JP7242642B2 - 投影リソグラフィ用の投影露光装置の光学系の光学コンポーネントとしてのミラーを製造する方法 - Google Patents
投影リソグラフィ用の投影露光装置の光学系の光学コンポーネントとしてのミラーを製造する方法 Download PDFInfo
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- JP7242642B2 JP7242642B2 JP2020515970A JP2020515970A JP7242642B2 JP 7242642 B2 JP7242642 B2 JP 7242642B2 JP 2020515970 A JP2020515970 A JP 2020515970A JP 2020515970 A JP2020515970 A JP 2020515970A JP 7242642 B2 JP7242642 B2 JP 7242642B2
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- mirror
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- gravitational acceleration
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q5/00—Driving or feeding mechanisms; Control arrangements therefor
- B23Q5/02—Driving main working members
- B23Q5/04—Driving main working members rotary shafts, e.g. working-spindles
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/62—Optical apparatus specially adapted for adjusting optical elements during the assembly of optical systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
- G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
- G02B7/1824—Manual alignment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
Description
Claims (3)
- 投影リソグラフィ用の投影露光装置(1)の光学系の光学コンポーネントとしてのミラー(M1~M10)を製造する方法において、
前記投影露光装置の予想使用場所における重力加速度の平均値を求めるステップと、
製造場所における前記重力加速度と前記重力加速度平均値との間の重力加速度差を求めるステップと、
前記ミラーの反射面(20)の目標表面形状を求めるステップと、
前記重力加速度平均値の影響下でのミラー基板(18)の前記反射面(20)の現在の表面形状と前記目標表面形状との間の偏差が所定の表面形状誤差量許容値(Pmax)より小さいように、前記重力加速度差を考慮して前記製造場所において前記ミラー基板(18)を加工するステップと
を含む方法。 - 請求項1に記載の方法において、前記重力加速度平均値の影響下で、前記反射面(20)の前記現在の表面形状と前記目標表面形状との間の前記偏差が前記表面形状誤差量許容値(Pmax)内にある否かを確認するために、
前記重力加速度平均値の影響下で前記ミラー(M1~M10)の使用位置において前記目標表面形状が生じるように前記ミラー(M1~M10)の前記反射面(20)が前記製造場所で有しなければならない目標見込み表面形状を計算するステップと、
前記ミラー基板(18)の前記反射面(20)の現在の表面形状と前記目標見込み表面形状との間の偏差が所定の表面形状誤差量見込み許容値より小さいように、前記製造場所において前記ミラー基板(18)を加工するステップと
の手順を踏む方法。 - 前記表面形状誤差許容値(P max )は、1nm未満の所定の値である、請求項1又は2に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102017216458.1A DE102017216458A1 (de) | 2017-09-18 | 2017-09-18 | Verfahren zur Herstellung eines Spiegels als optischer Komponente für ein optisches System einer Projektionsbelichtungsanlage für die Projektionslithographie |
DE102017216458.1 | 2017-09-18 | ||
PCT/EP2018/072597 WO2019052790A1 (en) | 2017-09-18 | 2018-08-22 | METHOD FOR MANUFACTURING A MIRROR AS AN OPTICAL COMPONENT FOR AN OPTICAL SYSTEM OF A PROJECTION EXPOSURE APPARATUS FOR PROJECTION LITHOGRAPHY |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020534576A JP2020534576A (ja) | 2020-11-26 |
JP7242642B2 true JP7242642B2 (ja) | 2023-03-20 |
Family
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JP2020515970A Active JP7242642B2 (ja) | 2017-09-18 | 2018-08-22 | 投影リソグラフィ用の投影露光装置の光学系の光学コンポーネントとしてのミラーを製造する方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US11092897B2 (ja) |
JP (1) | JP7242642B2 (ja) |
KR (1) | KR20200054976A (ja) |
DE (1) | DE102017216458A1 (ja) |
TW (1) | TWI798263B (ja) |
WO (1) | WO2019052790A1 (ja) |
Citations (7)
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JP2000292613A (ja) | 1999-04-06 | 2000-10-20 | Canon Inc | 光学素子 |
JP2003332200A (ja) | 2002-05-09 | 2003-11-21 | Nikon Corp | 光学系の測定方法、光学系の補正方法、光学系の評価方法、投影光学系の製造方法、及び投影光学系 |
DE102012212953A1 (de) | 2012-07-24 | 2013-06-06 | Carl Zeiss Smt Gmbh | Spiegelanordnung für eine Lithographieanlage |
