KR20240019240A - 노광 장치, 디바이스 제조 방법 및 플랫 패널 디스플레이의 제조 방법 - Google Patents

노광 장치, 디바이스 제조 방법 및 플랫 패널 디스플레이의 제조 방법 Download PDF

Info

Publication number
KR20240019240A
KR20240019240A KR1020247000393A KR20247000393A KR20240019240A KR 20240019240 A KR20240019240 A KR 20240019240A KR 1020247000393 A KR1020247000393 A KR 1020247000393A KR 20247000393 A KR20247000393 A KR 20247000393A KR 20240019240 A KR20240019240 A KR 20240019240A
Authority
KR
South Korea
Prior art keywords
exposure
pattern
substrate
optical system
light modulator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247000393A
Other languages
English (en)
Korean (ko)
Inventor
마사키 가토
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20240019240A publication Critical patent/KR20240019240A/ko
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Liquid Crystal (AREA)
KR1020247000393A 2021-07-05 2022-07-01 노광 장치, 디바이스 제조 방법 및 플랫 패널 디스플레이의 제조 방법 Pending KR20240019240A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2021-111777 2021-07-05
JP2021111777 2021-07-05
PCT/JP2022/026497 WO2023282211A1 (ja) 2021-07-05 2022-07-01 露光装置、デバイス製造方法およびフラットパネルディスプレイの製造方法

Publications (1)

Publication Number Publication Date
KR20240019240A true KR20240019240A (ko) 2024-02-14

Family

ID=84800651

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247000393A Pending KR20240019240A (ko) 2021-07-05 2022-07-01 노광 장치, 디바이스 제조 방법 및 플랫 패널 디스플레이의 제조 방법

Country Status (5)

Country Link
JP (1) JP7700860B2 (https=)
KR (1) KR20240019240A (https=)
CN (1) CN117795423A (https=)
TW (1) TW202309672A (https=)
WO (1) WO2023282211A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118732416B (zh) * 2024-07-26 2025-01-14 东莞市桓灿微纳米科技有限公司 自动uv曝光拼模设备

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005266779A (ja) 2004-02-18 2005-09-29 Fuji Photo Film Co Ltd 露光装置及び方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000267294A (ja) * 1999-03-12 2000-09-29 Orc Mfg Co Ltd 露光装置
JP2018060001A (ja) * 2016-10-04 2018-04-12 東京エレクトロン株式会社 補助露光装置及び露光量分布取得方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005266779A (ja) 2004-02-18 2005-09-29 Fuji Photo Film Co Ltd 露光装置及び方法

Also Published As

Publication number Publication date
JP7700860B2 (ja) 2025-07-01
TW202309672A (zh) 2023-03-01
WO2023282211A1 (ja) 2023-01-12
JPWO2023282211A1 (https=) 2023-01-12
CN117795423A (zh) 2024-03-29

Similar Documents

Publication Publication Date Title
KR101240130B1 (ko) 노광 장치, 노광 방법, 및 마이크로 디바이스 제조 방법
KR101605567B1 (ko) 노광방법, 노광장치 및 디바이스 제조방법
US9001305B2 (en) Ultra-large size flat panel display maskless photolithography system and method
CN102472987A (zh) 曝光装置、曝光方法以及元件制造方法
JP7700860B2 (ja) 露光装置、露光方法、デバイス製造方法およびフラットパネルディスプレイの製造方法
KR102212541B1 (ko) 패턴 묘화 장치 및 패턴 묘화 방법
KR20100106949A (ko) 노광 방법 및 노광 장치
JPH09139340A (ja) 位置ずれ補正方法
US12493240B2 (en) Exposure apparatus, method for manufacturing device, method for manufacturing flat panel display, and exposure method
JP2012209443A (ja) パターン描画装置およびパターン描画方法
KR20170128601A (ko) 노광 장치, 플랫 패널 디스플레이의 제조 방법, 디바이스 제조 방법, 및 노광 방법
JP2010192744A (ja) 露光装置、露光方法、及びデバイス製造方法
JP2003031461A (ja) 露光装置及び露光方法
CN100549835C (zh) 曝光装置与曝光方法以及微元件的制造方法
JP7663120B2 (ja) 露光装置、デバイス製造方法およびフラットパネルディスプレイの製造方法
KR20240014514A (ko) 노광 장치 및 디바이스 제조 방법
JP2006100568A (ja) 走査型投影露光装置及びマイクロデバイスの製造方法
KR20240019246A (ko) 노광 장치 및 계측 시스템
JP2025045864A (ja) 露光装置および露光方法
JP2011248125A (ja) 露光方法、露光装置、マスク及びデバイス製造方法
JP2005026615A (ja) ステージ装置及び露光装置、計測方法
JPH05121296A (ja) アライメント装置
HK1109934A (en) Exposure device, exposure method, and micro device manufacturing method

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D14 Search report completed

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D14-SRH-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

D21 Rejection of application intended

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D21-EXM-PE0902 (AS PROVIDED BY THE NATIONAL OFFICE)

PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11 Administrative time limit extension requested

Free format text: ST27 STATUS EVENT CODE: U-3-3-T10-T11-OTH-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11 Administrative time limit extension requested

Free format text: ST27 STATUS EVENT CODE: U-3-3-T10-T11-OTH-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11 Amendment of application requested

Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P11-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000