JP7496051B2 - 液晶ディスプレイパネル及び無アルカリガラスの基板 - Google Patents
液晶ディスプレイパネル及び無アルカリガラスの基板 Download PDFInfo
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- JP7496051B2 JP7496051B2 JP2022191502A JP2022191502A JP7496051B2 JP 7496051 B2 JP7496051 B2 JP 7496051B2 JP 2022191502 A JP2022191502 A JP 2022191502A JP 2022191502 A JP2022191502 A JP 2022191502A JP 7496051 B2 JP7496051 B2 JP 7496051B2
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- Prior art keywords
- mgo
- alkali
- liquid crystal
- less
- crystal display
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000011521 glass Substances 0.000 title claims description 105
- 239000000758 substrate Substances 0.000 title claims description 66
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 37
- 229910052751 metal Inorganic materials 0.000 claims description 28
- 239000002184 metal Substances 0.000 claims description 28
- 238000004519 manufacturing process Methods 0.000 claims description 18
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 14
- 229910052802 copper Inorganic materials 0.000 claims description 14
- 239000010949 copper Substances 0.000 claims description 14
- 239000000203 mixture Substances 0.000 claims description 13
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 12
- 229910010272 inorganic material Inorganic materials 0.000 claims description 11
- 239000011147 inorganic material Substances 0.000 claims description 11
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 9
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 9
- 229910052593 corundum Inorganic materials 0.000 claims description 9
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 9
- 229910001845 yogo sapphire Inorganic materials 0.000 claims description 9
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- 229910052681 coesite Inorganic materials 0.000 claims description 6
- 229910052906 cristobalite Inorganic materials 0.000 claims description 6
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 235000012239 silicon dioxide Nutrition 0.000 claims description 6
- 229910052682 stishovite Inorganic materials 0.000 claims description 6
- 229910052905 tridymite Inorganic materials 0.000 claims description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 5
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 5
- 239000003513 alkali Substances 0.000 claims description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims description 5
- 239000011733 molybdenum Substances 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 239000011159 matrix material Substances 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- 239000010408 film Substances 0.000 description 60
