TWI897602B - 雷射裝置及雷射加工裝置 - Google Patents

雷射裝置及雷射加工裝置

Info

Publication number
TWI897602B
TWI897602B TW113132574A TW113132574A TWI897602B TW I897602 B TWI897602 B TW I897602B TW 113132574 A TW113132574 A TW 113132574A TW 113132574 A TW113132574 A TW 113132574A TW I897602 B TWI897602 B TW I897602B
Authority
TW
Taiwan
Prior art keywords
pulsed light
light
aberration generating
laser device
laser
Prior art date
Application number
TW113132574A
Other languages
English (en)
Chinese (zh)
Other versions
TW202517385A (zh
Inventor
藤井俊輔
平山望
深堀秀則
Original Assignee
日商三菱電機股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商三菱電機股份有限公司 filed Critical 日商三菱電機股份有限公司
Publication of TW202517385A publication Critical patent/TW202517385A/zh
Application granted granted Critical
Publication of TWI897602B publication Critical patent/TWI897602B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0085—Modulating the output, i.e. the laser beam is modulated outside the laser cavity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/094076—Pulsed or modulated pumping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
    • H01S3/09415—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10007—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers
    • H01S3/1001—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by controlling the optical pumping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10007—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers
    • H01S3/10023—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by functional association of additional optical elements, e.g. filters, gratings, reflectors
    • H01S3/1003—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by functional association of additional optical elements, e.g. filters, gratings, reflectors tunable optical elements, e.g. acousto-optic filters, tunable gratings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2316—Cascaded amplifiers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2375—Hybrid lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Laser Beam Processing (AREA)
TW113132574A 2023-10-24 2024-08-29 雷射裝置及雷射加工裝置 TWI897602B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/JP2023/038269 WO2025088680A1 (ja) 2023-10-24 2023-10-24 レーザ装置およびレーザ加工装置
WOPCT/JP2023/038269 2023-10-24

Publications (2)

Publication Number Publication Date
TW202517385A TW202517385A (zh) 2025-05-01
TWI897602B true TWI897602B (zh) 2025-09-11

Family

ID=90474226

Family Applications (1)

Application Number Title Priority Date Filing Date
TW113132574A TWI897602B (zh) 2023-10-24 2024-08-29 雷射裝置及雷射加工裝置

Country Status (5)

Country Link
JP (1) JP7459410B1 (https=)
KR (1) KR20250178273A (https=)
CN (1) CN121420434A (https=)
TW (1) TWI897602B (https=)
WO (1) WO2025088680A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7672594B1 (ja) * 2024-08-09 2025-05-07 三菱電機株式会社 レーザ装置およびレーザ加工装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021181511A1 (ja) * 2020-03-10 2021-09-16 三菱電機株式会社 波長変換レーザ装置および波長変換レーザ加工機
TW202224824A (zh) * 2020-12-21 2022-07-01 日商濱松赫德尼古斯股份有限公司 光脈衝產生裝置及光脈衝產生方法
JP7254260B1 (ja) * 2022-09-12 2023-04-07 三菱電機株式会社 固体レーザ装置および固体レーザ加工装置
CN116224678A (zh) * 2023-03-14 2023-06-06 中国科学院半导体研究所 孤子光频梳及光生微波信号产生装置及其产生方法
TW202322952A (zh) * 2021-09-16 2023-06-16 日商片岡製作所股份有限公司 雷射加工裝置、探針卡的生產方法和雷射加工方法
CN116526275A (zh) * 2023-05-17 2023-08-01 北京大学 基于凹球面体镜片与多通腔的超短脉冲产生装置及方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5760322B2 (ja) * 2009-03-11 2015-08-05 オムロン株式会社 レーザ加工装置
JP5918975B2 (ja) * 2011-11-09 2016-05-18 株式会社フジクラ Ｍｏｐａ方式レーザ光源装置およびｍｏｐａ方式レーザ制御方法
KR101680882B1 (ko) 2014-04-22 2017-02-13 홀로스페이스 주식회사 초다시점 영상 배열 획득을 위한 카메라 배열방법

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021181511A1 (ja) * 2020-03-10 2021-09-16 三菱電機株式会社 波長変換レーザ装置および波長変換レーザ加工機
TW202224824A (zh) * 2020-12-21 2022-07-01 日商濱松赫德尼古斯股份有限公司 光脈衝產生裝置及光脈衝產生方法
TW202322952A (zh) * 2021-09-16 2023-06-16 日商片岡製作所股份有限公司 雷射加工裝置、探針卡的生產方法和雷射加工方法
JP7254260B1 (ja) * 2022-09-12 2023-04-07 三菱電機株式会社 固体レーザ装置および固体レーザ加工装置
CN116224678A (zh) * 2023-03-14 2023-06-06 中国科学院半导体研究所 孤子光频梳及光生微波信号产生装置及其产生方法
CN116526275A (zh) * 2023-05-17 2023-08-01 北京大学 基于凹球面体镜片与多通腔的超短脉冲产生装置及方法

Also Published As

Publication number Publication date
WO2025088680A1 (ja) 2025-05-01
JP7459410B1 (ja) 2024-04-01
CN121420434A (zh) 2026-01-27
JPWO2025088680A1 (https=) 2025-05-01
KR20250178273A (ko) 2025-12-26
TW202517385A (zh) 2025-05-01

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