JP6970141B2 - 光源内の外乱の補償 - Google Patents
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- H01S3/02—Constructional details
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Description
Claims (20)
- パルス光ビームに関連付けられた中心波長と、前記パルス光ビームの第1の複数のパルスの実際の波長とに基づく、前記パルス光ビームの第1の波長エラーを決定することと、
光源内のファンによって引き起こされる外乱の周波数を決定することであって、前記周波数は前記パルス光ビームの時間繰り返し率に伴って変動するエイリアシングされた周波数であることと、
前記エイリアシングされた周波数に基づく補正を前記パルス光ビームに適用することと、
前記中心波長と、前記補正が前記パルス光ビームに適用された後に生じる前記パルス光ビームの第2の複数のパルスの実際の波長とに基づく、前記パルス光ビームの第2の波長エラーを決定することと、を含む方法であって、
前記第2の波長エラーの変動が、前記第1の波長エラーの変動より小さい、
方法。 - 前記パルス光ビームに補正を適用することは、前記エイリアシングされた周波数に基づく補正波形を決定することを含む、請求項1に記載の方法。
- 前記パルス光ビームに補正を適用することは、前記光源内を伝搬する光と相互作用するように位置決めされた光学素子を含む光学アセンブリに前記決定された補正波形を適用することを含み、前記光学アセンブリに対する前記補正波形の適用は、前記光学素子を移動させるために十分な適用である、請求項2に記載の方法。
- 前記補正波形は、前記外乱の振幅と実質的に同一の振幅を含み、かつ、前記外乱の位相に対してシフトされた位相を含む、請求項2に記載の方法。
- 前記補正波形の前記位相は、前記外乱の前記位相に対して180度シフトされる、請求項4に記載の方法。
- 前記外乱は、互いに異なる別個の複数の周波数を含む、請求項1に記載の方法。
- 前記複数の周波数は、基本周波数と、該基本周波数の1つまたは複数の高調波とを含む、請求項6に記載の方法。
- 前記第1の複数のパルスおよび前記第2の複数のパルスは、同じ数のパルスを含む、請求項1に記載の方法。
- 前記中心波長は、前記パルス光ビームにおける前記パルスの名目上の波長であり、
前記第1の波長エラーは、前記第1の複数のパルスにおける各々の前記パルスの前記実際の波長と、前記中心波長との間の差を含み、
前記第2の波長エラーは、前記第2の複数のパルスにおける各々の前記パルスの前記実際の波長と、前記中心波長との間の差を含む、請求項1に記載の方法。 - 前記第1の波長エラーの前記変動は、前記第1の波長エラーの標準偏差を含み、前記第2の波長エラーの前記変動は、前記第2の波長エラーの標準偏差を含む、請求項9に記載の方法。
- 前記第1の複数のパルスにおける各パルスの前記実際の波長を測定データに基づいて決定することと、
前記第2の複数のパルスにおける各パルスの前記実際の波長を測定データに基づいて決定することと、をさらに含む、請求項9に記載の方法。 - パルス光ビームを生成するように構成された光源であって、前記パルス光ビームは中心波長に関連付けられ、前記光源は、チャンバと、前記チャンバ内のガス状利得媒体と、少なくとも1つの光学素子を含む光学アセンブリと、前記チャンバ内で前記ガス状利得媒体を循環させるように構成されたファンとを備える、光源と、
前記光源と通信するように構成された制御システムと、を備えるシステムであって、
前記制御システムは、
前記中心波長と、パルス光ビームの第1の複数のパルスの実際の波長とに基づく、前記パルス光ビームの第1の波長エラーを決定することと、
前記光源内の前記ファンによって引き起こされる外乱の周波数を決定することであって、前記周波数は前記パルス光ビームの時間繰り返し率に伴って変動するエイリアシングされた周波数であることと、
前記エイリアシングされた周波数に基づく補正を前記パルス光ビームに適用することと、
前記中心波長と、前記補正が前記パルス光ビームに適用された後に生じる前記パルス光ビームの第2の複数のパルスの実際の波長とに基づく、前記パルス光ビームの第2の波長エラーを決定することと、を行うように動作可能であり、
前記第2の波長エラーの変動が、前記第1の波長エラーの変動より小さい、
システム。 - ライン中心解析モジュールをさらに備え、前記ライン中心解析モジュールは、前記パルス光ビームにおけるパルスの波長を測定するように構成される、請求項12に記載のシステム。
- 前記制御システムは、前記ライン中心解析モジュールから、前記第1の複数のパルスにおける前記パルスの波長が示されることに基づいて、前記第1の複数のパルスの前記実際の波長を決定するように動作可能であり、かつ、前記制御システムは、前記ライン中心解析モジュールから、2度目に前記パルス光ビームの波長が示されることに基づいて、前記第2の複数のパルスの前記第2の実際の波長を決定するように動作可能である、請求項13に記載のシステム。
