JP7532025B2 - 半導体装置および機器 - Google Patents

半導体装置および機器 Download PDF

Info

Publication number
JP7532025B2
JP7532025B2 JP2019212300A JP2019212300A JP7532025B2 JP 7532025 B2 JP7532025 B2 JP 7532025B2 JP 2019212300 A JP2019212300 A JP 2019212300A JP 2019212300 A JP2019212300 A JP 2019212300A JP 7532025 B2 JP7532025 B2 JP 7532025B2
Authority
JP
Japan
Prior art keywords
section
semiconductor device
photodiode
region
direction perpendicular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2019212300A
Other languages
English (en)
Japanese (ja)
Other versions
JP2021086851A (ja
JP2021086851A5 (https=
Inventor
佳明 高田
一 池田
径介 太田
洋一郎 飯田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2019212300A priority Critical patent/JP7532025B2/ja
Priority to CN202080080720.7A priority patent/CN114730784A/zh
Priority to PCT/JP2020/043250 priority patent/WO2021106748A1/ja
Publication of JP2021086851A publication Critical patent/JP2021086851A/ja
Priority to US17/751,406 priority patent/US12356738B2/en
Publication of JP2021086851A5 publication Critical patent/JP2021086851A5/ja
Application granted granted Critical
Publication of JP7532025B2 publication Critical patent/JP7532025B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/802Geometry or disposition of elements in pixels, e.g. address-lines or gate electrodes
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/18Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • H10F39/182Colour image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/805Coatings
    • H10F39/8053Colour filters
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/805Coatings
    • H10F39/8057Optical shielding
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/806Optical elements or arrangements associated with the image sensors
    • H10F39/8063Microlenses
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/807Pixel isolation structures

Landscapes

  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
JP2019212300A 2019-11-25 2019-11-25 半導体装置および機器 Active JP7532025B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2019212300A JP7532025B2 (ja) 2019-11-25 2019-11-25 半導体装置および機器
CN202080080720.7A CN114730784A (zh) 2019-11-25 2020-11-19 半导体装置和设备
PCT/JP2020/043250 WO2021106748A1 (ja) 2019-11-25 2020-11-19 半導体装置および機器
US17/751,406 US12356738B2 (en) 2019-11-25 2022-05-23 Semiconductor apparatus and device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019212300A JP7532025B2 (ja) 2019-11-25 2019-11-25 半導体装置および機器

Publications (3)

Publication Number Publication Date
JP2021086851A JP2021086851A (ja) 2021-06-03
JP2021086851A5 JP2021086851A5 (https=) 2022-11-25
JP7532025B2 true JP7532025B2 (ja) 2024-08-13

Family

ID=76088380

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019212300A Active JP7532025B2 (ja) 2019-11-25 2019-11-25 半導体装置および機器

Country Status (4)

Country Link
US (1) US12356738B2 (https=)
JP (1) JP7532025B2 (https=)
CN (1) CN114730784A (https=)
WO (1) WO2021106748A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2023080197A1 (https=) * 2021-11-05 2023-05-11
US11929383B2 (en) * 2022-03-23 2024-03-12 Sony Semiconductor Solutions Corporation Intra-pixel crosstalk reduction for a multi-mode image sensor
WO2025253891A1 (ja) * 2024-06-04 2025-12-11 ソニーセミコンダクタソリューションズ株式会社 撮像素子および撮像装置

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010219355A (ja) 2009-03-17 2010-09-30 Sharp Corp 固体撮像素子および電子情報機器
JP2010225818A (ja) 2009-03-23 2010-10-07 Toshiba Corp 固体撮像装置及びその製造方法
JP2013175494A (ja) 2011-03-02 2013-09-05 Sony Corp 固体撮像装置、固体撮像装置の製造方法及び電子機器
JP2016021479A (ja) 2014-07-14 2016-02-04 ソニー株式会社 固体撮像装置、製造方法、および電子機器
WO2017043343A1 (ja) 2015-09-11 2017-03-16 ソニーセミコンダクタソリューションズ株式会社 固体撮像装置および電子機器
WO2017169754A1 (ja) 2016-03-29 2017-10-05 ソニー株式会社 固体撮像装置、及び電子機器
US20170366769A1 (en) 2016-06-16 2017-12-21 Semiconductor Components Industries, Llc Imaging systems with high dynamic range and phase detection pixels
WO2018221261A1 (ja) 2017-06-02 2018-12-06 ソニーセミコンダクタソリューションズ株式会社 固体撮像装置、及び電子機器
US20190020835A1 (en) 2017-07-14 2019-01-17 Taiwan Semiconductor Manufacturing Company Ltd. Semiconductor structure and operating method for improving charge transfer of image sensor device
US20190131333A1 (en) 2017-10-31 2019-05-02 Semiconductor Components Industries, Llc High dynamic range pixel with in-pixel light shield structures
US10334191B1 (en) 2018-03-02 2019-06-25 Omnivision Technologies, Inc. Pixel array with embedded split pixels for high dynamic range imaging
US20190296075A1 (en) 2018-03-21 2019-09-26 SK Hynix Inc. Image sensor having pd bias patterns

