JP7037168B2 - ガラス基板の残留応力低減方法及びガラス基板の残留応力低減装置 - Google Patents

ガラス基板の残留応力低減方法及びガラス基板の残留応力低減装置 Download PDF

Info

Publication number
JP7037168B2
JP7037168B2 JP2017171034A JP2017171034A JP7037168B2 JP 7037168 B2 JP7037168 B2 JP 7037168B2 JP 2017171034 A JP2017171034 A JP 2017171034A JP 2017171034 A JP2017171034 A JP 2017171034A JP 7037168 B2 JP7037168 B2 JP 7037168B2
Authority
JP
Japan
Prior art keywords
glass substrate
laser
residual stress
heating
cooling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2017171034A
Other languages
English (en)
Japanese (ja)
Other versions
JP2019043824A (ja
Inventor
恵輔 八幡
晃一 小田
政直 村上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsuboshi Diamond Industrial Co Ltd
Original Assignee
Mitsuboshi Diamond Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsuboshi Diamond Industrial Co Ltd filed Critical Mitsuboshi Diamond Industrial Co Ltd
Priority to JP2017171034A priority Critical patent/JP7037168B2/ja
Priority to KR1020180079021A priority patent/KR20190027310A/ko
Priority to CN201810775790.9A priority patent/CN109455916B/zh
Priority to TW107126219A priority patent/TWI779068B/zh
Publication of JP2019043824A publication Critical patent/JP2019043824A/ja
Application granted granted Critical
Publication of JP7037168B2 publication Critical patent/JP7037168B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B29/00—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B25/00—Annealing glass products
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Laser Beam Processing (AREA)
  • Surface Treatment Of Glass (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
JP2017171034A 2017-09-06 2017-09-06 ガラス基板の残留応力低減方法及びガラス基板の残留応力低減装置 Active JP7037168B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2017171034A JP7037168B2 (ja) 2017-09-06 2017-09-06 ガラス基板の残留応力低減方法及びガラス基板の残留応力低減装置
KR1020180079021A KR20190027310A (ko) 2017-09-06 2018-07-06 유리 기판의 잔류 응력 저감 방법 및 유리 기판의 잔류 응력 저감 장치
CN201810775790.9A CN109455916B (zh) 2017-09-06 2018-07-16 玻璃基板的残余应力降低方法及残余应力降低装置
TW107126219A TWI779068B (zh) 2017-09-06 2018-07-27 降低玻璃基板之殘留應力之方法及降低玻璃基板之殘留應力之裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017171034A JP7037168B2 (ja) 2017-09-06 2017-09-06 ガラス基板の残留応力低減方法及びガラス基板の残留応力低減装置

Publications (2)

Publication Number Publication Date
JP2019043824A JP2019043824A (ja) 2019-03-22
JP7037168B2 true JP7037168B2 (ja) 2022-03-16

Family

ID=65606373

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017171034A Active JP7037168B2 (ja) 2017-09-06 2017-09-06 ガラス基板の残留応力低減方法及びガラス基板の残留応力低減装置

Country Status (4)

Country Link
JP (1) JP7037168B2 (zh)
KR (1) KR20190027310A (zh)
CN (1) CN109455916B (zh)
TW (1) TWI779068B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW202114952A (zh) * 2019-09-30 2021-04-16 日商三星鑽石工業股份有限公司 玻璃基板之端面處理方法、及玻璃基板之端面處理裝置
CN115734952A (zh) * 2020-03-02 2023-03-03 西班牙高等科研理事会 玻璃材料的改性方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003015976A1 (fr) 2001-08-10 2003-02-27 Mitsuboshi Diamond Industrial Co., Ltd. Procede et dispositif de chanfreinage de materiau friable
JP2009035433A (ja) 2007-07-31 2009-02-19 Asahi Glass Co Ltd ガラス基板の面取り方法および装置、面取りされたガラス基板
JP2010501456A (ja) 2006-08-21 2010-01-21 コーニング インコーポレイテッド ガラス板の残留応力低減熱エッジ仕上用プロセス及び装置
JP2010519164A (ja) 2007-02-23 2010-06-03 コーニング インコーポレイテッド 熱的エッジ仕上げ
JP2016520501A (ja) 2013-03-15 2016-07-14 キネストラル テクノロジーズ，インク． レーザ切断強化ガラス

