JP5649548B2 - サブ213nm波長を生成するためのCLBOにおける非臨界位相整合 - Google Patents
サブ213nm波長を生成するためのCLBOにおける非臨界位相整合 Download PDFInfo
- Publication number
- JP5649548B2 JP5649548B2 JP2011225281A JP2011225281A JP5649548B2 JP 5649548 B2 JP5649548 B2 JP 5649548B2 JP 2011225281 A JP2011225281 A JP 2011225281A JP 2011225281 A JP2011225281 A JP 2011225281A JP 5649548 B2 JP5649548 B2 JP 5649548B2
- Authority
- JP
- Japan
- Prior art keywords
- laser
- fiber
- laser energy
- frequency
- fiber laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000835 fiber Substances 0.000 claims description 252
- 239000013078 crystal Substances 0.000 claims description 93
- 238000000034 method Methods 0.000 claims description 40
- 239000000463 material Substances 0.000 claims description 23
- 239000004065 semiconductor Substances 0.000 claims description 14
- 238000001069 Raman spectroscopy Methods 0.000 claims description 13
- NNAZVIPNYDXXPF-UHFFFAOYSA-N [Li+].[Cs+].OB([O-])[O-] Chemical compound [Li+].[Cs+].OB([O-])[O-] NNAZVIPNYDXXPF-UHFFFAOYSA-N 0.000 claims description 5
- 238000005498 polishing Methods 0.000 claims description 5
- 238000005245 sintering Methods 0.000 claims description 2
- 239000007858 starting material Substances 0.000 claims description 2
- 239000000356 contaminant Substances 0.000 claims 2
- 239000007864 aqueous solution Substances 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 239000000243 solution Substances 0.000 claims 1
- 238000003756 stirring Methods 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 95
- 238000007689 inspection Methods 0.000 description 41
- 238000005253 cladding Methods 0.000 description 32
- 230000001427 coherent effect Effects 0.000 description 23
- 235000012431 wafers Nutrition 0.000 description 18
- 239000004038 photonic crystal Substances 0.000 description 17
- 230000003287 optical effect Effects 0.000 description 16
- 238000002156 mixing Methods 0.000 description 15
- 238000009499 grossing Methods 0.000 description 14
- 238000005286 illumination Methods 0.000 description 14
- 230000008901 benefit Effects 0.000 description 12
- 238000005086 pumping Methods 0.000 description 12
- 230000010287 polarization Effects 0.000 description 10
- 230000003595 spectral effect Effects 0.000 description 10
- 238000003384 imaging method Methods 0.000 description 9
- 239000013307 optical fiber Substances 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 8
- 239000006096 absorbing agent Substances 0.000 description 7
- 238000002310 reflectometry Methods 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 238000001228 spectrum Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 238000013459 approach Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 230000003993 interaction Effects 0.000 description 4
- 210000001747 pupil Anatomy 0.000 description 4
- 239000013598 vector Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- XBJJRSFLZVLCSE-UHFFFAOYSA-N barium(2+);diborate Chemical compound [Ba+2].[Ba+2].[Ba+2].[O-]B([O-])[O-].[O-]B([O-])[O-] XBJJRSFLZVLCSE-UHFFFAOYSA-N 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 3
- 230000009021 linear effect Effects 0.000 description 3
- 230000005381 magnetic domain Effects 0.000 description 3
- 230000009022 nonlinear effect Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910052775 Thulium Inorganic materials 0.000 description 2
- 229910052769 Ytterbium Inorganic materials 0.000 description 2
- JJFHSTASBVENMB-UHFFFAOYSA-N [Li].[Cs] Chemical compound [Li].[Cs] JJFHSTASBVENMB-UHFFFAOYSA-N 0.000 description 2
- 230000003321 amplification Effects 0.000 description 2
