JP7491411B2 - 電子部品 - Google Patents
電子部品 Download PDFInfo
- Publication number
- JP7491411B2 JP7491411B2 JP2022578102A JP2022578102A JP7491411B2 JP 7491411 B2 JP7491411 B2 JP 7491411B2 JP 2022578102 A JP2022578102 A JP 2022578102A JP 2022578102 A JP2022578102 A JP 2022578102A JP 7491411 B2 JP7491411 B2 JP 7491411B2
- Authority
- JP
- Japan
- Prior art keywords
- segregation
- element body
- glass
- electrode layer
- base electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011521 glass Substances 0.000 claims description 182
- 238000005204 segregation Methods 0.000 claims description 144
- 239000000919 ceramic Substances 0.000 claims description 50
- 239000004020 conductor Substances 0.000 claims description 50
- 239000000463 material Substances 0.000 claims description 18
- 239000010410 layer Substances 0.000 description 149
- 239000002585 base Substances 0.000 description 114
- 239000002245 particle Substances 0.000 description 34
- 238000010304 firing Methods 0.000 description 31
- 238000000034 method Methods 0.000 description 28
- 238000007747 plating Methods 0.000 description 25
- 239000002994 raw material Substances 0.000 description 20
- 238000004804 winding Methods 0.000 description 19
- 238000013507 mapping Methods 0.000 description 16
- 229910000859 α-Fe Inorganic materials 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 10
- 239000000203 mixture Substances 0.000 description 9
- 238000002360 preparation method Methods 0.000 description 9
- 239000011247 coating layer Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 229910052797 bismuth Inorganic materials 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 229910052718 tin Inorganic materials 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000003475 lamination Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000000149 penetrating effect Effects 0.000 description 3
- 229910018125 Al-Si Inorganic materials 0.000 description 2
- 229910018520 Al—Si Inorganic materials 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910015249 Ba—Si Inorganic materials 0.000 description 2
- 229910014458 Ca-Si Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910019064 Mg-Si Inorganic materials 0.000 description 2
- 229910019406 Mg—Si Inorganic materials 0.000 description 2
- 229910014106 Na-Si Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910006776 Si—Zn Inorganic materials 0.000 description 2
- 229910003526 Sr—Si Inorganic materials 0.000 description 2
- 229910004339 Ti-Si Inorganic materials 0.000 description 2
- 229910010978 Ti—Si Inorganic materials 0.000 description 2
- 229910007735 Zr—Si Inorganic materials 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 2
- 229910002113 barium titanate Inorganic materials 0.000 description 2
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000007261 regionalization Effects 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- UBEWDCMIDFGDOO-UHFFFAOYSA-N cobalt(II,III) oxide Inorganic materials [O-2].[O-2].[O-2].[O-2].[Co+2].[Co+3].[Co+3] UBEWDCMIDFGDOO-UHFFFAOYSA-N 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- AMWRITDGCCNYAT-UHFFFAOYSA-L manganese oxide Inorganic materials [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 238000004876 x-ray fluorescence Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F27/00—Details of transformers or inductances, in general
- H01F27/28—Coils; Windings; Conductive connections
- H01F27/29—Terminals; Tapping arrangements for signal inductances
- H01F27/292—Surface mounted devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F17/00—Fixed inductances of the signal type
- H01F17/04—Fixed inductances of the signal type with magnetic core
- H01F17/045—Fixed inductances of the signal type with magnetic core with core of cylindric geometry and coil wound along its longitudinal axis, i.e. rod or drum core
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F27/00—Details of transformers or inductances, in general
- H01F27/28—Coils; Windings; Conductive connections
- H01F27/2823—Wires
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Coils Or Transformers For Communication (AREA)
- Ceramic Capacitors (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021014488 | 2021-02-01 | ||
| JP2021014488 | 2021-02-01 | ||
| PCT/JP2021/044963 WO2022163140A1 (ja) | 2021-02-01 | 2021-12-07 | 電子部品 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2022163140A1 JPWO2022163140A1 (https=) | 2022-08-04 |
| JP7491411B2 true JP7491411B2 (ja) | 2024-05-28 |
Family
ID=82653316
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022578102A Active JP7491411B2 (ja) | 2021-02-01 | 2021-12-07 | 電子部品 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20230360843A1 (https=) |
| JP (1) | JP7491411B2 (https=) |
| CN (1) | CN116724367A (https=) |
| DE (1) | DE212021000512U1 (https=) |
| WO (1) | WO2022163140A1 (https=) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005317748A (ja) | 2004-04-28 | 2005-11-10 | Tdk Corp | 複合電子部品及びその製造方法 |
| JP2009302129A (ja) | 2008-06-10 | 2009-12-24 | Murata Mfg Co Ltd | セラミック電子部品、およびセラミック電子部品の製造方法 |
| WO2020241122A1 (ja) | 2019-05-24 | 2020-12-03 | 株式会社村田製作所 | 表面改質ガラス、電子部品、及び、ケイ酸塩皮膜の形成方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI402867B (zh) * | 2009-07-31 | 2013-07-21 | Murata Manufacturing Co | Laminated coil parts and manufacturing method thereof |
| JP6015221B2 (ja) * | 2012-08-07 | 2016-10-26 | 株式会社村田製作所 | セラミック電子部品の製造方法 |
| JP6914617B2 (ja) | 2016-05-11 | 2021-08-04 | Tdk株式会社 | 積層コイル部品 |
| JP6627734B2 (ja) * | 2016-12-14 | 2020-01-08 | 株式会社村田製作所 | セラミック電子部品及びその製造方法 |
-
2021
- 2021-12-07 JP JP2022578102A patent/JP7491411B2/ja active Active
- 2021-12-07 DE DE212021000512.8U patent/DE212021000512U1/de active Active
- 2021-12-07 WO PCT/JP2021/044963 patent/WO2022163140A1/ja not_active Ceased
- 2021-12-07 CN CN202180089179.0A patent/CN116724367A/zh active Pending
-
2023
- 2023-07-20 US US18/355,821 patent/US20230360843A1/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005317748A (ja) | 2004-04-28 | 2005-11-10 | Tdk Corp | 複合電子部品及びその製造方法 |
| JP2009302129A (ja) | 2008-06-10 | 2009-12-24 | Murata Mfg Co Ltd | セラミック電子部品、およびセラミック電子部品の製造方法 |
| WO2020241122A1 (ja) | 2019-05-24 | 2020-12-03 | 株式会社村田製作所 | 表面改質ガラス、電子部品、及び、ケイ酸塩皮膜の形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022163140A1 (ja) | 2022-08-04 |
| DE212021000512U1 (de) | 2023-08-22 |
| CN116724367A (zh) | 2023-09-08 |
| US20230360843A1 (en) | 2023-11-09 |
| JPWO2022163140A1 (https=) | 2022-08-04 |
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