JP2014123131A (ja) | 2004-12-23 | 2014-07-03 | Carl Zeiss Smt Gmbh | 遮光瞳を有する高開口率対物光学系 |
JP2014521204A (ja) | 2011-07-01 | 2014-08-25 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 個々に能動的に支持されたコンポーネントを有する光学結像装置 |
JP2014526792A (ja) | 2012-03-05 | 2014-10-06 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 振動遮断支持ユニットを有する光学結像装置 |
DE102016206113A1 (de) | 2016-04-13 | 2017-03-30 | Carl Zeiss Smt Gmbh | Spiegel, lithographieanlage und verfahren zum herstellen einer lithographieanlage |
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JP4717382B2 (ja) * | 2004-06-15 | 2011-07-06 | キヤノン株式会社 | 光学機器 |
CN103076723A (zh) | 2005-09-13 | 2013-05-01 | 卡尔蔡司Smt有限责任公司 | 微光刻投影光学系统 |
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DE102008049616B4 (de) * | 2008-09-30 | 2012-03-29 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die Mikrolithographie zur Herstellung von Halbleiterbauelementen |
US8092031B2 (en) * | 2009-03-03 | 2012-01-10 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Systems and methods for mirror mounting with minimized distortion |
DE102010029050A1 (de) | 2010-05-18 | 2011-03-31 | Carl Zeiss Smt Gmbh | Vergrößernde abbildende Optik sowie Metrologiesystem mit einer derartigen abbildenden Optik |
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DE102013214989A1 (de) | 2013-07-31 | 2014-08-14 | Carl Zeiss Smt Gmbh | Variabel einstellbare Spiegelanordnung mit Magnetaktuatoren |
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KR20180014740A (ko) | 2015-05-28 | 2018-02-09 | 칼 짜이스 에스엠테 게엠베하 | 대물 필드를 이미지 필드 내로 이미징하기 위한 이미징 광학 유닛, 및 이러한 이미징 광학 유닛을 포함하는 투영 노광 장치 |
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-
2017
- 2017-09-18 DE DE102017216458.1A patent/DE102017216458A1/de not_active Ceased
-
2018
- 2018-08-22 KR KR1020207007738A patent/KR20200054976A/ko not_active Application Discontinuation
- 2018-08-22 JP JP2020515970A patent/JP7242642B2/ja active Active
- 2018-08-22 WO PCT/EP2018/072597 patent/WO2019052790A1/en active Application Filing
- 2018-09-14 TW TW107132481A patent/TWI798263B/zh active
-
2020
- 2020-03-06 US US16/811,378 patent/US11092897B2/en active Active
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JP2000292613A (ja) | 1999-04-06 | 2000-10-20 | Canon Inc | 光学素子 |
JP2003332200A (ja) | 2002-05-09 | 2003-11-21 | Nikon Corp | 光学系の測定方法、光学系の補正方法、光学系の評価方法、投影光学系の製造方法、及び投影光学系 |
JP2014123131A (ja) | 2004-12-23 | 2014-07-03 | Carl Zeiss Smt Gmbh | 遮光瞳を有する高開口率対物光学系 |
JP2014521204A (ja) | 2011-07-01 | 2014-08-25 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 個々に能動的に支持されたコンポーネントを有する光学結像装置 |
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DE102012212953A1 (de) | 2012-07-24 | 2013-06-06 | Carl Zeiss Smt Gmbh | Spiegelanordnung für eine Lithographieanlage |
DE102016206113A1 (de) | 2016-04-13 | 2017-03-30 | Carl Zeiss Smt Gmbh | Spiegel, lithographieanlage und verfahren zum herstellen einer lithographieanlage |
Also Published As
Publication number | Publication date |
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US11092897B2 (en) | 2021-08-17 |
TW201921033A (zh) | 2019-06-01 |
DE102017216458A1 (de) | 2019-03-21 |
JP2020534576A (ja) | 2020-11-26 |
TWI798263B (zh) | 2023-04-11 |
US20200206855A1 (en) | 2020-07-02 |
KR20200054976A (ko) | 2020-05-20 |
WO2019052790A1 (en) | 2019-03-21 |
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