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL169811C (nl) 1975-10-03 1982-08-16 Philips Nv Beeldregelsynchronisatieschakeling, alsmede televisieontvanger daarvan voorzien.
JPH06144875A (ja) 1992-11-11 1994-05-24 Mitsuboshi Daiyamondo Kogyo Kk ガラス基板に発生するクラックの防止方法
JP2597464B2 (ja) * 1994-03-29 1997-04-09 株式会社ジーティシー レーザアニール装置
WO2007094160A1 (ja) * 2006-02-15 2007-08-23 Asahi Glass Company, Limited ガラス基板の面取り方法および装置
CN102442769A (zh) * 2010-09-30 2012-05-09 旭硝子株式会社 玻璃基板的倒棱方法及装置
KR20140062427A (ko) * 2011-09-15 2014-05-23 니폰 덴키 가라스 가부시키가이샤 유리판 절단 방법
US9365446B2 (en) * 2012-05-14 2016-06-14 Richard Green Systems and methods for altering stress profiles of glass
AT13206U1 (de) * 2012-07-17 2013-08-15 Lisec Maschb Gmbh Verfahren und Anordnung zum Teilen von Flachglas
JP6324719B2 (ja) * 2013-12-27 2018-05-16 三星ダイヤモンド工業株式会社 ガラス基板の面取り方法及びレーザ加工装置
CN106552996A (zh) * 2015-09-24 2017-04-05 武汉吉事达激光设备有限公司 玻璃激光倒角方法及设备

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003015976A1 (fr) 2001-08-10 2003-02-27 Mitsuboshi Diamond Industrial Co., Ltd. Procede et dispositif de chanfreinage de materiau friable
JP2010501456A (ja) 2006-08-21 2010-01-21 コーニング インコーポレイテッド ガラス板の残留応力低減熱エッジ仕上用プロセス及び装置
JP2010519164A (ja) 2007-02-23 2010-06-03 コーニング インコーポレイテッド 熱的エッジ仕上げ
JP2009035433A (ja) 2007-07-31 2009-02-19 Asahi Glass Co Ltd ガラス基板の面取り方法および装置、面取りされたガラス基板
JP2016520501A (ja) 2013-03-15 2016-07-14 キネストラル テクノロジーズ，インク． レーザ切断強化ガラス

Also Published As

Publication number Publication date
TWI779068B (zh) 2022-10-01
CN109455916A (zh) 2019-03-12
KR20190027310A (ko) 2019-03-14
JP2019043824A (ja) 2019-03-22
CN109455916B (zh) 2022-09-06
TW201912594A (zh) 2019-04-01

Similar Documents

Publication Publication Date Title
TWI629249B (zh) Method for cutting tempered glass sheets
JP5879106B2 (ja) 脆性材料基板のスクライブ方法
JP2018535912A (ja) 透明材料のレーザ加工方法および装置
JP6931918B2 (ja) ガラス基板の端面処理方法及びガラス基板の端面処理装置
TWI637922B (zh) 玻璃基板之倒角方法及雷射加工裝置
WO2006038565A1 (ja) 脆性材料のスクライブ方法およびスクライブ装置
KR101309803B1 (ko) 레이저 드릴링 장치 및 레이저 드릴링 방법
JP7037168B2 (ja) ガラス基板の残留応力低減方法及びガラス基板の残留応力低減装置
JP4134033B2 (ja) 脆性材料基板のスクライブ装置及びスクライブ方法
JP5536713B2 (ja) 脆性材料基板の加工方法
JP7037167B2 (ja) ガラス基板の残留応力低減方法及びガラス基板の残留応力低減装置
JP6931919B2 (ja) ガラス基板の残留応力低減方法及びガラス基板の残留応力低減装置
JP6889922B2 (ja) ガラス基板の残留応力低減方法及びガラス基板の残留応力低減装置
TWI587960B (zh) Laser processing method and laser processing device
JP2008156191A (ja) ガラス板およびガラス板の強化方法
US20230010132A1 (en) Glass substrate joining method
JP2014177369A (ja) 強化ガラス部材の製造方法
KR20040046421A (ko) 레이저를 이용한 취성재료 절단장치 및 방법
JP7456604B2 (ja) スクライブ加工方法及びスクライブ加工装置
JP2023079907A (ja) 基板の切断方法、及び、基板小片の製造方法
TW202114952A (zh) 玻璃基板之端面處理方法、及玻璃基板之端面處理裝置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20200819

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20210728

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20210824

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20211014

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20220222

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20220225

R150 Certificate of patent or registration of utility model

Ref document number: 7037168

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150