JP7350029B2 - 搬送装置及び成膜装置 - Google Patents

搬送装置及び成膜装置 Download PDF

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Publication number
JP7350029B2
JP7350029B2 JP2021099596A JP2021099596A JP7350029B2 JP 7350029 B2 JP7350029 B2 JP 7350029B2 JP 2021099596 A JP2021099596 A JP 2021099596A JP 2021099596 A JP2021099596 A JP 2021099596A JP 7350029 B2 JP7350029 B2 JP 7350029B2
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Japan
Prior art keywords
mask
unit
substrate
chamber
conveying device
Prior art date
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Active
Application number
JP2021099596A
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English (en)
Japanese (ja)
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JP2022191003A (ja
Inventor
将樹 足立
孝宗 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Tokki Corp
Original Assignee
Canon Tokki Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Tokki Corp filed Critical Canon Tokki Corp
Priority to JP2021099596A priority Critical patent/JP7350029B2/ja
Priority to KR1020220070143A priority patent/KR20220168159A/ko
Priority to CN202210659287.3A priority patent/CN115478256B/zh
Publication of JP2022191003A publication Critical patent/JP2022191003A/ja
Application granted granted Critical
Publication of JP7350029B2 publication Critical patent/JP7350029B2/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2021099596A 2021-06-15 2021-06-15 搬送装置及び成膜装置 Active JP7350029B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2021099596A JP7350029B2 (ja) 2021-06-15 2021-06-15 搬送装置及び成膜装置
KR1020220070143A KR20220168159A (ko) 2021-06-15 2022-06-09 반송 장치 및 성막 장치
CN202210659287.3A CN115478256B (zh) 2021-06-15 2022-06-13 输送装置以及成膜装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021099596A JP7350029B2 (ja) 2021-06-15 2021-06-15 搬送装置及び成膜装置

Publications (2)

Publication Number Publication Date
JP2022191003A JP2022191003A (ja) 2022-12-27
JP7350029B2 true JP7350029B2 (ja) 2023-09-25

Family

ID=84420529

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021099596A Active JP7350029B2 (ja) 2021-06-15 2021-06-15 搬送装置及び成膜装置

Country Status (3)

Country Link
JP (1) JP7350029B2 (zh)
KR (1) KR20220168159A (zh)
CN (1) CN115478256B (zh)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005116878A (ja) 2003-10-09 2005-04-28 Toshiba Corp 基板支持方法および基板支持装置
JP2009019243A (ja) 2007-07-12 2009-01-29 Hitachi Displays Ltd 蒸着方法および蒸着装置
JP2014040328A (ja) 2012-08-22 2014-03-06 Snu Precision Co Ltd ガイドローラー装置
JP2020518121A (ja) 2018-04-03 2020-06-18 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 真空チャンバ内でキャリアをアライメントするための装置、真空システム、ならびに真空チャンバ内でキャリアをアライメントする方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008265995A (ja) * 2007-04-24 2008-11-06 Sharp Corp 基板搬送装置及びこれを用いた基板処理装置
CN102751158B (zh) * 2008-03-25 2015-05-20 奥宝科技Lt太阳能有限公司 处理装置
KR100978853B1 (ko) * 2008-06-11 2010-08-31 세메스 주식회사 기판 이송 장치 및 그의 사이드 롤러 구동 방법
KR101899387B1 (ko) * 2011-11-16 2018-09-17 주식회사 케이씨텍 대면적 기판의 이송장치
JP2014070242A (ja) 2012-09-28 2014-04-21 Hitachi High-Technologies Corp 真空蒸着装置及び真空蒸着方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005116878A (ja) 2003-10-09 2005-04-28 Toshiba Corp 基板支持方法および基板支持装置
JP2009019243A (ja) 2007-07-12 2009-01-29 Hitachi Displays Ltd 蒸着方法および蒸着装置
JP2014040328A (ja) 2012-08-22 2014-03-06 Snu Precision Co Ltd ガイドローラー装置
JP2020518121A (ja) 2018-04-03 2020-06-18 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 真空チャンバ内でキャリアをアライメントするための装置、真空システム、ならびに真空チャンバ内でキャリアをアライメントする方法

Also Published As

Publication number Publication date
KR20220168159A (ko) 2022-12-22
CN115478256A (zh) 2022-12-16
JP2022191003A (ja) 2022-12-27
CN115478256B (zh) 2023-12-15

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