- ULWWJPPZLOWBOO-UHFFFAOYSA-N cesium lithium barium(2+) borate Chemical compound B([O-])([O-])[O-].[Ba+2].[Li+].[Cs+] ULWWJPPZLOWBOO-UHFFFAOYSA-N 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 239000002178 crystalline material Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003302 ferromagnetic material Substances 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- RNVLUPIJBMQVAJ-UHFFFAOYSA-N lithium barium(2+) borate Chemical compound [Li+].[Ba+2].[O-]B([O-])[O-] RNVLUPIJBMQVAJ-UHFFFAOYSA-N 0.000 description 2
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 230000007480 spreading Effects 0.000 description 2
- 230000002123 temporal effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- SXBYYSODIPNHAA-UHFFFAOYSA-N [Bi+3].[Bi+3].[Bi+3].[O-]B([O-])[O-].[O-]B([O-])[O-].[O-]B([O-])[O-] Chemical compound [Bi+3].[Bi+3].[Bi+3].[O-]B([O-])[O-].[O-]B([O-])[O-].[O-]B([O-])[O-] SXBYYSODIPNHAA-UHFFFAOYSA-N 0.000 description 1
- MOIAXUWKZTWEAM-UHFFFAOYSA-N [Li].[Sr].[Mg] Chemical compound [Li].[Sr].[Mg] MOIAXUWKZTWEAM-UHFFFAOYSA-N 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- JYYOBHFYCIDXHH-UHFFFAOYSA-N carbonic acid;hydrate Chemical compound O.OC(O)=O JYYOBHFYCIDXHH-UHFFFAOYSA-N 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 229910052805 deuterium Inorganic materials 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004146 energy storage Methods 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 210000000887 face Anatomy 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000005337 ground glass Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 239000000932 sedative agent Substances 0.000 description 1
- 230000001624 sedative effect Effects 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000002918 waste heat Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
- H01S3/06708—Constructional details of the fibre, e.g. compositions, cross-section, shape or tapering
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/3501—Constructional details or arrangements of non-linear optical devices, e.g. shape of non-linear crystals
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/3501—Constructional details or arrangements of non-linear optical devices, e.g. shape of non-linear crystals
- G02F1/3507—Arrangements comprising two or more nonlinear optical devices
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
- G02F1/3534—Three-wave interaction, e.g. sum-difference frequency generation
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
- G02F1/3536—Four-wave interaction
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
- G02F1/354—Third or higher harmonic generation
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
- G02F1/3544—Particular phase matching techniques
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/355—Non-linear optics characterised by the materials used
- G02F1/3551—Crystals
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/355—Non-linear optics characterised by the materials used
- G02F1/3551—Crystals
- G02F1/3553—Crystals having the formula MTiOYO4, where M=K, Rb, TI, NH4 or Cs and Y=P or As, e.g. KTP
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/355—Non-linear optics characterised by the materials used
- G02F1/3558—Poled materials, e.g. with periodic poling; Fabrication of domain inverted structures, e.g. for quasi-phase-matching [QPM]
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/37—Non-linear optics for second-harmonic generation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
- H01S3/06708—Constructional details of the fibre, e.g. compositions, cross-section, shape or tapering
- H01S3/06712—Polarising fibre; Polariser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
- H01S3/06708—Constructional details of the fibre, e.g. compositions, cross-section, shape or tapering
- H01S3/06729—Peculiar transverse fibre profile
- H01S3/06741—Photonic crystal fibre, i.e. the fibre having a photonic bandgap
