JP7285486B2 - 光反応性組成物 - Google Patents

光反応性組成物 Download PDF

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Publication number
JP7285486B2
JP7285486B2 JP2019547323A JP2019547323A JP7285486B2 JP 7285486 B2 JP7285486 B2 JP 7285486B2 JP 2019547323 A JP2019547323 A JP 2019547323A JP 2019547323 A JP2019547323 A JP 2019547323A JP 7285486 B2 JP7285486 B2 JP 7285486B2
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Prior art keywords
photoreactive composition
vinyl monomer
mol
composition according
test tube
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JP2019547323A
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English (en)
Japanese (ja)
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JPWO2020013213A1 (ja
JPWO2020013213A5 (zh
Inventor
章 中壽賀
智基 戸田
弘司 福井
幹敏 末松
勇樹 岩井
晃二 有光
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo University of Science
Sekisui Chemical Co Ltd
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Tokyo University of Science
Sekisui Chemical Co Ltd
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Publication of JPWO2020013213A5 publication Critical patent/JPWO2020013213A5/ja
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/34Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerization Catalysts (AREA)
JP2019547323A 2018-07-10 2019-07-10 光反応性組成物 Active JP7285486B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018130895 2018-07-10
JP2018130895 2018-07-10
PCT/JP2019/027249 WO2020013213A1 (ja) 2018-07-10 2019-07-10 光反応性組成物

Publications (3)

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JPWO2020013213A1 JPWO2020013213A1 (ja) 2021-05-20
JPWO2020013213A5 JPWO2020013213A5 (zh) 2022-04-26
JP7285486B2 true JP7285486B2 (ja) 2023-06-02

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JP2019547323A Active JP7285486B2 (ja) 2018-07-10 2019-07-10 光反応性組成物

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JP (1) JP7285486B2 (zh)
KR (1) KR20210030344A (zh)
CN (1) CN112384536A (zh)
TW (1) TW202016203A (zh)
WO (1) WO2020013213A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7446906B2 (ja) 2020-01-06 2024-03-11 桂盟企業股▲分▼有限公司 内リンクプレート

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7389788B2 (ja) * 2021-12-23 2023-11-30 エルジー ディスプレイ カンパニー リミテッド 硬化性組成物及びその成形品

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009069557A1 (ja) 2007-11-29 2009-06-04 Nissan Chemical Industries, Ltd. 3次元パターン形成材料
WO2011145750A1 (ja) 2010-05-20 2011-11-24 日立化成工業株式会社 感光性樹脂組成物、感光性フィルム、リブパターンの形成方法、中空構造とその形成方法及び電子部品
JP2015081308A (ja) 2013-10-23 2015-04-27 株式会社リコー 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェットインク組成物及び活性光線硬化型接着剤組成物
JP2018076447A (ja) 2016-11-10 2018-05-17 学校法人東京理科大学 光反応性組成物
JP2019044148A (ja) 2017-09-05 2019-03-22 株式会社エンプラス 光造形用組成物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02268874A (ja) * 1989-04-11 1990-11-02 Dainippon Toryo Co Ltd 多彩模様塗膜の形成方法
US5932625A (en) * 1997-05-30 1999-08-03 Dsm N.V. Photo-curable resin composition and process for preparing resin-basedmold
WO2009019979A1 (ja) * 2007-08-09 2009-02-12 Sekisui Chemical Co., Ltd. 光硬化性組成物
US8853290B2 (en) * 2009-06-08 2014-10-07 Sanyo Chemical Industries, Ltd. Photosensitive composition

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009069557A1 (ja) 2007-11-29 2009-06-04 Nissan Chemical Industries, Ltd. 3次元パターン形成材料
WO2011145750A1 (ja) 2010-05-20 2011-11-24 日立化成工業株式会社 感光性樹脂組成物、感光性フィルム、リブパターンの形成方法、中空構造とその形成方法及び電子部品
JP2015081308A (ja) 2013-10-23 2015-04-27 株式会社リコー 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェットインク組成物及び活性光線硬化型接着剤組成物
JP2018076447A (ja) 2016-11-10 2018-05-17 学校法人東京理科大学 光反応性組成物
JP2019044148A (ja) 2017-09-05 2019-03-22 株式会社エンプラス 光造形用組成物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7446906B2 (ja) 2020-01-06 2024-03-11 桂盟企業股▲分▼有限公司 内リンクプレート

Also Published As

Publication number Publication date
CN112384536A (zh) 2021-02-19
JPWO2020013213A1 (ja) 2021-05-20
TW202016203A (zh) 2020-05-01
KR20210030344A (ko) 2021-03-17
WO2020013213A1 (ja) 2020-01-16

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