- 前記制御システムが前記パルス光ビームに補正を適用するように動作可能であることは、前記制御システムが前記光源の前記光学アセンブリに補正波形を適用するように動作可能であることを含み、前記補正波形は、前記光学アセンブリの前記少なくとも1つの光学素子を移動させるために十分なものである、請求項12に記載のシステム。
- 前記少なくとも1つの光学素子は、プリズムを含む、請求項15に記載のシステム。
- 前記制御システムと通信するように構成されたリソグラフィ露光装置をさらに備える、請求項12に記載のシステム。
- 前記ファンは、角周波数で回転するように構成され、前記光源内の前記外乱は、前記ファンの前記回転と関連付けられる、請求項12に記載のシステム。
- 前記外乱は、互いに異なる別個の複数の周波数を含む、請求項12に記載のシステム。
- 光源のための制御システムであって、
1つまたは複数の電子プロセッサと、
コンピュータ読取り可能な非一時的記憶媒体と、を備え、
前記媒体は命令を含み、前記命令は、実行されると、前記1つまたは複数の電子プロセッサに、
パルス光ビームの中心波長と、前記パルス光ビームの第1の複数のパルスの実際の波長とに基づく、前記パルス光ビームの第1の波長エラーを決定することと、
前記光源内のファンによって引き起こされる外乱の周波数を決定することであって、前記周波数は前記パルス光ビームの時間繰り返し率に伴って変動するエイリアシングされた周波数であることと、
前記エイリアシングされた周波数に基づく補正を前記パルス光ビームに適用することと、
前記中心波長と、前記補正が前記パルス光ビームに適用された後に生じる前記パルス光ビームの第2の複数のパルスの実際の波長とに基づく、前記パルス光ビームの第2の波長エラーを決定することと、を実行させ、
前記第2の波長エラーの変動が、前記第1の波長エラーの変動より小さい、
制御システム。
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US14/565,016 US9261794B1 (en) | 2014-12-09 | 2014-12-09 | Compensation for a disturbance in an optical source |
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US9261794B1 (en) * | 2014-12-09 | 2016-02-16 | Cymer, Llc | Compensation for a disturbance in an optical source |
JP6333799B2 (ja) * | 2015-12-04 | 2018-05-30 | ファナック株式会社 | レーザ発振器を制御する制御装置 |
US10036963B2 (en) * | 2016-09-12 | 2018-07-31 | Cymer, Llc | Estimating a gain relationship of an optical source |
US9997888B2 (en) * | 2016-10-17 | 2018-06-12 | Cymer, Llc | Control of a spectral feature of a pulsed light beam |
US11081852B2 (en) * | 2017-04-24 | 2021-08-03 | Cymer, Llc | Laser light energy and dose control using repetition rate based gain estimators |
US10234769B2 (en) * | 2017-05-22 | 2019-03-19 | Cymer, Llc | Monitoring system for an optical lithography system |
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US20160161859A1 (en) | 2016-06-09 |
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US9261794B1 (en) | 2016-02-16 |
CN107003622A (zh) | 2017-08-01 |
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JP6538843B2 (ja) | 2019-07-03 |
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CN107003622B (zh) | 2019-08-30 |
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