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
- H01S3/0675—Resonators including a grating structure, e.g. distributed Bragg reflectors [DBR] or distributed feedback [DFB] fibre lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
- H01S3/06791—Fibre ring lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/094003—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light the pumped medium being a fibre
- H01S3/094007—Cladding pumping, i.e. pump light propagating in a clad surrounding the active core
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
- H01S3/09415—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1106—Mode locking
- H01S3/1112—Passive mode locking
- H01S3/1115—Passive mode locking using intracavity saturable absorbers
- H01S3/1118—Semiconductor saturable absorbers, e.g. semiconductor saturable absorber mirrors [SESAMs]; Solid-state saturable absorbers, e.g. carbon nanotube [CNT] based
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2383—Parallel arrangements
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Plasma & Fusion (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Lasers (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
図1及び図2は、ウエハ又はフォトマスク検査システムのための照明器を示している。図1はレーザ発振器101を示しており、一方、図2は、1つ以上のレーザ発振器201と1つ以上のファイバレーザ増幅器202とを組み合わせる更にやや複雑な照明器を示している。この構造は、利得媒体が光ファイバを備えるウエハ検査システム又はフォトマスク検査システムのための照明器である。光学結晶の付加を伴う光ファイバ技術は、狭帯域光を広げることにより或いは光を1つの狭帯域波長から他の狭帯域波長へとシフトさせることにより光波長の調整を可能にする。
DUV周波数変換のためにCLBOを使用すると、高い周波数変換効率、高い損傷閾値、及び比較的良好な安定性を与えることができる。
<第1の実施形態の例>
1ω 998.444
2ω 499.222 LBO又はBIBO
4ω 249.611 CLBO又はBBO
4ω+1ω 199.7 CLBO
<第2の実施形態の例>
1ω 1064
1ω 1193.33へのラマンシフト
2ω ラマン 477.332 LBO又はBIBO
4ω ラマン 238.666 CLBO又はBBO
4ω+1064 194.9 CLBO
<参考例>
1ω 847.008nm
2ω 423.504 LBO又はBIBO
3ω 282.336 LBO、CLBO又はBBO
3ω+1ω 211.75 CLBO
Claims (10)
- 光エネルギを生成するための方法であって、
基本周波数レーザエネルギを生成するレーザ発生器を用いて、約998nmの波長の基本周波数レーザエネルギを生成する段階と、
基本周波数レーザエネルギの一部を第2高調波周波数レーザエネルギへ変換する段階と、
第2高調波周波数レーザエネルギを第4高調波周波数レーザエネルギへ更に変換する段階と、
第4高調波周波数レーザエネルギを前記基本周波数レーザエネルギの別の一部と混合させて、和周波数のレーザエネルギを生成し、前記混合がホウ酸セシウムリチウム(CLBO)の結晶における非臨界位相整合によって行なわれる段階と、
を含む方法。 - 基本周波数レーザエネルギがファイバレーザによって生成される請求項1に記載の方法。
- 基本周波数レーザエネルギが半導体ダイオードレーザによって生成される請求項1に記載の方法。
- 基本周波数レーザエネルギがラマンレーザによって生成される請求項1に記載の方法。
- 基本周波数レーザエネルギを第2高調波周波数レーザエネルギへ変換するために、CLBO結晶、BBO結晶、LBO結晶、BiBO結晶、及び周期分極反転材料を含むグループからの少なくとも1つが使用される請求項1に記載の方法。
- 基本周波数レーザエネルギを第2高調波周波数レーザエネルギへ変換するために2つの結晶が使用される請求項5に記載の方法。
- 位相整合状態を維持するためにCLBO結晶の温度が制御される請求項1に記載の方法。
- 基本周波数レーザエネルギが周波数逓倍レーザによって生成される請求項1に記載の方法。
- 周波数逓倍レーザは、約1996nmの波長を有するTmドープされたファイバレーザである請求項8に記載の方法。
- CLBO結晶は、
CLBOの表面をイオン研磨して、サブ表面損傷及び標準的な研磨汚染物質を除去する段階と、
表面をMRF研磨して、サブ表面損傷及び標準的な研磨汚染物質を除去する段階と、
焼結前に水溶液を使用して出発材料を処理する段階と、
結晶成長中に溶液を攪拌する段階と、
少なくとも100時間にわたってCLBO結晶をベークして、任意の残留水分を除去する段階と、
を含むグループからの少なくとも1つにしたがって処理される請求項1に記載の方法。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US70320905P | 2005-07-28 | 2005-07-28 | |
US60/703,209 | 2005-07-28 | ||
US11/346,021 | 2006-02-01 | ||
US11/346,021 US7627007B1 (en) | 2004-08-25 | 2006-02-01 | Non-critical phase matching in CLBO to generate sub-213nm wavelengths |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008524137A Division JP2009513995A (ja) | 2005-07-28 | 2006-07-26 | サブ213nm波長を生成するためのCLBOにおける非臨界位相整合 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012022340A JP2012022340A (ja) | 2012-02-02 |
JP5649548B2 true JP5649548B2 (ja) | 2015-01-07 |
Family
ID=37709160
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008524137A Pending JP2009513995A (ja) | 2005-07-28 | 2006-07-26 | サブ213nm波長を生成するためのCLBOにおける非臨界位相整合 |
JP2011225281A Active JP5649548B2 (ja) | 2005-07-28 | 2011-10-12 | サブ213nm波長を生成するためのCLBOにおける非臨界位相整合 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008524137A Pending JP2009513995A (ja) | 2005-07-28 | 2006-07-26 | サブ213nm波長を生成するためのCLBOにおける非臨界位相整合 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7627007B1 (ja) |
