JPWO2021085535A5 - - Google Patents
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- JPWO2021085535A5 JPWO2021085535A5 JP2021553684A JP2021553684A JPWO2021085535A5 JP WO2021085535 A5 JPWO2021085535 A5 JP WO2021085535A5 JP 2021553684 A JP2021553684 A JP 2021553684A JP 2021553684 A JP2021553684 A JP 2021553684A JP WO2021085535 A5 JPWO2021085535 A5 JP WO2021085535A5
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- formula
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- compound
- hydrogen atom
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- 150000001875 compounds Chemical class 0.000 claims 16
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 14
- 125000003118 aryl group Chemical group 0.000 claims 8
- 125000004432 carbon atom Chemical group C* 0.000 claims 6
- 125000000217 alkyl group Chemical group 0.000 claims 5
- 238000004519 manufacturing process Methods 0.000 claims 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 2
- 239000013078 crystal Substances 0.000 claims 2
- 125000000547 substituted alkyl group Chemical group 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 230000036571 hydration Effects 0.000 claims 1
- 238000006703 hydration reaction Methods 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
Claims (6)
で表される化合物と、下記一般式(3):
で表される化合物と、を反応させることにより、下記一般式(1):
で表される化合物を得る、化合物の製造方法であって、
一般式(2)の化合物として水和水を含まない結晶を用いる、化合物の製造方法。The following general formula (2):
and a compound represented by the following general formula (3):
By reacting a compound represented by the following general formula (1):
A method for producing a compound to obtain a compound represented by
A method for producing a compound using a crystal containing no water of hydration as the compound of general formula (2).
で表される化合物(ただし、p1が1であり、8個のZ10がすべて式「-Si(CH3)3」、式「-Si(CH3)2H」、式「-Si((4-CH3)C6H4)(CH3)2」、式「-Si((4-CBr3)C6H4)(CH3)2」、式「-Si((4-COOH)C6H4)(CH3)2」、式「-Si(CH3)2(OSi(CH3)3)」、式「-Si(CH3)2(CH=CH2)」、式「-Si(CH=CH2)3」、式「-Si(CH3)2CH2Cl」、又は式「-Si(CH3)2(OSi(CH3)3)」で表される基である化合物と、p1が1であり、7個のZ10が式「-Si(CH3)3」で表される基であり、1個のZ10が水素原子である化合物と、p1が1であり、6個のZ10が式「-Si(CH3)3」で表される基であり、2個のZ10が水素原子である化合物と、p1が1であり、5個のZ10が式「-Si(CH3)3」で表される基であり、3個のZ10が水素原子である化合物と、を除く)。The following general formula (10):
(where p 1 is 1 and all eight Z 10 are of the formula "-Si( CH3 ) 3 ", the formula "-Si( CH3 ) 2H ", the formula "-Si( (4-CH 3 )C 6 H 4 )(CH 3 ) 2 ”, formula “-Si((4-CBr 3 )C 6 H 4 )(CH 3 ) 2 ”, formula “-Si((4-COOH )C 6 H 4 )(CH 3 ) 2 ”, formula “—Si(CH 3 ) 2 (OSi(CH 3 ) 3 )”, formula “—Si(CH 3 ) 2 (CH═CH 2 )”, formula A group represented by the formula "-Si(CH=CH 2 ) 3 ", the formula "-Si(CH 3 ) 2 CH 2 Cl", or the formula "-Si(CH 3 ) 2 (OSi(CH 3 ) 3 )" a compound in which p 1 is 1, seven Z 10 are groups represented by the formula “—Si(CH 3 ) 3 ”, and one Z 10 is a hydrogen atom, and p a compound in which 1 is 1, 6 Z 10 are groups represented by the formula “—Si(CH 3 ) 3 ”, and 2 Z 10 are hydrogen atoms, and p 1 is 1; excluding compounds in which 5 Z 10 are groups represented by the formula “—Si(CH 3 ) 3 ” and 3 Z 10 are hydrogen atoms).
で表される化合物(ただし、8個のZ11がすべて式「-Si(CH3)3」、式「-Si(CH3)2H」、式「-Si((4-CH3)C6H4)(CH3)2」、式「-Si((4-CBr3)C6H4)(CH3)2」、式「-Si((4-COOH)C6H4)(CH3)2」、式「-Si(CH3)2(OSi(CH3)3)」、式「-Si(CH3)2(CH=CH2)」、式「-Si(CH=CH2)3」、式「-Si(CH3)2CH2Cl」、又は式「-Si(CH3)2(OSi(CH3)3)」で表される基である化合物と、7個のZ11が式「-Si(CH3)3」で表される基であり、1個のZ11が水素原子である化合物と、6個のZ11が式「-Si(CH3)3」で表される基であり、2個のZ11が水素原子である化合物と、5個のZ11が式「-Si(CH3)3」で表される基であり、3個のZ11が水素原子である化合物と、を除く)。The following general formula (1021):
(provided that all eight Z 11 are of the formula “—Si(CH 3 ) 3 ”, the formula “—Si(CH 3 ) 2 H”, the formula “—Si((4-CH 3 )C 6 H 4 )(CH 3 ) 2 ”, formula “—Si((4-CBr 3 )C 6 H 4 )(CH 3 ) 2 ”, formula “—Si((4-COOH)C 6 H 4 )( CH 3 ) 2 ”, formula “-Si(CH 3 ) 2 (OSi(CH 3 ) 3 )”, formula “-Si(CH 3 ) 2 (CH=CH 2 )”, formula “-Si(CH=CH 2 ) 3 ”, a compound represented by the formula “—Si(CH 3 ) 2 CH 2 Cl”, or a group represented by the formula “—Si(CH 3 ) 2 (OSi(CH 3 ) 3 )”; wherein Z 11 is a group represented by the formula “—Si(CH 3 ) 3 ”, one Z 11 is a hydrogen atom, and a compound in which six Z 11 are represented by the formula “—Si(CH 3 ) 3 ", two Z 11 are hydrogen atoms, and five Z 11 are groups represented by the formula "-Si(CH 3 ) 3 ", three Z except for compounds in which 11 is a hydrogen atom).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019199348 | 2019-10-31 | ||
PCT/JP2020/040648 WO2021085535A1 (en) | 2019-10-31 | 2020-10-29 | Compound and production method therefor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2021085535A1 JPWO2021085535A1 (en) | 2021-05-06 |
JPWO2021085535A5 true JPWO2021085535A5 (en) | 2022-08-12 |
Family
ID=75716345
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021553684A Pending JPWO2021085535A1 (en) | 2019-10-31 | 2020-10-29 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPWO2021085535A1 (en) |
WO (1) | WO2021085535A1 (en) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0348705A3 (en) * | 1988-06-29 | 1991-02-27 | Akademie der Wissenschaften der DDR | Organophilic double-ring silicilic-acid derivatives with cage structures, process for their preparation and their use |
JP4645803B2 (en) * | 2004-10-05 | 2011-03-09 | 信越化学工業株式会社 | Monofunctional monomer having cage oligosiloxane structure and method for producing the same |
TW200848935A (en) * | 2007-02-08 | 2008-12-16 | Fujifilm Electronic Materials | Photosensitive compositions employing silicon-containing additives |
-
2020
- 2020-10-29 WO PCT/JP2020/040648 patent/WO2021085535A1/en active Application Filing
- 2020-10-29 JP JP2021553684A patent/JPWO2021085535A1/ja active Pending
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