JP7288480B2 - ワーク容器システム - Google Patents

ワーク容器システム Download PDF

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Publication number
JP7288480B2
JP7288480B2 JP2021080201A JP2021080201A JP7288480B2 JP 7288480 B2 JP7288480 B2 JP 7288480B2 JP 2021080201 A JP2021080201 A JP 2021080201A JP 2021080201 A JP2021080201 A JP 2021080201A JP 7288480 B2 JP7288480 B2 JP 7288480B2
Authority
JP
Japan
Prior art keywords
diffusion
container system
sheet member
work container
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2021080201A
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English (en)
Japanese (ja)
Other versions
JP2022058128A (ja
Inventor
チウ ミン－チエン
チョアン チア－ホー
シュエ シン－ミン
ウェン シン－ミン
リン シュー－フン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Gudeng Precision Industrial Co Ltd
Original Assignee
Gudeng Precision Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gudeng Precision Industrial Co Ltd filed Critical Gudeng Precision Industrial Co Ltd
Publication of JP2022058128A publication Critical patent/JP2022058128A/ja
Application granted granted Critical
Publication of JP7288480B2 publication Critical patent/JP7288480B2/ja
Active legal-status Critical Current
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/26—Drying gases or vapours
    • B01D53/268—Drying gases or vapours by diffusion
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/022—Metals
    • B01D71/0223—Group 8, 9 or 10 metals
    • B01D71/02232—Nickel
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Packaging Frangible Articles (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP2021080201A 2020-09-30 2021-05-11 ワーク容器システム Active JP7288480B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
TW109134304 2020-09-30
TW109134304 2020-09-30
US17/168,207 2021-02-05
US17/168,207 US20220100106A1 (en) 2020-09-30 2021-02-05 Workpiece container system

Publications (2)

Publication Number Publication Date
JP2022058128A JP2022058128A (ja) 2022-04-11
JP7288480B2 true JP7288480B2 (ja) 2023-06-07

Family

ID=80821157

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021080201A Active JP7288480B2 (ja) 2020-09-30 2021-05-11 ワーク容器システム

Country Status (5)

Country Link
US (1) US20220100106A1 (zh)
JP (1) JP7288480B2 (zh)
KR (1) KR102509762B1 (zh)
CN (1) CN114313545A (zh)
TW (1) TWI778561B (zh)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003257852A (ja) 2002-02-22 2003-09-12 Asml Netherlands Bv レチクルを保護する２部分カバーを用いるシステムおよび方法
JP2004071729A (ja) 2002-08-05 2004-03-04 Sendai Nikon:Kk レチクル保持方法、レチクル保持装置及び露光装置
WO2007074757A1 (ja) 2005-12-28 2007-07-05 Nikon Corporation レチクル搬送装置、露光装置、レチクル搬送方法、レチクルの処理方法、デバイス製造方法、及びレチクルカバーの管理方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7607543B2 (en) * 2005-02-27 2009-10-27 Entegris, Inc. Reticle pod with isolation system
WO2007038504A2 (en) * 2005-09-27 2007-04-05 Entegris, Inc. Reticle pod
US8776841B2 (en) * 2006-06-19 2014-07-15 Entegris, Inc. System for purging reticle storage
CN101726987A (zh) * 2008-10-13 2010-06-09 家登精密工业股份有限公司 掩膜清洁装置
TWI411563B (zh) * 2009-09-25 2013-10-11 Gudeng Prec Industral Co Ltd 光罩盒
GB2520989A (en) * 2013-12-06 2015-06-10 Mondelez Uk R & D Ltd Packaging
TWI542520B (zh) * 2014-02-27 2016-07-21 耀連科技有限公司 隔離式搬運盒
US9828168B2 (en) * 2014-07-03 2017-11-28 Carefusion Germany 326 Gmbh Storage container for automated dispensing of individual medicament portions
EP3504591B1 (en) * 2016-08-27 2022-05-11 Entegris, Inc. Reticle pod having side containment of reticle
KR102127783B1 (ko) * 2017-01-25 2020-06-30 구뎅 프리시젼 인더스트리얼 코포레이션 리미티드 Euv 레티클 포드
JP6796741B2 (ja) * 2017-07-21 2020-12-09 インテグリス・インコーポレーテッド レチクルを保持及び輸送するための、透明窓アセンブリを有する容器
CN108529012B (zh) * 2018-04-09 2019-12-20 侯来勇 一种自体组织干细胞离体应用恒温保存装置
US20210300635A1 (en) * 2020-03-24 2021-09-30 Gudeng Precision Industrial Co., Ltd Container system
US20220404696A1 (en) * 2021-06-18 2022-12-22 Entegris, Inc. Bonded layer on extreme ultraviolet plate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003257852A (ja) 2002-02-22 2003-09-12 Asml Netherlands Bv レチクルを保護する２部分カバーを用いるシステムおよび方法
JP2004071729A (ja) 2002-08-05 2004-03-04 Sendai Nikon:Kk レチクル保持方法、レチクル保持装置及び露光装置
WO2007074757A1 (ja) 2005-12-28 2007-07-05 Nikon Corporation レチクル搬送装置、露光装置、レチクル搬送方法、レチクルの処理方法、デバイス製造方法、及びレチクルカバーの管理方法

Also Published As

Publication number Publication date
US20220100106A1 (en) 2022-03-31
KR102509762B1 (ko) 2023-03-14
KR20220044076A (ko) 2022-04-06
JP2022058128A (ja) 2022-04-11
TW202215146A (zh) 2022-04-16
TWI778561B (zh) 2022-09-21
CN114313545A (zh) 2022-04-12

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