EP (1) | EP1908179B1 (ja) |
JP (2) | JP2009513995A (ja) |
WO (1) | WO2007016217A2 (ja) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8953647B1 (en) * | 2007-03-21 | 2015-02-10 | Lockheed Martin Corporation | High-power laser using thulium-doped fiber amplifier and frequency quadrupling for blue output |
JP2009074851A (ja) * | 2007-09-19 | 2009-04-09 | Nuflare Technology Inc | 検査装置及び検査方法 |
DE112010000850B4 (de) * | 2009-02-13 | 2017-04-06 | Kla-Tencor Corp. | Verfahren und Vorrichtung zum Aufrechterhalten und Erzeugen eines Plasmas |
US9023152B2 (en) * | 2009-09-17 | 2015-05-05 | Kla-Tencor Corporation | CLBO crystal growth |
JP2011128330A (ja) * | 2009-12-17 | 2011-06-30 | Nikon Corp | レーザ装置 |
JP4590578B1 (ja) | 2010-04-01 | 2010-12-01 | レーザーテック株式会社 | 光源装置、マスク検査装置、及びコヒーレント光発生方法 |
US8873596B2 (en) | 2011-07-22 | 2014-10-28 | Kla-Tencor Corporation | Laser with high quality, stable output beam, and long life high conversion efficiency non-linear crystal |
US9678350B2 (en) * | 2012-03-20 | 2017-06-13 | Kla-Tencor Corporation | Laser with integrated multi line or scanning beam capability |
EP2842201B1 (en) * | 2012-04-27 | 2021-09-01 | biolitec Unternehmensbeteiligungs II AG | Fiber laser system for medical applications |
JP6016086B2 (ja) * | 2012-08-02 | 2016-10-26 | 株式会社ニコン | 紫外レーザ装置、この紫外レーザ装置を備えた露光装置及び検査装置 |
US9042006B2 (en) | 2012-09-11 | 2015-05-26 | Kla-Tencor Corporation | Solid state illumination source and inspection system |
EP2929602A4 (en) * | 2012-12-07 | 2016-12-21 | Foro Energy Inc | HIGH PERFORMANCE LASERS AND ENVIRONMENTS WITH WAVE LENGTH CONVERSIONS AND WAVELENGTH ADJUSTMENTS |
US8929406B2 (en) | 2013-01-24 | 2015-01-06 | Kla-Tencor Corporation | 193NM laser and inspection system |
US9529182B2 (en) | 2013-02-13 | 2016-12-27 | KLA—Tencor Corporation | 193nm laser and inspection system |
US20170238807A9 (en) * | 2013-03-15 | 2017-08-24 | LX Medical, Inc. | Tissue imaging and image guidance in luminal anatomic structures and body cavities |
US9608399B2 (en) | 2013-03-18 | 2017-03-28 | Kla-Tencor Corporation | 193 nm laser and an inspection system using a 193 nm laser |
US9537282B2 (en) * | 2013-09-20 | 2017-01-03 | Alcatel Lucent | System and method for a multi-mode pump in an optical amplifier |
US9804101B2 (en) | 2014-03-20 | 2017-10-31 | Kla-Tencor Corporation | System and method for reducing the bandwidth of a laser and an inspection system and method using a laser |
WO2015174388A1 (ja) * | 2014-05-15 | 2015-11-19 | 株式会社オキサイド | 深紫外レーザ発生装置および光源装置 |
US9419407B2 (en) | 2014-09-25 | 2016-08-16 | Kla-Tencor Corporation | Laser assembly and inspection system using monolithic bandwidth narrowing apparatus |
US9748729B2 (en) | 2014-10-03 | 2017-08-29 | Kla-Tencor Corporation | 183NM laser and inspection system |
WO2017064789A1 (ja) * | 2015-10-15 | 2017-04-20 | 国立大学法人 東京大学 | 固体レーザシステムおよびエキシマレーザシステム |
CN107317217B (zh) * | 2016-04-26 | 2019-12-17 | 中国科学院理化技术研究所 | 一种基于ⅱ类非临界相位匹配的共振增强腔倍频装置 |
US10175555B2 (en) | 2017-01-03 | 2019-01-08 | KLA—Tencor Corporation | 183 nm CW laser and inspection system |
KR102636261B1 (ko) | 2019-03-25 | 2024-02-13 | 에이에스엠엘 네델란즈 비.브이. | 주파수 확장 장치 및 방법 |
KR20210121322A (ko) | 2020-03-26 | 2021-10-08 | 삼성전자주식회사 | 기판 검사 시스템 |
CN115769140A (zh) | 2020-07-08 | 2023-03-07 | Asml荷兰有限公司 | 具有延长的光纤使用寿命的基于空芯光纤的宽带辐射产生器 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2812427B2 (ja) * | 1994-07-18 | 1998-10-22 | 科学技術振興事業団 | セシウム・リチウム・ボレート結晶 |
JPH09148660A (ja) * | 1995-11-24 | 1997-06-06 | Mitsubishi Electric Corp | 半導体レーザ装置および光増幅装置 |
US5742626A (en) * | 1996-08-14 | 1998-04-21 | Aculight Corporation | Ultraviolet solid state laser, method of using same and laser surgery apparatus |
