JP7289602B2 - 配線回路基板、および配線回路基板の製造方法 - Google Patents
配線回路基板、および配線回路基板の製造方法 Download PDFInfo
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- 238000000034 method Methods 0.000 title description 40
- 238000004519 manufacturing process Methods 0.000 title description 20
- 229910052751 metal Inorganic materials 0.000 claims description 349
- 239000002184 metal Substances 0.000 claims description 349
- 239000010409 thin film Substances 0.000 claims description 158
- 239000000758 substrate Substances 0.000 claims description 65
- 239000004020 conductor Substances 0.000 claims description 38
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 24
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 14
- 239000011651 chromium Substances 0.000 claims description 14
- 229910052802 copper Inorganic materials 0.000 claims description 14
- 239000010949 copper Substances 0.000 claims description 14
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 13
- 229910052804 chromium Inorganic materials 0.000 claims description 13
- 229910052759 nickel Inorganic materials 0.000 claims description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 9
- 239000010936 titanium Substances 0.000 claims description 9
- 229910052719 titanium Inorganic materials 0.000 claims description 9
- 239000010935 stainless steel Substances 0.000 claims description 8
- 229910001220 stainless steel Inorganic materials 0.000 claims description 8
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 7
- 229910052737 gold Inorganic materials 0.000 claims description 7
- 239000010931 gold Substances 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 4
- 230000000149 penetrating effect Effects 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 239000004332 silver Substances 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 209
- 239000010408 film Substances 0.000 description 24
- 239000000463 material Substances 0.000 description 19
- 238000005530 etching Methods 0.000 description 13
- 238000007747 plating Methods 0.000 description 13
- 239000000243 solution Substances 0.000 description 9
- 238000004544 sputter deposition Methods 0.000 description 9
- 238000001771 vacuum deposition Methods 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 238000001039 wet etching Methods 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000009713 electroplating Methods 0.000 description 6
- 239000011888 foil Substances 0.000 description 6
- 238000007772 electroless plating Methods 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- XMPZTFVPEKAKFH-UHFFFAOYSA-P ceric ammonium nitrate Chemical compound [NH4+].[NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O XMPZTFVPEKAKFH-UHFFFAOYSA-P 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- -1 polyethernitrile Polymers 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
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- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/05—Insulated conductive substrates, e.g. insulated metal substrate
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/423—Plated through-holes or plated via connections characterised by electroplating method
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- H—ELECTRICITY
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0296—Conductive pattern lay-out details not covered by sub groups H05K1/02 - H05K1/0295
- H05K1/0298—Multilayer circuits
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/11—Printed elements for providing electric connections to or between printed circuits
- H05K1/115—Via connections; Lands around holes or via connections
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4038—Through-connections; Vertical interconnect access [VIA] connections
- H05K3/4076—Through-connections; Vertical interconnect access [VIA] connections by thin-film techniques
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/429—Plated through-holes specially for multilayer circuits, e.g. having connections to inner circuit layers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4602—Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated
- H05K3/4608—Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated comprising an electrically conductive base or core
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4623—Manufacturing multilayer circuits by laminating two or more circuit boards the circuit boards having internal via connections between two or more circuit layers before lamination, e.g. double-sided circuit boards
