JP7688727B2 - アルカリ可溶性樹脂、感光性樹脂組成物及びその硬化物 - Google Patents
アルカリ可溶性樹脂、感光性樹脂組成物及びその硬化物 Download PDFInfo
- Publication number
- JP7688727B2 JP7688727B2 JP2023569364A JP2023569364A JP7688727B2 JP 7688727 B2 JP7688727 B2 JP 7688727B2 JP 2023569364 A JP2023569364 A JP 2023569364A JP 2023569364 A JP2023569364 A JP 2023569364A JP 7688727 B2 JP7688727 B2 JP 7688727B2
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- JP
- Japan
- Prior art keywords
- group
- alkali
- acid
- soluble resin
- carbon atoms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021207332 | 2021-12-21 | ||
| JP2021207332 | 2021-12-21 | ||
| JP2022165600 | 2022-10-14 | ||
| JP2022165600 | 2022-10-14 | ||
| PCT/JP2022/046165 WO2023120355A1 (ja) | 2021-12-21 | 2022-12-15 | アルカリ可溶性樹脂、感光性樹脂組成物及びその硬化物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2023120355A1 JPWO2023120355A1 (https=) | 2023-06-29 |
| JPWO2023120355A5 JPWO2023120355A5 (https=) | 2024-09-03 |
| JP7688727B2 true JP7688727B2 (ja) | 2025-06-04 |
Family
ID=86902554
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023569364A Active JP7688727B2 (ja) | 2021-12-21 | 2022-12-15 | アルカリ可溶性樹脂、感光性樹脂組成物及びその硬化物 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7688727B2 (https=) |
| TW (1) | TW202340302A (https=) |
| WO (1) | WO2023120355A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN121152825A (zh) * | 2023-08-01 | 2025-12-16 | 株式会社艾迪科 | 组合物、黑色矩阵、固化物及固化物的制造方法以及显示装置 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006071880A (ja) | 2004-09-01 | 2006-03-16 | Taiyo Ink Mfg Ltd | 光導波路材料用の光硬化性・熱硬化性ドライフィルム、及びその硬化物並びに光・電気混載基板 |
| JP2017068242A (ja) | 2015-09-30 | 2017-04-06 | 太陽インキ製造株式会社 | 硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板 |
| JP2020186325A (ja) | 2019-05-15 | 2020-11-19 | 株式会社日本触媒 | アルカリ可溶性樹脂、及び、硬化性樹脂組成物 |
| WO2021039799A1 (ja) | 2019-08-27 | 2021-03-04 | 株式会社日本触媒 | 硬化性組成物 |
-
2022
- 2022-12-15 JP JP2023569364A patent/JP7688727B2/ja active Active
- 2022-12-15 WO PCT/JP2022/046165 patent/WO2023120355A1/ja not_active Ceased
- 2022-12-16 TW TW111148448A patent/TW202340302A/zh unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006071880A (ja) | 2004-09-01 | 2006-03-16 | Taiyo Ink Mfg Ltd | 光導波路材料用の光硬化性・熱硬化性ドライフィルム、及びその硬化物並びに光・電気混載基板 |
| JP2017068242A (ja) | 2015-09-30 | 2017-04-06 | 太陽インキ製造株式会社 | 硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板 |
| JP2020186325A (ja) | 2019-05-15 | 2020-11-19 | 株式会社日本触媒 | アルカリ可溶性樹脂、及び、硬化性樹脂組成物 |
| WO2021039799A1 (ja) | 2019-08-27 | 2021-03-04 | 株式会社日本触媒 | 硬化性組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2023120355A1 (ja) | 2023-06-29 |
| JPWO2023120355A1 (https=) | 2023-06-29 |
| TW202340302A (zh) | 2023-10-16 |
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