US6381255B1 (en) * | 1997-07-16 | 2002-04-30 | The Lions Eye Institute Of Western Australia Incorporated | Solid state UV laser |
JP2000221554A (ja) * | 1999-01-29 | 2000-08-11 | Ushio Sogo Gijutsu Kenkyusho:Kk | 波長変換用光学素子 |
JP2000271764A (ja) * | 1999-03-29 | 2000-10-03 | Japan Science & Technology Corp | イオンビームエッチングによる光学素子表面の処理方法 |
JP2001053371A (ja) * | 1999-08-11 | 2001-02-23 | Inst Of Physical & Chemical Res | 真空紫外光発生方法及び発生装置並びにその利用装置 |
EP1602751B1 (en) * | 2003-02-13 | 2012-10-03 | Japan Science and Technology Agency | Method for preparing borate-based crystal |
JP4446300B2 (ja) * | 2003-11-12 | 2010-04-07 | サイバーレーザー株式会社 | 第5高調波発生装置 |
-
2006
- 2006-02-01 US US11/346,021 patent/US7627007B1/en active Active
- 2006-07-26 WO PCT/US2006/029135 patent/WO2007016217A2/en active Search and Examination
- 2006-07-26 EP EP06788626.7A patent/EP1908179B1/en active Active
- 2006-07-26 JP JP2008524137A patent/JP2009513995A/ja active Pending
-
2011
- 2011-10-12 JP JP2011225281A patent/JP5649548B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
WO2007016217A2 (en) | 2007-02-08 |
US7627007B1 (en) | 2009-12-01 |
EP1908179B1 (en) | 2014-04-23 |
JP2009513995A (ja) | 2009-04-02 |
EP1908179A4 (en) | 2009-12-02 |
WO2007016217A3 (en) | 2009-06-04 |
JP2012022340A (ja) | 2012-02-02 |
EP1908179A2 (en) | 2008-04-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5649548B2 (ja) | サブ213nm波長を生成するためのCLBOにおける非臨界位相整合 | |
US7924892B2 (en) | Fiber amplifier based light source for semiconductor inspection | |
EP2369695B1 (en) | Fiber amplifier based light source for semiconductor inspection | |
US7535938B2 (en) | Low-noise monolithic microchip lasers capable of producing wavelengths ranging from IR to UV based on efficient and cost-effective frequency conversion | |
US7212275B2 (en) | Exposure apparatus with laser device | |
US7733922B1 (en) | Method and apparatus for fast pulse harmonic fiber laser | |
KR102100728B1 (ko) | 둥근 출력빔을 가진 고효율, 단일-패스, 고조파 발생기 | |
US8964798B2 (en) | Reducing the spectral bandwidth of lasers | |
JP6640733B2 (ja) | 垂直入射取付けの多結晶tm:ii−vi材料を有する中赤外線カーレンズモードロックレーザー及び、多結晶tm:ii−viカーレンズモードロックレーザーのパラメータを制御するための方法 | |
JP2005533380A (ja) | 遠隔uvレーザシステム及び使用方法 | |
JP5203063B2 (ja) | 多光子励起測定装置 | |
JP2001083557A (ja) | レーザ装置 | |
US9429813B2 (en) | Deep ultraviolet laser generation device and light source device | |
US20120044959A1 (en) | Terahertz source | |
JP2004063924A (ja) | レーザアニール方法及び装置 | |
JPWO2012160801A1 (ja) | 受動qスイッチ型固体レーザ装置 | |
RU2328064C2 (ru) | Волоконный лазер с внутрирезонаторным удвоением частоты (варианты) | |
US20050036531A1 (en) | Laser device | |
Kratochvíl et al. | 1.7 μm diode-pumped Tm: GGAG and Tm, Ho: GGAG 2.0-2.1 μm laser | |
JP7459410B1 (ja) | レーザ装置およびレーザ加工装置 | |
JP7513886B2 (ja) | レーザ装置、及びレーザ装置の動作方法 | |
US20230124281A1 (en) | Apparatus and method for adjusting the wavelength of light | |
Dashkevich et al. | Comparative studies of eye-safe intracavity and extracavity optical parametric oscillators with an unstable telescopic cavity | |
Griesbeck et al. | High-pulse-energy, Q-switched Ho3+: YAG laser for mid-infrared optical parametric oscillator pumping | |
JP4029120B2 (ja) | モリブデン酸鉛単結晶によるパルスレーザー光の短パルス化の方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130514 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20130812 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20130815 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130912 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20140304 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140527 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20141014 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20141111 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5649548 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |