-14
CN117795423A (zh) 2024-03-29

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