JP7613749B2 - 化合物及びその製造方法 - Google Patents

化合物及びその製造方法 Download PDF

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Publication number
JP7613749B2
JP7613749B2 JP2021553684A JP2021553684A JP7613749B2 JP 7613749 B2 JP7613749 B2 JP 7613749B2 JP 2021553684 A JP2021553684 A JP 2021553684A JP 2021553684 A JP2021553684 A JP 2021553684A JP 7613749 B2 JP7613749 B2 JP 7613749B2
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compound
formula
group
general formula
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JPWO2021085535A1 (https=
JPWO2021085535A5 (https=
Inventor
正安 五十嵐
竹志 野澤
朋浩 松本
不二夫 八木橋
一彦 佐藤
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National Institute of Advanced Industrial Science and Technology AIST
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/21—Cyclic compounds having at least one ring containing silicon, but no carbon in the ring

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
JP2021553684A 2019-10-31 2020-10-29 化合物及びその製造方法 Active JP7613749B2 (ja)

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JP2019199348 2019-10-31
JP2019199348 2019-10-31
PCT/JP2020/040648 WO2021085535A1 (ja) 2019-10-31 2020-10-29 化合物及びその製造方法

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JPWO2021085535A1 JPWO2021085535A1 (https=) 2021-05-06
JPWO2021085535A5 JPWO2021085535A5 (https=) 2022-08-12
JP7613749B2 true JP7613749B2 (ja) 2025-01-15

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Families Citing this family (1)

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Publication number Priority date Publication date Assignee Title
JP2024104451A (ja) * 2023-01-24 2024-08-05 国立研究開発法人産業技術総合研究所 化合物及びその製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006104325A (ja) 2004-10-05 2006-04-20 Shin Etsu Chem Co Ltd かご状オリゴシロキサン構造を有する一官能性モノマー及びその製造方法
WO2008098189A1 (en) 2007-02-08 2008-08-14 Fujifilm Electronic Materials U.S.A., Inc. Photosensitive compositions employing silicon-containing additives
WO2018193732A1 (ja) 2017-04-20 2018-10-25 国立研究開発法人産業技術総合研究所 シラノール化合物及びシラノール化合物の製造方法

Family Cites Families (1)

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Publication number Priority date Publication date Assignee Title
EP0348705A3 (de) * 1988-06-29 1991-02-27 Akademie der Wissenschaften der DDR Organophile Doppelringkieselsäurederivate mit käfigartigen Strukturen, Verfahren zu ihrer Herstellung und ihre Verwendung

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006104325A (ja) 2004-10-05 2006-04-20 Shin Etsu Chem Co Ltd かご状オリゴシロキサン構造を有する一官能性モノマー及びその製造方法
WO2008098189A1 (en) 2007-02-08 2008-08-14 Fujifilm Electronic Materials U.S.A., Inc. Photosensitive compositions employing silicon-containing additives
WO2018193732A1 (ja) 2017-04-20 2018-10-25 国立研究開発法人産業技術総合研究所 シラノール化合物及びシラノール化合物の製造方法

Non-Patent Citations (9)

* Cited by examiner, † Cited by third party
Title
Chemistry - A European Journal，2016年，Vol.22, No.39，pp.13857-13864
Chemistry Letters，2018年，Vol.47, No.12，pp.1530-1533
Chemistry of Materials，2017年，Vol.29, No.12，pp.5063-5069
Langmuir，2005年，Vol.21, No.2，pp.699-704
New Journal of Chemistry，2012年，Vol.36, No.5，pp.1210-1217
PERRIN,F.X. et al.，Polymer，2013年，Vol.54, No.9，pp.2347-2354
Polymer Composites，2019年，Vol.40, No.S1，pp.E350-E364
Synthesis and Reactivity in Inorganic and Metal-Organic Chemistry，1994年，Vol.24, No.7，pp.1099-1110
Zeitschrift fuer Anorganische und Allgemeine Chemie，1987年，Vol.552，pp.236-240

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JPWO2021085535A1 (https=) 2021-05-06

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