JPWO2021085535A5 - - Google Patents
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- Publication number
- JPWO2021085535A5 JPWO2021085535A5 JP2021553684A JP2021553684A JPWO2021085535A5 JP WO2021085535 A5 JPWO2021085535 A5 JP WO2021085535A5 JP 2021553684 A JP2021553684 A JP 2021553684A JP 2021553684 A JP2021553684 A JP 2021553684A JP WO2021085535 A5 JPWO2021085535 A5 JP WO2021085535A5
- Authority
- JP
- Japan
- Prior art keywords
- formula
- represented
- compound
- hydrogen atom
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 150000001875 compounds Chemical class 0.000 claims 16
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 14
- 125000003118 aryl group Chemical group 0.000 claims 8
- 125000004432 carbon atom Chemical group C* 0.000 claims 6
- 125000000217 alkyl group Chemical group 0.000 claims 5
- 238000004519 manufacturing process Methods 0.000 claims 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 2
- 239000013078 crystal Substances 0.000 claims 2
- 125000000547 substituted alkyl group Chemical group 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 230000036571 hydration Effects 0.000 claims 1
- 238000006703 hydration reaction Methods 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019199348 | 2019-10-31 | ||
| JP2019199348 | 2019-10-31 | ||
| PCT/JP2020/040648 WO2021085535A1 (ja) | 2019-10-31 | 2020-10-29 | 化合物及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2021085535A1 JPWO2021085535A1 (https=) | 2021-05-06 |
| JPWO2021085535A5 true JPWO2021085535A5 (https=) | 2022-08-12 |
| JP7613749B2 JP7613749B2 (ja) | 2025-01-15 |
Family
ID=75716345
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021553684A Active JP7613749B2 (ja) | 2019-10-31 | 2020-10-29 | 化合物及びその製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP7613749B2 (https=) |
| WO (1) | WO2021085535A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2024104451A (ja) * | 2023-01-24 | 2024-08-05 | 国立研究開発法人産業技術総合研究所 | 化合物及びその製造方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0348705A3 (de) * | 1988-06-29 | 1991-02-27 | Akademie der Wissenschaften der DDR | Organophile Doppelringkieselsäurederivate mit käfigartigen Strukturen, Verfahren zu ihrer Herstellung und ihre Verwendung |
| JP4645803B2 (ja) | 2004-10-05 | 2011-03-09 | 信越化学工業株式会社 | かご状オリゴシロキサン構造を有する一官能性モノマー及びその製造方法 |
| TW200848935A (en) | 2007-02-08 | 2008-12-16 | Fujifilm Electronic Materials | Photosensitive compositions employing silicon-containing additives |
| US20210061824A1 (en) | 2017-04-20 | 2021-03-04 | National Institute Of Advanced Industrial Science And Technology | Silanol compound and method for producing silanol compound |
-
2020
- 2020-10-29 JP JP2021553684A patent/JP7613749B2/ja active Active
- 2020-10-29 WO PCT/JP2020/040648 patent/WO2021085535A1/ja not_active Ceased
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