- 238000000034 method Methods 0.000 description 15
- 238000004031 devitrification Methods 0.000 description 13
- 230000000694 effects Effects 0.000 description 13
- 238000010438 heat treatment Methods 0.000 description 9
- 229910021417 amorphous silicon Inorganic materials 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000005484 gravity Effects 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 239000011787 zinc oxide Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 235000019738 Limestone Nutrition 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000006028 limestone Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- AKEJUJNQAAGONA-UHFFFAOYSA-N sulfur trioxide Inorganic materials O=S(=O)=O AKEJUJNQAAGONA-UHFFFAOYSA-N 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3605—Coatings of the type glass/metal/inorganic compound
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3636—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing silicon, hydrogenated silicon or a silicide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3668—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties
- C03C17/3671—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties specially adapted for use as electrodes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133302—Rigid substrates, e.g. inorganic substrates
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133345—Insulating layers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
- G02F1/136295—Materials; Compositions; Manufacture processes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
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Description
該液晶ディスプレイパネルは、無アルカリガラスの基板の少なくとも一の表面上に、金属からなる膜を成膜し、得られる金属膜をパターニングして配線膜とし、次いで無機物質からなるゲート絶縁膜を成膜する工程を含む製造プロセスで製造される液晶ディスプレイパネルであって、前記無アルカリガラスの基板の少なくとも一の表面上には、前記金属からなる配線膜と前記無機物質からなる絶縁膜とが備えられてなる。
即ち本発明は、無アルカリガラスの基板と、金属からなる配線膜と、該配線膜の表面上に形成される無機物質からなる絶縁膜とを備え、
該配線膜は、厚さが0.1μm以上であり、
該絶縁膜は、厚さが100nm以上であり、
該基板は、長辺が1800mm以上、短辺が1500mm以上、厚さが0.5mm以下であり、
該金属は、その室温でのヤング率と熱膨張係数の積が10,000×10-7GPa/℃~25,000×10-7GPa/℃であり、
該無機物質は、該無アルカリガラスより小さい平均熱膨張係数(50℃~350℃)を有し、
該無アルカリガラスは、ヤング率(E)が70~95GPa、50℃~350℃の平均熱膨張係数(α)が32×10-7~45×10-7(1/℃)、且つ下記式(1)を満たし、
20α+7E≧1310 (1)、
式(1)において、αの単位は10-7(1/℃)、Eの単位はGPaであり、
及び、
酸化物基準のモル%表示で下記組成を有する、
SiO2 66~74、
Al2O3 10~15、
B2O3 0.1~5、
MgO 2~12、
CaO 3~11、
SrO 0~10、
BaO 0~5、
ZrO2 0~2、
好ましくは、酸化物基準のモル%表示で下記組成を有する、
SiO2 66~74、
Al2O3 10~15、
B2O3 0.1~3.0未満、
MgO 2~10、
CaO 3~11、
SrO 0.1~10、
BaO 0~5、
ZrO2 0~2、
液晶ディスプレイパネルである。
好ましいさらに他の例において、上記無アルカリガラスは、酸化物基準のモル%表示で下記組成を有する、
SiO2 68.0~74、
Al2O3 10~15、
B2O3 0.1~5、
MgO 2~9.0、
CaO 3~11、
SrO 0~10、
BaO 0~1、
ZrO2 0~2、
MgO+CaO+SrO+BaO:18以下。
