JP7056662B2 - 重合体、樹脂組成物、樹脂膜、パターン化樹脂膜の製造方法、および電子部品 - Google Patents
重合体、樹脂組成物、樹脂膜、パターン化樹脂膜の製造方法、および電子部品 Download PDFInfo
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- JP7056662B2 JP7056662B2 JP2019535030A JP2019535030A JP7056662B2 JP 7056662 B2 JP7056662 B2 JP 7056662B2 JP 2019535030 A JP2019535030 A JP 2019535030A JP 2019535030 A JP2019535030 A JP 2019535030A JP 7056662 B2 JP7056662 B2 JP 7056662B2
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
- C08L101/06—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing oxygen atoms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
- C08F212/22—Oxygen
- C08F212/24—Phenols or alcohols
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017155654 | 2017-08-10 | ||
| JP2017155654 | 2017-08-10 | ||
| JP2018049532 | 2018-03-16 | ||
| JP2018049532 | 2018-03-16 | ||
| PCT/JP2018/025282 WO2019031114A1 (fr) | 2017-08-10 | 2018-07-03 | Polymère, composition de résine, film de résine, procédé de production de film de résine à motifs, et composant électronique |
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| Publication Number | Publication Date |
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| JPWO2019031114A1 JPWO2019031114A1 (ja) | 2020-07-02 |
| JP7056662B2 true JP7056662B2 (ja) | 2022-04-19 |
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| JP2019535030A Active JP7056662B2 (ja) | 2017-08-10 | 2018-07-03 | 重合体、樹脂組成物、樹脂膜、パターン化樹脂膜の製造方法、および電子部品 |
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| JP (1) | JP7056662B2 (fr) |
| TW (1) | TW201910363A (fr) |
| WO (1) | WO2019031114A1 (fr) |
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| JPWO2021095766A1 (fr) * | 2019-11-12 | 2021-05-20 | ||
| JP7431696B2 (ja) | 2020-08-04 | 2024-02-15 | 信越化学工業株式会社 | ポジ型感光性樹脂組成物、ポジ型感光性ドライフィルム、ポジ型感光性ドライフィルムの製造方法、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品 |
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| JP2000275842A (ja) | 1999-03-26 | 2000-10-06 | Hitachi Chem Co Ltd | ポジ型感光性樹脂組成物、パターンの製造法及び電子部品 |
| JP2005266049A (ja) | 2004-03-17 | 2005-09-29 | Toray Ind Inc | ポジ型感放射線性組成物 |
| JP2007506999A (ja) | 2003-09-25 | 2007-03-22 | スマート ホログラムズ リミテッド | ホログラフィックセンサを含む眼科装置 |
| WO2012118686A2 (fr) | 2011-02-28 | 2012-09-07 | Coopervision International Holding Company, Lp | Lentilles de contact en hydrogel de silicone |
| WO2012160975A1 (fr) | 2011-05-20 | 2012-11-29 | 日産化学工業株式会社 | Composition de résine photosensible |
| JP2014063038A (ja) | 2012-09-21 | 2014-04-10 | Shin Etsu Chem Co Ltd | レジスト保護膜材料及びパターン形成方法 |
| JP2014063045A (ja) | 2012-09-21 | 2014-04-10 | Shin Etsu Chem Co Ltd | レジスト材料及びこれを用いたパターン形成方法 |
| JP2014081502A (ja) | 2012-10-17 | 2014-05-08 | Shin Etsu Chem Co Ltd | ポジ型レジスト材料及びこれを用いたパターン形成方法 |
| JP2014137454A (ja) | 2013-01-16 | 2014-07-28 | Jsr Corp | ポジ型感放射線性樹脂組成物、硬化膜及びその形成方法、半導体素子、並びに表示素子 |
| JP2014152192A (ja) | 2013-02-05 | 2014-08-25 | Jsr Corp | 硬化膜形成用熱硬化性樹脂組成物、硬化膜形成用感放射線性樹脂組成物、硬化膜、その形成方法、半導体素子及び表示素子 |
| JP2017082173A (ja) | 2015-10-30 | 2017-05-18 | Jsr株式会社 | 硬化膜形成用樹脂材料、硬化膜の形成方法、硬化膜、半導体素子及び表示素子 |
| JP2017107024A (ja) | 2015-12-08 | 2017-06-15 | Jsr株式会社 | 感放射線性樹脂組成物、硬化膜の形成方法、硬化膜、半導体素子及び表示素子 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08119822A (ja) * | 1994-10-20 | 1996-05-14 | Sogo Shika Iryo Kenkyusho:Kk | 歯科用接着性根管充填材料 |
-
2018
- 2018-07-03 WO PCT/JP2018/025282 patent/WO2019031114A1/fr active Application Filing
- 2018-07-03 JP JP2019535030A patent/JP7056662B2/ja active Active
- 2018-07-19 TW TW107124995A patent/TW201910363A/zh unknown
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000275842A (ja) | 1999-03-26 | 2000-10-06 | Hitachi Chem Co Ltd | ポジ型感光性樹脂組成物、パターンの製造法及び電子部品 |
| JP2007506999A (ja) | 2003-09-25 | 2007-03-22 | スマート ホログラムズ リミテッド | ホログラフィックセンサを含む眼科装置 |
| JP2005266049A (ja) | 2004-03-17 | 2005-09-29 | Toray Ind Inc | ポジ型感放射線性組成物 |
| WO2012118686A2 (fr) | 2011-02-28 | 2012-09-07 | Coopervision International Holding Company, Lp | Lentilles de contact en hydrogel de silicone |
| WO2012160975A1 (fr) | 2011-05-20 | 2012-11-29 | 日産化学工業株式会社 | Composition de résine photosensible |
| JP2014063038A (ja) | 2012-09-21 | 2014-04-10 | Shin Etsu Chem Co Ltd | レジスト保護膜材料及びパターン形成方法 |
| JP2014063045A (ja) | 2012-09-21 | 2014-04-10 | Shin Etsu Chem Co Ltd | レジスト材料及びこれを用いたパターン形成方法 |
| JP2014081502A (ja) | 2012-10-17 | 2014-05-08 | Shin Etsu Chem Co Ltd | ポジ型レジスト材料及びこれを用いたパターン形成方法 |
| JP2014137454A (ja) | 2013-01-16 | 2014-07-28 | Jsr Corp | ポジ型感放射線性樹脂組成物、硬化膜及びその形成方法、半導体素子、並びに表示素子 |
| JP2014152192A (ja) | 2013-02-05 | 2014-08-25 | Jsr Corp | 硬化膜形成用熱硬化性樹脂組成物、硬化膜形成用感放射線性樹脂組成物、硬化膜、その形成方法、半導体素子及び表示素子 |
| JP2017082173A (ja) | 2015-10-30 | 2017-05-18 | Jsr株式会社 | 硬化膜形成用樹脂材料、硬化膜の形成方法、硬化膜、半導体素子及び表示素子 |
| JP2017107024A (ja) | 2015-12-08 | 2017-06-15 | Jsr株式会社 | 感放射線性樹脂組成物、硬化膜の形成方法、硬化膜、半導体素子及び表示素子 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2019031114A1 (ja) | 2020-07-02 |
| TW201910363A (zh) | 2019-03-16 |
| WO2019031114A1 (fr) | 2019-02-14 |
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