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/05—Insulated conductive substrates, e.g. insulated metal substrate
- H05K1/056—Insulated conductive substrates, e.g. insulated metal substrate the metal substrate being covered by an organic insulating layer
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0338—Layered conductor, e.g. layered metal substrate, layered finish layer, layered thin film adhesion layer
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/388—Improvement of the adhesion between the insulating substrate and the metal by the use of a metallic or inorganic thin film adhesion layer
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/421—Blind plated via connections
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/465—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits by applying an insulating layer having channels for the next circuit layer
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Description
10 金属支持基板
11 金属支持層
12 表面金属層
21 第1金属薄膜
21b 開口部
22 絶縁層
22a,H 貫通孔
22b 内壁面
23,23A,23B 第2金属薄膜
24 導体層
24A 配線部
24B ビア部
24b 周側面
25 絶縁層
31 配線層
32 ビア
Claims (6)
- 金属支持基板と、第1金属薄膜と、絶縁層と、第2金属薄膜と、導体層とを、厚さ方向一方側に向かって順に備え、
前記金属支持基板は、金属支持層と、当該金属支持層の厚さ方向一方面上に配置され且つ前記金属支持層より導電率が高い表面金属層とを備え、
前記絶縁層は、当該絶縁層を厚さ方向に貫通する貫通孔を有し、
前記第2金属薄膜は、前記絶縁層の厚さ方向一方面上と、前記貫通孔の内壁面上と、前記第1金属薄膜において前記貫通孔に対向する部分上とに、連続して配置されており、
前記導体層は、前記貫通孔に配置され且つ前記金属支持基板と電気的に接続されているビア部を有し、当該ビア部が、前記第1金属薄膜および前記第2金属薄膜を介して前記金属支持基板と電気的に接続され、
前記第1金属薄膜および前記第2金属薄膜がクロムから形成されている、配線回路基板。 - 金属支持基板と、第1金属薄膜と、絶縁層と、第2金属薄膜と、導体層とを、厚さ方向一方側に向かって順に備え、
前記金属支持基板は、金属支持層と、当該金属支持層の厚さ方向一方面上に配置され且つ前記金属支持層より導電率が高い表面金属層とを備え、
前記絶縁層は、当該絶縁層を厚さ方向に貫通する貫通孔を有し、
前記第1金属薄膜が、前記貫通孔に沿って開口する開口部を有し、
前記導体層は、前記貫通孔に配置され且つ前記金属支持基板と電気的に接続されているビア部を有し、当該ビア部が、前記第2金属薄膜を介して前記金属支持基板と電気的に接続されている、配線回路基板。 - 前記金属支持層が、ステンレス鋼、銅合金、アルミニウム、ニッケル、およびチタンからなる群より選択される少なくとも一種を含む、請求項1または2に記載の配線回路基板。
- 前記表面金属層が、金、銀、および銅からなる群より選択される少なくとも一種を含む、請求項1から3のいずれか一つに記載の配線回路基板。
- 金属支持層と、当該金属支持層の厚さ方向一方面上に配置され且つ前記金属支持層より導電率が高い表面金属層と、を備える金属支持基板の厚さ方向一方面上に第1金属薄膜としてクロム層を形成する、第1金属薄膜形成工程と、
前記第1金属薄膜の厚さ方向一方面上に、貫通孔を有する絶縁層を形成する、絶縁層形成工程と、
前記絶縁層の厚さ方向一方面上、前記貫通孔の内壁面上、および、前記貫通孔にて露出している前記第1金属薄膜の部分の上に、第2金属薄膜としてクロム層を形成する、第2金属薄膜形成工程と、
前記第2金属薄膜の厚さ方向一方面上に、前記貫通孔に配置されるビア部を含む導体層を形成する、導体層形成工程と、を含む配線回路基板の製造方法。 - 金属支持層と、当該金属支持層の厚さ方向一方面上に配置され且つ前記金属支持層より導電率が高い表面金属層と、を備える金属支持基板の厚さ方向一方面上に第1金属薄膜を形成する、第1金属薄膜形成工程と、
前記第1金属薄膜の厚さ方向一方面上に貫通孔を有する絶縁層を形成する、絶縁層形成工程と、
前記貫通孔にて露出している前記第1金属薄膜の部分を除去し、前記貫通孔にて前記金属支持基板を露出させる、除去工程と、
前記絶縁層の厚さ方向一方面上、および、前記貫通孔にて露出している前記金属支持基板の部分の上に、第2金属薄膜を形成する、第2金属薄膜形成工程と、
前記第2金属薄膜の厚さ方向一方面上に、前記貫通孔に配置されるビア部を含む導体層を形成する、導体層形成工程と、を含む配線回路基板の製造方法。
Priority Applications (7)
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JP2020189117A JP7289602B2 (ja) | 2020-11-13 | 2020-11-13 | 配線回路基板、および配線回路基板の製造方法 |
KR1020237015106A KR20230106601A (ko) | 2020-11-13 | 2021-10-28 | 배선 회로 기판, 및 배선 회로 기판의 제조 방법 |
PCT/JP2021/039762 WO2022102416A1 (ja) | 2020-11-13 | 2021-10-28 | 配線回路基板、および配線回路基板の製造方法 |
US18/252,308 US20240015884A1 (en) | 2020-11-13 | 2021-10-28 | Wiring circuit board and method for producing wiring circuit board |
CN202180075586.6A CN116420431A (zh) | 2020-11-13 | 2021-10-28 | 布线电路基板和布线电路基板的制造方法 |
TW110141331A TW202226908A (zh) | 2020-11-13 | 2021-11-05 | 配線電路基板及配線電路基板之製造方法 |
JP2023035442A JP2023073270A (ja) | 2020-11-13 | 2023-03-08 | 配線回路基板、および配線回路基板の製造方法 |
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JP (2) | JP7289602B2 (ja) |
KR (1) | KR20230106601A (ja) |
CN (1) | CN116420431A (ja) |
TW (1) | TW202226908A (ja) |
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JP2000309887A (ja) | 1999-02-23 | 2000-11-07 | Mitsui Chemicals Inc | クロメート系防錆膜の除去方法および配線基板の製造方法 |
JP2012222047A (ja) | 2011-04-05 | 2012-11-12 | Sumitomo Electric Ind Ltd | プリント配線板およびそのプリント配線板の製造方法 |
JP2016045971A (ja) | 2014-08-21 | 2016-04-04 | 日東電工株式会社 | 回路付サスペンション基板の製造方法 |
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JPH01169990A (ja) * | 1987-12-24 | 1989-07-05 | Hitachi Cable Ltd | 表面実装用基板 |
JPH06101622B2 (ja) * | 1988-08-25 | 1994-12-12 | 松下電工株式会社 | プリント配線板の製造方法 |
JPH03133633A (ja) * | 1989-10-20 | 1991-06-06 | Nippon Steel Corp | 鉄系プリント基板に適した鋼板 |
JP4615427B2 (ja) | 2005-12-01 | 2011-01-19 | 日東電工株式会社 | 配線回路基板 |
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JP2012222047A (ja) | 2011-04-05 | 2012-11-12 | Sumitomo Electric Ind Ltd | プリント配線板およびそのプリント配線板の製造方法 |
JP2016045971A (ja) | 2014-08-21 | 2016-04-04 | 日東電工株式会社 | 回路付サスペンション基板の製造方法 |
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