JPWO2023282211A1 - - Google Patents
Info
- Publication number
- JPWO2023282211A1 JPWO2023282211A1 JP2023533109A JP2023533109A JPWO2023282211A1 JP WO2023282211 A1 JPWO2023282211 A1 JP WO2023282211A1 JP 2023533109 A JP2023533109 A JP 2023533109A JP 2023533109 A JP2023533109 A JP 2023533109A JP WO2023282211 A1 JPWO2023282211 A1 JP WO2023282211A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021111777 | 2021-07-05 | ||
| JP2021111777 | 2021-07-05 | ||
| PCT/JP2022/026497 WO2023282211A1 (ja) | 2021-07-05 | 2022-07-01 | 露光装置、デバイス製造方法およびフラットパネルディスプレイの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2023282211A1 true JPWO2023282211A1 (https=) | 2023-01-12 |
| JPWO2023282211A5 JPWO2023282211A5 (https=) | 2024-03-12 |
| JP7700860B2 JP7700860B2 (ja) | 2025-07-01 |
Family
ID=84800651
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023533109A Active JP7700860B2 (ja) | 2021-07-05 | 2022-07-01 | 露光装置、露光方法、デバイス製造方法およびフラットパネルディスプレイの製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7700860B2 (https=) |
| KR (1) | KR20240019240A (https=) |
| CN (1) | CN117795423A (https=) |
| TW (1) | TW202309672A (https=) |
| WO (1) | WO2023282211A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN118732416B (zh) * | 2024-07-26 | 2025-01-14 | 东莞市桓灿微纳米科技有限公司 | 自动uv曝光拼模设备 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000267294A (ja) * | 1999-03-12 | 2000-09-29 | Orc Mfg Co Ltd | 露光装置 |
| JP2005266779A (ja) * | 2004-02-18 | 2005-09-29 | Fuji Photo Film Co Ltd | 露光装置及び方法 |
| JP2018060001A (ja) * | 2016-10-04 | 2018-04-12 | 東京エレクトロン株式会社 | 補助露光装置及び露光量分布取得方法 |
-
2022
- 2022-07-01 CN CN202280043478.5A patent/CN117795423A/zh active Pending
- 2022-07-01 TW TW111124763A patent/TW202309672A/zh unknown
- 2022-07-01 WO PCT/JP2022/026497 patent/WO2023282211A1/ja not_active Ceased
- 2022-07-01 JP JP2023533109A patent/JP7700860B2/ja active Active
- 2022-07-01 KR KR1020247000393A patent/KR20240019240A/ko active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000267294A (ja) * | 1999-03-12 | 2000-09-29 | Orc Mfg Co Ltd | 露光装置 |
| JP2005266779A (ja) * | 2004-02-18 | 2005-09-29 | Fuji Photo Film Co Ltd | 露光装置及び方法 |
| JP2018060001A (ja) * | 2016-10-04 | 2018-04-12 | 東京エレクトロン株式会社 | 補助露光装置及び露光量分布取得方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7700860B2 (ja) | 2025-07-01 |
| TW202309672A (zh) | 2023-03-01 |
| WO2023282211A1 (ja) | 2023-01-12 |
| KR20240019240A (ko) | 2024-02-14 |
| CN117795423A (zh) | 2024-03-29 |
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