MgO/(MgO+CaO+SrO+BaO)が0.20以上であることが好ましく、0.25以上がより好ましく、0.3以上がさらに好ましく、0.4以上が特に好ましく、0.45以上が最も好ましい。
MgO/(MgO+CaO)が0.3以上であり、0.4以上がより好ましく、0.52以上がさらに好ましく、0.55以上が特に好ましく、0.6以上が最も好ましい。
MgO/(MgO+SrO)が0.6以上であり、0.63以上がより好ましく、0.65以上がさらに好ましい。
該ガラスは、50~350℃での平均熱膨張係数(α)が45×10-7/℃以下である。これにより、耐熱衝撃性が大きく、パネル製造時の生産性を高くすることができる。好ましくは42×10-7/℃以下であり、より好ましくは41×10-7/℃以下、さらに好ましくは40×10-7/℃以下である。一方、αが小さすぎると成膜時の反りが大きくなるため、32×10-7/℃以上である。33×10-7/℃以上が好ましく、35×10-7/℃以上がより好ましい。
20α+7E≧1310 (1)
ここで、αの単位は10-7/℃、Eの単位はGPaである。上記式(1)を満たす場合、大型基板であっても加熱による反りが小さい。
好ましくは、該ガラスは、上記歪点と同様の理由で、ガラス転移点が760℃以上であり、より好ましくは770℃以上であり、さらに好ましくは780℃以上である。
銅: 21,000~23,000×10-7GPa/℃
アルミニウム: 16,000~17,000×10-7GPa/℃
モリブデン: 15,000~17,000×10-7GPa/℃
窒化シリコン: 32×10-7/℃
酸化シリコン: 5.5×10-7/℃
なお、酸窒化シリコンの熱膨張率は、酸素窒素比により上記の中間の数値を取ると考えられる。
即ち、本発明の液晶ディスプレイパネルは、アクティブマトリクス駆動形式の液晶ディスプレイパネルであって、該液晶ディスプレイパネルは、例えば非晶質シリコン(a-Si)やインジウム-ガリウム-亜鉛の酸化物半導体等のような、無アルカリガラスの基板の少なくとも一の表面上に、金属からなる膜を成膜して該金属膜をパターニングして配線膜とし、さらに無機物質からなるゲート絶縁膜を成膜する工程を含む製造プロセスで製造される液晶ディスプレイパネルである。即ち、LTPSのような高温熱処理される製造プロセスとは異なるものであり、本発明における液晶ディスプレイパネル(非晶質シリコン(a-Si)やインジウム-ガリウム-亜鉛系の酸化物半導体等をTFTとして用いた液晶ディスプレイパネル)の前記製造プロセスの最高温度は低温熱処理の温度、例えば450℃以下である。前記無アルカリガラスの基板の少なくとも一の表面上には、前記金属からなる配線膜と前記無機物質からなる絶縁膜とが備えられて成る。
図1(a)~図1(c)に、例1のガラス(ヤング率84GPa、熱膨張率が39×10-7/℃)の基板に対して、計算した結果をコンター図として示す。ステップ1(図1(b))では、当方的な膜のため同心円状の変形であるが、ステップ2(図1(a))では銅膜の異方性により、鞍型の変形が見られた。さらに、ステップ3(図1(c))では、ステップ2と比較して、変形が軽減されていることがわかった。
Claims (9)
- アクティブマトリクス駆動形式の液晶ディスプレイパネルであって、
該液晶ディスプレイパネルは、無アルカリガラスの基板と、
該無アルカリガラスの基板の少なくとも一の表面上に形成される金属からなる配線膜と、
該配線膜の表面上に形成される無機物質からなる絶縁膜とを備え、
該配線膜は、厚さが0.1μm以上であり、
該絶縁膜は、厚さが100nm以上であり、
該基板は、長辺が1800mm以上、短辺が1500mm以上、厚さが0.5mm以下であり、
該金属は、その室温でのヤング率と熱膨張係数の積が10,000×10-7GPa/℃~25,000×10-7GPa/℃であり、
該無機物質は、該無アルカリガラスより小さい平均熱膨張係数(50℃~350℃)を有し、
該無アルカリガラスは、ヤング率(E)が70~95GPa、50℃~350℃の平均熱膨張係数(α)が32×10-7~45×10-7(1/℃)、且つ下記式(1)を満たし、
1394≧20α+7E≧1310 (1)、
式(1)において、αの単位は10-7(1/℃)、Eの単位はGPaであり、及び、
酸化物基準のモル%表示で下記組成を有する、
SiO2 66~74、
Al2O3 10~13、
B2O3 1~3、
MgO 2~12、
CaO 5~11、
SrO 0.1~4、
BaO 0~1、
ZrO2 0~2、
MgO+CaO+SrO+BaO 19~21、
Al2O3*(MgO/(MgO+CaO+SrO+BaO)):5.5以上、液晶ディスプレイパネル。 - 前記無アルカリガラスは、酸化物基準のモル%表示で表される組成が、759-13.1×SiO2-7.5×Al2O3-15.5×B2O3+9.7×MgO+21.8×CaO+27.2×SrO+27.9×BaO≧0の関係を満たす、請求項1に記載の液晶ディスプレイパネル。
- 前記無アルカリガラスは、酸化物基準のモル%表示で表される組成が、MgO/(MgO+CaO+SrO+BaO)が0.45以上の関係を満たす、請求項1又は2に記載の液晶ディスプレイパネル。
- 該金属が、銅、アルミニウム、又はモリブデンである、請求項1から3のいずれか1項に記載の液晶ディスプレイパネル。
- 該無機物質が窒化シリコン、酸窒化シリコン又は酸化シリコンである、請求項1から4のいずれか1項に記載の液晶ディスプレイパネル。
- 前記液晶ディスプレイパネルの製造プロセスの最高温度が450℃以下である、請求項1から5のいずれか1項に記載の液晶ディスプレイパネル。
- 酸化物基準のモル%表示で、
SiO2 66~74、
Al2O3 10~13、
B2O3 1~3、
MgO 2~12、
CaO 5~11、
SrO 0.1~4、
BaO 0~1、
ZrO2 0~2、
MgO+CaO+SrO+BaO 19~21、
Al2O3×(MgO/(MgO+CaO+SrO+BaO)):5.5以上を含み、
ヤング率(E)が70~95GPa、50℃~350℃の平均熱膨張係数(α)が32×10-7~45×10-7(1/℃)、且つ下記式(1)を満たす、
