JPWO2023120355A1 - - Google Patents

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Publication number
JPWO2023120355A1
JPWO2023120355A1 JP2023569364A JP2023569364A JPWO2023120355A1 JP WO2023120355 A1 JPWO2023120355 A1 JP WO2023120355A1 JP 2023569364 A JP2023569364 A JP 2023569364A JP 2023569364 A JP2023569364 A JP 2023569364A JP WO2023120355 A1 JPWO2023120355 A1 JP WO2023120355A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2023569364A
Other languages
Japanese (ja)
Other versions
JPWO2023120355A5 (https=
JP7688727B2 (ja
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Publication of JPWO2023120355A1 publication Critical patent/JPWO2023120355A1/ja
Publication of JPWO2023120355A5 publication Critical patent/JPWO2023120355A5/ja
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Publication of JP7688727B2 publication Critical patent/JP7688727B2/ja
Active legal-status Critical Current
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2023569364A 2021-12-21 2022-12-15 アルカリ可溶性樹脂、感光性樹脂組成物及びその硬化物 Active JP7688727B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2021207332 2021-12-21
JP2021207332 2021-12-21
JP2022165600 2022-10-14
JP2022165600 2022-10-14
PCT/JP2022/046165 WO2023120355A1 (ja) 2021-12-21 2022-12-15 アルカリ可溶性樹脂、感光性樹脂組成物及びその硬化物

Publications (3)

Publication Number Publication Date
JPWO2023120355A1 true JPWO2023120355A1 (https=) 2023-06-29
JPWO2023120355A5 JPWO2023120355A5 (https=) 2024-09-03
JP7688727B2 JP7688727B2 (ja) 2025-06-04

Family

ID=86902554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023569364A Active JP7688727B2 (ja) 2021-12-21 2022-12-15 アルカリ可溶性樹脂、感光性樹脂組成物及びその硬化物

Country Status (3)

Country Link
JP (1) JP7688727B2 (https=)
TW (1) TW202340302A (https=)
WO (1) WO2023120355A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN121152825A (zh) * 2023-08-01 2025-12-16 株式会社艾迪科 组合物、黑色矩阵、固化物及固化物的制造方法以及显示装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006071880A (ja) * 2004-09-01 2006-03-16 Taiyo Ink Mfg Ltd 光導波路材料用の光硬化性・熱硬化性ドライフィルム、及びその硬化物並びに光・電気混載基板
JP2017068242A (ja) * 2015-09-30 2017-04-06 太陽インキ製造株式会社 硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板
JP2020186325A (ja) * 2019-05-15 2020-11-19 株式会社日本触媒 アルカリ可溶性樹脂、及び、硬化性樹脂組成物
WO2021039799A1 (ja) * 2019-08-27 2021-03-04 株式会社日本触媒 硬化性組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006071880A (ja) * 2004-09-01 2006-03-16 Taiyo Ink Mfg Ltd 光導波路材料用の光硬化性・熱硬化性ドライフィルム、及びその硬化物並びに光・電気混載基板
JP2017068242A (ja) * 2015-09-30 2017-04-06 太陽インキ製造株式会社 硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板
JP2020186325A (ja) * 2019-05-15 2020-11-19 株式会社日本触媒 アルカリ可溶性樹脂、及び、硬化性樹脂組成物
WO2021039799A1 (ja) * 2019-08-27 2021-03-04 株式会社日本触媒 硬化性組成物

Also Published As

Publication number Publication date
WO2023120355A1 (ja) 2023-06-29
JP7688727B2 (ja) 2025-06-04
TW202340302A (zh) 2023-10-16

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