JP7417367B2 - 成膜装置用部品及びこれを備えた成膜装置 - Google Patents

成膜装置用部品及びこれを備えた成膜装置 Download PDF

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Publication number
JP7417367B2
JP7417367B2 JP2019098647A JP2019098647A JP7417367B2 JP 7417367 B2 JP7417367 B2 JP 7417367B2 JP 2019098647 A JP2019098647 A JP 2019098647A JP 2019098647 A JP2019098647 A JP 2019098647A JP 7417367 B2 JP7417367 B2 JP 7417367B2
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Japan
Prior art keywords
film
film forming
sprayed film
sprayed
forming apparatus
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JP2019098647A
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English (en)
Japanese (ja)
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JP2020193356A (ja
Inventor
豊 門脇
敏伸 吉田
仁栄 赤瀬
孝信 高山
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Ulvac Techno Ltd
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Ulvac Techno Ltd
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Publication date
Application filed by Ulvac Techno Ltd filed Critical Ulvac Techno Ltd
Priority to JP2019098647A priority Critical patent/JP7417367B2/ja
Priority to KR1020200053285A priority patent/KR20200136309A/ko
Priority to CN202010447387.0A priority patent/CN111996486B/zh
Publication of JP2020193356A publication Critical patent/JP2020193356A/ja
Priority to KR1020220159155A priority patent/KR20220165676A/ko
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Publication of JP7417367B2 publication Critical patent/JP7417367B2/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C23C4/067—Metallic material containing free particles of non-metal elements, e.g. carbon, silicon, boron, phosphorus or arsenic
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C23C4/08—Metallic material containing only metal elements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/131—Wire arc spraying

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Physical Vapour Deposition (AREA)
JP2019098647A 2019-05-27 2019-05-27 成膜装置用部品及びこれを備えた成膜装置 Active JP7417367B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2019098647A JP7417367B2 (ja) 2019-05-27 2019-05-27 成膜装置用部品及びこれを備えた成膜装置
KR1020200053285A KR20200136309A (ko) 2019-05-27 2020-05-04 성막 장치용 부품, 및 성막 장치용 부품을 갖춘 성막 장치
CN202010447387.0A CN111996486B (zh) 2019-05-27 2020-05-25 成膜装置用部件及具备成膜装置用部件的成膜装置
KR1020220159155A KR20220165676A (ko) 2019-05-27 2022-11-24 성막 장치용 부품, 및 성막 장치용 부품을 갖춘 성막 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019098647A JP7417367B2 (ja) 2019-05-27 2019-05-27 成膜装置用部品及びこれを備えた成膜装置

Publications (2)

Publication Number Publication Date
JP2020193356A JP2020193356A (ja) 2020-12-03
JP7417367B2 true JP7417367B2 (ja) 2024-01-18

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JP2019098647A Active JP7417367B2 (ja) 2019-05-27 2019-05-27 成膜装置用部品及びこれを備えた成膜装置

Country Status (3)

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JP (1) JP7417367B2 (ko)
KR (2) KR20200136309A (ko)
CN (1) CN111996486B (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7398593B1 (ja) 2023-08-18 2023-12-14 アルバックテクノ株式会社 混合溶射膜及び成膜装置用部品並びに成膜装置用部品の製造方法及び混合溶射膜の製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002363728A (ja) 2001-06-06 2002-12-18 Toshiba Corp 真空成膜装置用部品とそれを用いた真空成膜装置
JP2005248296A (ja) 2004-03-08 2005-09-15 Ulvac Material Kk 成膜装置用部品及び成膜装置
JP2005350715A (ja) 2004-06-09 2005-12-22 Nec Yamaguchi Ltd 薄膜形成装置用部品およびその製造方法
JP3149859U (ja) 2009-02-04 2009-04-16 株式会社島津製作所 プラズマ処理装置
WO2011052640A1 (ja) 2009-10-29 2011-05-05 株式会社アルバック 水反応性Ａｌ複合材料、水反応性Ａｌ膜、このＡｌ膜の製造方法、及び成膜室用構成部材
WO2016035599A1 (ja) 2014-09-05 2016-03-10 株式会社アルバック 水反応性Ａｌ複合材料、水反応性Ａｌ合金溶射膜、このＡｌ合金溶射膜の製造方法、及び成膜室用構成部材

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07207427A (ja) * 1994-01-19 1995-08-08 Nissin Electric Co Ltd 膜形成方法
JP3815591B2 (ja) * 1999-08-11 2006-08-30 アルバックマテリアル株式会社 成膜装置用部品の製造方法および成膜装置用部品
TW570987B (en) * 1999-12-28 2004-01-11 Toshiba Corp Components for vacuum deposition apparatus and vacuum deposition apparatus therewith, and target apparatus
JP4551561B2 (ja) * 1999-12-28 2010-09-29 株式会社東芝 真空成膜装置用部品とそれを用いた真空成膜装置、およびターゲット装置
JP2004232016A (ja) * 2003-01-30 2004-08-19 Toshiba Corp 真空成膜装置用部品およびそれを用いた真空成膜装置
JP2007073823A (ja) * 2005-09-08 2007-03-22 Toshiba Ceramics Co Ltd セラミックス被覆材およびその製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002363728A (ja) 2001-06-06 2002-12-18 Toshiba Corp 真空成膜装置用部品とそれを用いた真空成膜装置
JP2005248296A (ja) 2004-03-08 2005-09-15 Ulvac Material Kk 成膜装置用部品及び成膜装置
JP2005350715A (ja) 2004-06-09 2005-12-22 Nec Yamaguchi Ltd 薄膜形成装置用部品およびその製造方法
JP3149859U (ja) 2009-02-04 2009-04-16 株式会社島津製作所 プラズマ処理装置
WO2011052640A1 (ja) 2009-10-29 2011-05-05 株式会社アルバック 水反応性Ａｌ複合材料、水反応性Ａｌ膜、このＡｌ膜の製造方法、及び成膜室用構成部材
WO2016035599A1 (ja) 2014-09-05 2016-03-10 株式会社アルバック 水反応性Ａｌ複合材料、水反応性Ａｌ合金溶射膜、このＡｌ合金溶射膜の製造方法、及び成膜室用構成部材

Also Published As

Publication number Publication date
CN111996486A (zh) 2020-11-27
KR20200136309A (ko) 2020-12-07
JP2020193356A (ja) 2020-12-03
CN111996486B (zh) 2023-04-28
KR20220165676A (ko) 2022-12-15

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