JP7469864B2 - 位置決め装置、露光装置、および物品の製造方法 - Google Patents

位置決め装置、露光装置、および物品の製造方法 Download PDF

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Publication number
JP7469864B2
JP7469864B2 JP2019192133A JP2019192133A JP7469864B2 JP 7469864 B2 JP7469864 B2 JP 7469864B2 JP 2019192133 A JP2019192133 A JP 2019192133A JP 2019192133 A JP2019192133 A JP 2019192133A JP 7469864 B2 JP7469864 B2 JP 7469864B2
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Japan
Prior art keywords
stage
plate
positioning device
wall portion
original
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JP2019192133A
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English (en)
Japanese (ja)
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JP2021067775A (ja
Inventor
将人 本間
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2019192133A priority Critical patent/JP7469864B2/ja
Priority to TW109134697A priority patent/TWI811569B/zh
Priority to KR1020200134888A priority patent/KR20210047259A/ko
Priority to CN202011134936.5A priority patent/CN112764319A/zh
Publication of JP2021067775A publication Critical patent/JP2021067775A/ja
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Publication of JP7469864B2 publication Critical patent/JP7469864B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7019—Calibration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2019192133A 2019-10-21 2019-10-21 位置決め装置、露光装置、および物品の製造方法 Active JP7469864B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2019192133A JP7469864B2 (ja) 2019-10-21 2019-10-21 位置決め装置、露光装置、および物品の製造方法
TW109134697A TWI811569B (zh) 2019-10-21 2020-10-07 定位裝置、曝光裝置及物品之製造方法
KR1020200134888A KR20210047259A (ko) 2019-10-21 2020-10-19 위치결정 장치, 노광 장치, 및 물품의 제조 방법
CN202011134936.5A CN112764319A (zh) 2019-10-21 2020-10-21 定位装置、曝光装置以及物品的制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019192133A JP7469864B2 (ja) 2019-10-21 2019-10-21 位置決め装置、露光装置、および物品の製造方法

Publications (2)

Publication Number Publication Date
JP2021067775A JP2021067775A (ja) 2021-04-30
JP7469864B2 true JP7469864B2 (ja) 2024-04-17

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JP2019192133A Active JP7469864B2 (ja) 2019-10-21 2019-10-21 位置決め装置、露光装置、および物品の製造方法

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Country Link
JP (1) JP7469864B2 (zh)
KR (1) KR20210047259A (zh)
CN (1) CN112764319A (zh)
TW (1) TWI811569B (zh)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004241478A (ja) 2003-02-04 2004-08-26 Nikon Corp 露光方法及びその装置、並びにデバイス製造方法
JP2009141190A (ja) 2007-12-07 2009-06-25 Nikon Corp 露光装置、露光方法及びデバイス製造方法
JP2010161116A (ja) 2009-01-06 2010-07-22 Canon Inc 位置決め装置、それを用いた露光装置及びデバイスの製造方法
JP2012209401A (ja) 2011-03-29 2012-10-25 Canon Inc 計測装置、リソグラフィ装置及びデバイスの製造方法。
JP2017111243A (ja) 2015-12-15 2017-06-22 キヤノン株式会社 ステージ装置、リソグラフィ装置、及び物品の製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3089802B2 (ja) * 1992-04-01 2000-09-18 株式会社ニコン ステージの位置計測装置、投影露光装置及び投影露光方法
JPH1137895A (ja) * 1997-07-17 1999-02-12 Nikon Corp 反射率測定センサの検査方法
JP2001160531A (ja) * 1999-12-01 2001-06-12 Canon Inc ステージ装置
JP4125315B2 (ja) * 2005-10-11 2008-07-30 キヤノン株式会社 露光装置及びデバイス製造方法
JP5002613B2 (ja) * 2009-03-31 2012-08-15 株式会社東芝 Ｘｙステージ装置
JP5679850B2 (ja) * 2011-02-07 2015-03-04 キヤノン株式会社 インプリント装置、および、物品の製造方法
NL2015639A (en) * 2014-11-28 2016-09-20 Asml Netherlands Bv Encoder, position measurement system and lithographic apparatus.
JP6916616B2 (ja) * 2016-12-13 2021-08-11 キヤノン株式会社 リソグラフィ装置、物品の製造方法、および計測装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004241478A (ja) 2003-02-04 2004-08-26 Nikon Corp 露光方法及びその装置、並びにデバイス製造方法
JP2009141190A (ja) 2007-12-07 2009-06-25 Nikon Corp 露光装置、露光方法及びデバイス製造方法
JP2010161116A (ja) 2009-01-06 2010-07-22 Canon Inc 位置決め装置、それを用いた露光装置及びデバイスの製造方法
JP2012209401A (ja) 2011-03-29 2012-10-25 Canon Inc 計測装置、リソグラフィ装置及びデバイスの製造方法。
JP2017111243A (ja) 2015-12-15 2017-06-22 キヤノン株式会社 ステージ装置、リソグラフィ装置、及び物品の製造方法

Also Published As

Publication number Publication date
TWI811569B (zh) 2023-08-11
TW202117465A (zh) 2021-05-01
JP2021067775A (ja) 2021-04-30
KR20210047259A (ko) 2021-04-29
CN112764319A (zh) 2021-05-07

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