JP7459410B1 - レーザ装置およびレーザ加工装置 - Google Patents

レーザ装置およびレーザ加工装置 Download PDF

Info

Publication number
JP7459410B1
JP7459410B1 JP2024502677A JP2024502677A JP7459410B1 JP 7459410 B1 JP7459410 B1 JP 7459410B1 JP 2024502677 A JP2024502677 A JP 2024502677A JP 2024502677 A JP2024502677 A JP 2024502677A JP 7459410 B1 JP7459410 B1 JP 7459410B1
Authority
JP
Japan
Prior art keywords
pulsed light
aberration
laser device
laser
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2024502677A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2025088680A5 (https=
JPWO2025088680A1 (https=
Inventor
俊輔 藤井
望 平山
秀則 深堀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Application granted granted Critical
Publication of JP7459410B1 publication Critical patent/JP7459410B1/ja
Publication of JPWO2025088680A1 publication Critical patent/JPWO2025088680A1/ja
Publication of JPWO2025088680A5 publication Critical patent/JPWO2025088680A5/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0085—Modulating the output, i.e. the laser beam is modulated outside the laser cavity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/094076—Pulsed or modulated pumping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
    • H01S3/09415—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10007—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers
    • H01S3/1001—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by controlling the optical pumping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10007—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers
    • H01S3/10023—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by functional association of additional optical elements, e.g. filters, gratings, reflectors
    • H01S3/1003—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by functional association of additional optical elements, e.g. filters, gratings, reflectors tunable optical elements, e.g. acousto-optic filters, tunable gratings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2316—Cascaded amplifiers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2375—Hybrid lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Laser Beam Processing (AREA)
JP2024502677A 2023-10-24 2023-10-24 レーザ装置およびレーザ加工装置 Active JP7459410B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/038269 WO2025088680A1 (ja) 2023-10-24 2023-10-24 レーザ装置およびレーザ加工装置

Publications (3)

Publication Number Publication Date
JP7459410B1 true JP7459410B1 (ja) 2024-04-01
JPWO2025088680A1 JPWO2025088680A1 (https=) 2025-05-01
JPWO2025088680A5 JPWO2025088680A5 (https=) 2025-09-25

Family

ID=90474226

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024502677A Active JP7459410B1 (ja) 2023-10-24 2023-10-24 レーザ装置およびレーザ加工装置

Country Status (5)

Country Link
JP (1) JP7459410B1 (https=)
KR (1) KR20250178273A (https=)
CN (1) CN121420434A (https=)
TW (1) TWI897602B (https=)
WO (1) WO2025088680A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7672594B1 (ja) * 2024-08-09 2025-05-07 三菱電機株式会社 レーザ装置およびレーザ加工装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010234444A (ja) * 2009-03-11 2010-10-21 Omron Corp レーザ加工装置
JP2013102088A (ja) * 2011-11-09 2013-05-23 Fujikura Ltd Ｍｏｐａ方式レーザ光源装置およびｍｏｐａ方式レーザ制御方法
WO2021181511A1 (ja) * 2020-03-10 2021-09-16 三菱電機株式会社 波長変換レーザ装置および波長変換レーザ加工機
JP7254260B1 (ja) * 2022-09-12 2023-04-07 三菱電機株式会社 固体レーザ装置および固体レーザ加工装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101680882B1 (ko) 2014-04-22 2017-02-13 홀로스페이스 주식회사 초다시점 영상 배열 획득을 위한 카메라 배열방법
JP7441780B2 (ja) * 2020-12-21 2024-03-01 浜松ホトニクス株式会社 光パルス生成装置及び光パルス生成方法
KR20240017944A (ko) * 2021-09-16 2024-02-08 가부시키가이샤 가타오카 세이사쿠쇼 레이저 가공 장치, 프로브 카드의 생산 방법, 및 레이저 가공 방법
CN116224678A (zh) * 2023-03-14 2023-06-06 中国科学院半导体研究所 孤子光频梳及光生微波信号产生装置及其产生方法
CN116526275B (zh) * 2023-05-17 2025-08-19 北京大学 基于凹球面体镜片与多通腔的超短脉冲产生装置及方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010234444A (ja) * 2009-03-11 2010-10-21 Omron Corp レーザ加工装置
JP2013102088A (ja) * 2011-11-09 2013-05-23 Fujikura Ltd Ｍｏｐａ方式レーザ光源装置およびｍｏｐａ方式レーザ制御方法
WO2021181511A1 (ja) * 2020-03-10 2021-09-16 三菱電機株式会社 波長変換レーザ装置および波長変換レーザ加工機
JP7254260B1 (ja) * 2022-09-12 2023-04-07 三菱電機株式会社 固体レーザ装置および固体レーザ加工装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7672594B1 (ja) * 2024-08-09 2025-05-07 三菱電機株式会社 レーザ装置およびレーザ加工装置
WO2026033821A1 (ja) * 2024-08-09 2026-02-12 三菱電機株式会社 レーザ装置およびレーザ加工装置

Also Published As

Publication number Publication date
WO2025088680A1 (ja) 2025-05-01
CN121420434A (zh) 2026-01-27
JPWO2025088680A1 (https=) 2025-05-01
KR20250178273A (ko) 2025-12-26
TWI897602B (zh) 2025-09-11
TW202517385A (zh) 2025-05-01

Similar Documents

Publication Publication Date Title
JP5649548B2 (ja) サブ２１３ｎｍ波長を生成するためのＣＬＢＯにおける非臨界位相整合
JP7451656B2 (ja) レーザビームの方法及びシステム
CN113366713B (zh) 具有啁啾脉冲放大和修整脉冲序列的超短脉冲激光源
US8248688B2 (en) Tandem photonic amplifier
CN101443969A (zh) 具有耦合到一个主振荡器的多个同步放大器的激光装置
JP2007523499A (ja) レーザ装置
US20200036152A1 (en) Laser amplifier system
US20250347973A1 (en) Deep ultraviolet laser source
JP7459410B1 (ja) レーザ装置およびレーザ加工装置
JP2008511177A (ja) 半導体検査用のファイバ増幅器ベースの光源
Yoon et al. Ultra-high intensity lasers as tools for novel physics
Kim et al. Dual-cavity Nd: YAG laser with Laguerre-Gaussian (LG0n) mode output
WO2016125917A2 (ja) レーザ光源装置及びレーザパルス光生成方法
KR20240135776A (ko) 자외선 손상 완화 기능을 갖춘 레이저 주파수 변환
TWI869957B (zh) 固體雷射裝置以及固體雷射加工裝置
JP2018056146A (ja) レーザ光源装置及びレーザパルス光生成方法
JPWO2009090935A1 (ja) 光増幅器
JP7079953B2 (ja) 波長変換方法、波長変換装置及びレーザ光源装置
JP2013201328A (ja) ファイバ増幅装置とそのスペクトル幅を調整する方法及び該ファイバ増幅装置を備えるレーザ加工システムとその光損失を低減する方法
Dashkevich et al. Comparative studies of eye-safe intracavity and extracavity optical parametric oscillators with an unstable telescopic cavity
CN105490145A (zh) 一种基于自相似放大器的可调谐紫外光的产生装置
JP2026511265A (ja) レーザ活性媒体を光ポンピングするための光源
Lührmann et al. High-average power Nd: YVO4 regenerative amplifier seeded by a gain switched diode laser
CN119422296A (zh) 利用端泵浦的固态激光谐振器中的腔内频率转换
JP2006203117A (ja) 固体レーザ装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240117

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240117

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20240117

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20240220

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20240319

R150 Certificate of patent or registration of utility model

Ref document number: 7459410

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150