1394≧20α+7E≧1310 (1)、
式(1)において、αの単位は10-7(1/℃)、Eの単位はGPaである、無アルカリガラスの基板。 - 前記無アルカリガラスの基板は、酸化物基準のモル%表示で表される組成が、759-13.1×SiO2-7.5×Al2O3-15.5×B2O3+9.7×MgO+21.8×CaO+27.2×SrO+27.9×BaO≧0の関係を満たす、請求項7に記載の無アルカリガラスの基板。
- 前記無アルカリガラスの基板は、酸化物基準のモル%表示で表される組成が、MgO/(MgO+CaO+SrO+BaO)が0.45以上の関係を満たす、請求項7又は8に記載の無アルカリガラスの基板。
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2015
- 2015-11-27 KR KR1020237035340A patent/KR20230148860A/ko not_active Application Discontinuation
- 2015-11-27 CN CN201580064686.3A patent/CN107003553B/zh active Active
- 2015-11-27 JP JP2016561965A patent/JPWO2016084952A1/ja active Pending
- 2015-11-27 WO PCT/JP2015/083464 patent/WO2016084952A1/ja active Application Filing
- 2015-11-27 TW TW108129622A patent/TWI766182B/zh active
- 2015-11-27 TW TW104139835A patent/TWI693201B/zh active
- 2015-11-27 KR KR1020177014083A patent/KR20170086529A/ko active Application Filing
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2017
- 2017-05-25 US US15/605,235 patent/US10386686B2/en active Active
-
2019
- 2019-06-27 US US16/454,858 patent/US11586084B2/en active Active
- 2019-07-04 JP JP2019125095A patent/JP2019219663A/ja active Pending
- 2019-10-23 JP JP2019192753A patent/JP2020076985A/ja active Pending
- 2019-10-23 JP JP2019192754A patent/JP2020034928A/ja active Pending
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2021
- 2021-04-09 JP JP2021066554A patent/JP7188487B2/ja active Active
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2022
- 2022-11-30 JP JP2022191502A patent/JP7496051B2/ja active Active
- 2022-12-29 US US18/147,787 patent/US20230140716A1/en not_active Abandoned
- 2022-12-29 US US18/147,767 patent/US20230142463A1/en not_active Abandoned
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2024
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TWI766182B (zh) | 2022-06-01 |
JPWO2016084952A1 (ja) | 2017-10-05 |
JP7188487B2 (ja) | 2022-12-13 |
US10386686B2 (en) | 2019-08-20 |
TW201940454A (zh) | 2019-10-16 |
US20230142463A1 (en) | 2023-05-11 |
US20240176198A1 (en) | 2024-05-30 |
US20170329192A1 (en) | 2017-11-16 |
CN107003553A (zh) | 2017-08-01 |
KR20230148860A (ko) | 2023-10-25 |
US20190317376A1 (en) | 2019-10-17 |
JP2020076985A (ja) | 2020-05-21 |
JP2021130604A (ja) | 2021-09-09 |
TWI693201B (zh) | 2020-05-11 |
KR20170086529A (ko) | 2017-07-26 |
JP2023036599A (ja) | 2023-03-14 |
TW201625503A (zh) | 2016-07-16 |
CN107003553B (zh) | 2020-10-27 |
JP2019219663A (ja) | 2019-12-26 |
US11586084B2 (en) | 2023-02-21 |
US20230140716A1 (en) | 2023-05-04 |
WO2016084952A1 (ja) | 2016-06-02 |
JP2020034928A (ja) | 2020-03-05 |
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