JP7386742B2 - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP7386742B2
JP7386742B2 JP2020052629A JP2020052629A JP7386742B2 JP 7386742 B2 JP7386742 B2 JP 7386742B2 JP 2020052629 A JP2020052629 A JP 2020052629A JP 2020052629 A JP2020052629 A JP 2020052629A JP 7386742 B2 JP7386742 B2 JP 7386742B2
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JP
Japan
Prior art keywords
base material
main surface
holding plate
exposure
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2020052629A
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English (en)
Japanese (ja)
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JP2021152577A (ja
Inventor
寛行 神田
望 原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Original Assignee
Screen Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP2020052629A priority Critical patent/JP7386742B2/ja
Priority to TW110107810A priority patent/TWI758119B/zh
Priority to KR1020210034777A priority patent/KR102560818B1/ko
Priority to CN202110304668.5A priority patent/CN113448178A/zh
Publication of JP2021152577A publication Critical patent/JP2021152577A/ja
Application granted granted Critical
Publication of JP7386742B2 publication Critical patent/JP7386742B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Optics & Photonics (AREA)
  • Multimedia (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2020052629A 2020-03-24 2020-03-24 露光装置 Active JP7386742B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2020052629A JP7386742B2 (ja) 2020-03-24 2020-03-24 露光装置
TW110107810A TWI758119B (zh) 2020-03-24 2021-03-05 曝光裝置
KR1020210034777A KR102560818B1 (ko) 2020-03-24 2021-03-17 노광 장치
CN202110304668.5A CN113448178A (zh) 2020-03-24 2021-03-22 曝光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020052629A JP7386742B2 (ja) 2020-03-24 2020-03-24 露光装置

Publications (2)

Publication Number Publication Date
JP2021152577A JP2021152577A (ja) 2021-09-30
JP7386742B2 true JP7386742B2 (ja) 2023-11-27

Family

ID=77809175

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020052629A Active JP7386742B2 (ja) 2020-03-24 2020-03-24 露光装置

Country Status (4)

Country Link
JP (1) JP7386742B2 (zh)
KR (1) KR102560818B1 (zh)
CN (1) CN113448178A (zh)
TW (1) TWI758119B (zh)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008292915A (ja) 2007-05-28 2008-12-04 Orc Mfg Co Ltd 露光描画装置
US20130070228A1 (en) 2011-09-16 2013-03-21 Ushio Denki Kabushiki Kaisha Exposure apparatus
JP2013114153A (ja) 2011-11-30 2013-06-10 Dainippon Screen Mfg Co Ltd 撮像装置、アライメント装置およびパターン形成装置
JP2013213852A (ja) 2012-03-30 2013-10-17 Fujifilm Corp 露光描画装置及び露光描画方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100805142B1 (ko) * 1999-07-16 2008-02-21 가부시키가이샤 니콘 노광방법 및 노광장치
AU2002221133A1 (en) * 2000-12-15 2002-06-24 Nikon Corporation Exposure method and system, and device producing method
JP2004214552A (ja) * 2003-01-08 2004-07-29 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
JP4472626B2 (ja) * 2005-12-14 2010-06-02 株式会社オーク製作所 露光装置
TW200729292A (en) * 2005-12-22 2007-08-01 Qimonda Ag Apparatus for preserving and using at least one photolithograph projection photo mask and the method using the same in the exposure apparatus
JPWO2011105461A1 (ja) * 2010-02-24 2013-06-20 Ｎｓｋテクノロジー株式会社 露光装置用光照射装置、露光装置、露光方法、基板の製造方法、マスク、及び被露光基板
JP5524668B2 (ja) * 2010-03-26 2014-06-18 ラピスセミコンダクタ株式会社 ウエハ保持装置及び方法
JP6142450B2 (ja) * 2011-09-09 2017-06-07 株式会社ブイ・テクノロジー 密着露光装置及び密着露光方法
JP6496017B2 (ja) * 2014-11-13 2019-04-03 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置およびデバイス製造方法
JP6612632B2 (ja) * 2016-01-26 2019-11-27 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP6670674B2 (ja) * 2016-05-18 2020-03-25 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP6735656B2 (ja) * 2016-11-18 2020-08-05 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP7045890B2 (ja) * 2018-03-20 2022-04-01 株式会社Ｓｃｒｅｅｎホールディングス パターン描画装置およびパターン描画方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008292915A (ja) 2007-05-28 2008-12-04 Orc Mfg Co Ltd 露光描画装置
US20130070228A1 (en) 2011-09-16 2013-03-21 Ushio Denki Kabushiki Kaisha Exposure apparatus
JP2013114153A (ja) 2011-11-30 2013-06-10 Dainippon Screen Mfg Co Ltd 撮像装置、アライメント装置およびパターン形成装置
JP2013213852A (ja) 2012-03-30 2013-10-17 Fujifilm Corp 露光描画装置及び露光描画方法

Also Published As

Publication number Publication date
KR20210119312A (ko) 2021-10-05
KR102560818B1 (ko) 2023-07-27
TWI758119B (zh) 2022-03-11
TW202136928A (zh) 2021-10-01
JP2021152577A (ja) 2021-09-30
CN113448178A (zh) 2021-09-28

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