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8003425B2 (en) * 2008-05-14 2011-08-23 International Business Machines Corporation Methods for forming anti-reflection structures for CMOS image sensors
JP5963453B2 (ja) * 2011-03-15 2016-08-03 株式会社荏原製作所 検査装置
JP6390856B2 (ja) * 2014-12-26 2018-09-19 パナソニックIpマネジメント株式会社 撮像装置
JP2017163010A (ja) * 2016-03-10 2017-09-14 ソニー株式会社 撮像装置、電子機器

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010219355A (ja) 2009-03-17 2010-09-30 Sharp Corp 固体撮像素子および電子情報機器
JP2010225818A (ja) 2009-03-23 2010-10-07 Toshiba Corp 固体撮像装置及びその製造方法
JP2013175494A (ja) 2011-03-02 2013-09-05 Sony Corp 固体撮像装置、固体撮像装置の製造方法及び電子機器
JP2016021479A (ja) 2014-07-14 2016-02-04 ソニー株式会社 固体撮像装置、製造方法、および電子機器
WO2017043343A1 (ja) 2015-09-11 2017-03-16 ソニーセミコンダクタソリューションズ株式会社 固体撮像装置および電子機器
WO2017169754A1 (ja) 2016-03-29 2017-10-05 ソニー株式会社 固体撮像装置、及び電子機器
US20170366769A1 (en) 2016-06-16 2017-12-21 Semiconductor Components Industries, Llc Imaging systems with high dynamic range and phase detection pixels
WO2018221261A1 (ja) 2017-06-02 2018-12-06 ソニーセミコンダクタソリューションズ株式会社 固体撮像装置、及び電子機器
US20190020835A1 (en) 2017-07-14 2019-01-17 Taiwan Semiconductor Manufacturing Company Ltd. Semiconductor structure and operating method for improving charge transfer of image sensor device
US20190131333A1 (en) 2017-10-31 2019-05-02 Semiconductor Components Industries, Llc High dynamic range pixel with in-pixel light shield structures
US10334191B1 (en) 2018-03-02 2019-06-25 Omnivision Technologies, Inc. Pixel array with embedded split pixels for high dynamic range imaging
US20190296075A1 (en) 2018-03-21 2019-09-26 SK Hynix Inc. Image sensor having pd bias patterns

Also Published As

Publication number Publication date
JP2021086851A (ja) 2021-06-03
US20220285410A1 (en) 2022-09-08
CN114730784A (zh) 2022-07-08
WO2021106748A1 (ja) 2021-06-03
US12356738B2 (en) 2025-07-08

Similar Documents

Publication Publication Date Title
JP7192922B2 (ja) 固体撮像装置、及び電子機器
WO2022209681A1 (ja) 光検出装置及び電子機器
JP7534902B2 (ja) 光電変換装置、撮像装置、半導体装置及び光電変換システム
KR102262794B1 (ko) 고체 촬상 장치, 촬상 시스템 및 이동체
JP2017212351A (ja) 撮像装置
US8440954B2 (en) Solid-state image pickup device with a wiring becoming a light receiving surface, method of manufacturing the same, and electronic apparatus
US12356738B2 (en) Semiconductor apparatus and device
JP2023023218A (ja) 光電変換装置
JP7116591B2 (ja) 撮像装置及びその製造方法
JP2021068788A (ja) 光電変換装置、光電変換装置の製造方法、および撮像システム
US20230420468A1 (en) Photoelectric conversion device
CN113658966A (zh) 半导体装置和电子设备
JP7566574B2 (ja) 光電変換装置、撮像システム、移動体、半導体基板
JP2023032549A (ja) 光電変換装置、光電変換システム、および移動体
JP2020088293A (ja) 光電変換装置、光電変換システム、移動体
JP7581020B2 (ja) 光電変換装置、光電変換システム、移動体
JP2025058593A (ja) 光電変換装置、機器、および移動体
JP2024006956A (ja) 光電変換装置、光電変換装置の製造方法、機器
US12598833B2 (en) Photoelectric conversion device and apparatus
WO2025222414A1 (en) Solid-state imaging device and method of making solid-state imaging device
JP7019743B2 (ja) 固体撮像装置及び撮像システム
JP2023174187A (ja) 光電変換装置、光電変換装置の製造方法、撮像システム、移動体、および機器
JP2020088291A (ja) 光電変換装置、光電変換システム、移動体
JP2024127607A (ja) 光電変換装置及び光電変換システム
JP2021106222A (ja) 光電変換装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20221116

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20221116

RD01 Notification of change of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7421

Effective date: 20231213

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20240130

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240329

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20240702

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20240731

R150 Certificate of patent or registration of utility model

Ref document number: 7532025

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150