JP7441725B2 - 含フッ素アルキルスルホニルクロリドの製造方法 - Google Patents
含フッ素アルキルスルホニルクロリドの製造方法 Download PDFInfo
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- JP7441725B2 JP7441725B2 JP2020092371A JP2020092371A JP7441725B2 JP 7441725 B2 JP7441725 B2 JP 7441725B2 JP 2020092371 A JP2020092371 A JP 2020092371A JP 2020092371 A JP2020092371 A JP 2020092371A JP 7441725 B2 JP7441725 B2 JP 7441725B2
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- fluorine
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- alkylsulfonyl chloride
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- alkylthiourea
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- 239000011737 fluorine Substances 0.000 title claims description 67
- 229910052731 fluorine Inorganic materials 0.000 title claims description 67
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims description 65
- -1 alkylsulfonyl chloride Chemical compound 0.000 title claims description 41
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- JRNVZBWKYDBUCA-UHFFFAOYSA-N N-chlorosuccinimide Chemical compound ClN1C(=O)CCC1=O JRNVZBWKYDBUCA-UHFFFAOYSA-N 0.000 claims description 40
- 238000006243 chemical reaction Methods 0.000 claims description 27
- 150000003839 salts Chemical class 0.000 claims description 25
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 23
- 239000003960 organic solvent Substances 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 8
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 125000000962 organic group Chemical group 0.000 claims description 6
- 239000012046 mixed solvent Substances 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 description 15
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 13
- 239000000460 chlorine Substances 0.000 description 13
- 239000000243 solution Substances 0.000 description 11
- 238000002156 mixing Methods 0.000 description 8
- 238000003756 stirring Methods 0.000 description 7
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical class NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- 125000001841 imino group Chemical group [H]N=* 0.000 description 6
- 239000011259 mixed solution Substances 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- 125000004430 oxygen atom Chemical group O* 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 3
- 239000012320 chlorinating reagent Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000010908 decantation Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 230000007717 exclusion Effects 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 150000002221 fluorine Chemical class 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 229910052938 sodium sulfate Inorganic materials 0.000 description 2
- 235000011152 sodium sulphate Nutrition 0.000 description 2
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 2
- 235000019345 sodium thiosulphate Nutrition 0.000 description 2
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 125000004450 alkenylene group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 125000004419 alkynylene group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000002993 cycloalkylene group Chemical group 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
この場合、反応温度が40℃以上60℃以下の範囲内にあるので、フッ素アルキルスルホニルクロリドをより高い収率で製造することができる。
図1に示す含フッ素アルキルスルホニルクロリドの製造方法は、仕込み工程S1と、混合工程S2と、反応工程S3と、精製工程S4と、を含む。
例えば、図1に示すフロー図では、仕込み工程S1で、反応容器に、NCSと有機溶媒と水と酸とを投入して混合液を調製し、混合工程S2で混合液に含フッ素アルキルチオ尿素塩を添加しているが、原料の混合順序はこれに限定されるものではない。例えば、有機溶媒と水と酸とを混合して調製した混合液に、NCSと含フッ素アルキルチオ尿素塩とを同時に添加してもよい。
含フッ素アルキルチオ尿素塩として、C8F17CH2CH2SC(NH2)2Iを用意した。このC8F17CH2CH2SC(NH2)2Iは、非特許文献1(Angew.Chem.Int.Ed.2009,48,586-589.)に記載されている方法に従って、C8F17CH2CH2Iとチオ尿素とを用いて合成した。
原料である含フッ素アルキルチオ尿素塩の種類と、含フッ素アルキルチオ尿素塩を投入する混合液の初期温度、そして、その後の反応温度を、下記の表1に示すように変えたこと以外は、本発明例1と同様にして、含フッ素アルキルスルホニルクロリドを得た。
得られた含フッ素アルキルスルホニルクロリドの組成と収率とを、下記の表1に示す。
Claims (2)
- 前記反応温度が40℃以上60℃以下の範囲内にある請求項1に記載の含フッ素アルキルスルホニルクロリドの製造方法。
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JP7441725B2 true JP7441725B2 (ja) | 2024-03-01 |
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003104950A (ja) | 2001-09-28 | 2003-04-09 | Dainippon Ink & Chem Inc | ペルフルオロアルキルスルホニルハライドの製造方法 |
JP2003104951A (ja) | 2001-09-28 | 2003-04-09 | Dainippon Ink & Chem Inc | ペルフルオロアルキルスルホニルハライドの製造法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS5277032A (en) * | 1975-12-23 | 1977-06-29 | Toyo Pharma Kk | Process for manufacture of 44substituted benzylsulfonamide |
DK172447B1 (da) * | 1995-04-05 | 1998-07-13 | Topsoe Haldor As | Fremgangsmåde til fremstilling af fluorerede alkylsulfonylhalider |
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- 2020-05-27 JP JP2020092371A patent/JP7441725B2/ja active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2003104950A (ja) | 2001-09-28 | 2003-04-09 | Dainippon Ink & Chem Inc | ペルフルオロアルキルスルホニルハライドの製造方法 |
JP2003104951A (ja) | 2001-09-28 | 2003-04-09 | Dainippon Ink & Chem Inc | ペルフルオロアルキルスルホニルハライドの製造法 |
Non-Patent Citations (2)
Title |
---|
Elisabeth Blom et al.,Use of perfluoro groups in nucleophilic 18F-fluorination,Journal of Labelled Compounds and Radiopharmaceuticals,2010年,53巻,24-30頁 |
Romain Bejot et al.,Fluorous Synthesis of 18F Radiotracers with the [18F]Fluoride Ion: Nucleophilic Fluorination as the Detagging Process,Angewandte Chemie International Edition,2009年,48巻,586-589頁 |
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