JP7662619B2 - 半導体プロセスツールにおける静電気散逸用の超薄型共形コーティング - Google Patents

半導体プロセスツールにおける静電気散逸用の超薄型共形コーティング Download PDF

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Publication number
JP7662619B2
JP7662619B2 JP2022518258A JP2022518258A JP7662619B2 JP 7662619 B2 JP7662619 B2 JP 7662619B2 JP 2022518258 A JP2022518258 A JP 2022518258A JP 2022518258 A JP2022518258 A JP 2022518258A JP 7662619 B2 JP7662619 B2 JP 7662619B2
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coating
layer
thickness
range
end effector
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JP2022548981A (ja
JP2022548981A5 (https=
JPWO2021062349A5 (https=
Inventor
ガーヤトリー ナトゥー，
ギーティカ バジャージ，
プレルナ ゴーラディア，
ダルシャン タカレ，
デーヴィッド フェンウィック，
シアオミン ホー，
サンニ セッパエラエ，
ジェニファー スン，
ライクマール タヌ，
ジェフリー ハジェンズ，
カルパッサミー ムータカマッチ，
アルン ダヤラン，
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Applied Materials Inc
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Applied Materials Inc
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Priority to JP2023143438A priority Critical patent/JP7715772B2/ja
Publication of JP2022548981A5 publication Critical patent/JP2022548981A5/ja
Publication of JPWO2021062349A5 publication Critical patent/JPWO2021062349A5/ja
Priority to JP2025061658A priority patent/JP2025121899A/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7616—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating, a hardness or a material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J18/00—Arms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H01J37/32495—Means for protecting the vessel against plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J19/00—Accessories fitted to manipulators, e.g. for monitoring, for viewing; Safety devices combined with or specially adapted for use in connection with manipulators
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05F—STATIC ELECTRICITY; NATURALLY-OCCURRING ELECTRICITY
    • H05F1/00—Preventing the formation of electrostatic charges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05F—STATIC ELECTRICITY; NATURALLY-OCCURRING ELECTRICITY
    • H05F3/00—Carrying-off electrostatic charges
    • H05F3/02—Carrying-off electrostatic charges by means of earthing connections
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7602—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a robot blade or gripped by a gripper for conveyance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05F—STATIC ELECTRICITY; NATURALLY-OCCURRING ELECTRICITY
    • H05F1/00—Preventing the formation of electrostatic charges
    • H05F1/02—Preventing the formation of electrostatic charges by surface treatment

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Robotics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Chemical Vapour Deposition (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
JP2022518258A 2019-09-26 2020-09-28 半導体プロセスツールにおける静電気散逸用の超薄型共形コーティング Active JP7662619B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2023143438A JP7715772B2 (ja) 2019-09-26 2023-09-05 半導体プロセスツールにおける静電気散逸用の超薄型共形コーティング
JP2025061658A JP2025121899A (ja) 2019-09-26 2025-04-03 半導体プロセスツールにおける静電気散逸用の超薄型共形コーティング

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
IN201941038863 2019-09-26
IN201941038863 2019-09-26
US16/890,336 2020-06-02
US16/890,346 2020-06-02
US16/890,336 US11540432B2 (en) 2019-09-26 2020-06-02 Ultrathin conformal coatings for electrostatic dissipation in semiconductor process tools
US16/890,346 US11547030B2 (en) 2019-09-26 2020-06-02 Ultrathin conformal coatings for electrostatic dissipation in semiconductor process tools
PCT/US2020/053036 WO2021062349A1 (en) 2019-09-26 2020-09-28 Ultrathin conformal coatings for electrostatic dissipation in semiconductor process tools

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2023143438A Division JP7715772B2 (ja) 2019-09-26 2023-09-05 半導体プロセスツールにおける静電気散逸用の超薄型共形コーティング
JP2025061658A Division JP2025121899A (ja) 2019-09-26 2025-04-03 半導体プロセスツールにおける静電気散逸用の超薄型共形コーティング

Publications (4)

Publication Number Publication Date
JP2022548981A JP2022548981A (ja) 2022-11-22
JP2022548981A5 JP2022548981A5 (https=) 2024-03-14
JPWO2021062349A5 JPWO2021062349A5 (https=) 2024-03-14
JP7662619B2 true JP7662619B2 (ja) 2025-04-15

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JP2022518258A Active JP7662619B2 (ja) 2019-09-26 2020-09-28 半導体プロセスツールにおける静電気散逸用の超薄型共形コーティング
JP2023143438A Active JP7715772B2 (ja) 2019-09-26 2023-09-05 半導体プロセスツールにおける静電気散逸用の超薄型共形コーティング
JP2025061658A Pending JP2025121899A (ja) 2019-09-26 2025-04-03 半導体プロセスツールにおける静電気散逸用の超薄型共形コーティング

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JP2023143438A Active JP7715772B2 (ja) 2019-09-26 2023-09-05 半導体プロセスツールにおける静電気散逸用の超薄型共形コーティング
JP2025061658A Pending JP2025121899A (ja) 2019-09-26 2025-04-03 半導体プロセスツールにおける静電気散逸用の超薄型共形コーティング

Country Status (6)

Country Link
US (4) US11540432B2 (https=)
JP (3) JP7662619B2 (https=)
KR (2) KR20250113524A (https=)
CN (2) CN114424676B (https=)
TW (3) TW202446985A (https=)
WO (1) WO2021062349A1 (https=)

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JP2023124886A (ja) * 2022-02-26 2023-09-07 Toto株式会社 複合構造物および複合構造物を備えた半導体製造装置
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TW202126845A (zh) 2021-07-16
JP2022548981A (ja) 2022-11-22
JP2024001007A (ja) 2024-01-09
JP2025121899A (ja) 2025-08-20
KR102836195B1 (ko) 2025-07-17
TWI853096B (zh) 2024-08-21
WO2021062349A1 (en) 2021-04-01
TW202446984A (zh) 2024-12-01
TWI887047B (zh) 2025-06-11
US20240284650A1 (en) 2024-08-22
TW202446985A (zh) 2024-12-01
US11547030B2 (en) 2023-01-03
US12564012B2 (en) 2026-02-24
US11540432B2 (en) 2022-12-27
US20210100087A1 (en) 2021-04-01
CN121023476A (zh) 2025-11-28
US12004337B2 (en) 2024-06-04
CN114424676A (zh) 2022-04-29
KR20220066389A (ko) 2022-05-24
CN114424676B (zh) 2025-08-05
JP7715772B2 (ja) 2025-07-30
KR20250113524A (ko) 2025-07-25
US20230077895A1 (en) 2023-03-16
US20210100141A1 (en) 2021-04-01

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