SG11201703971VA - Compensation for a disturbance in an optical source - Google Patents
Compensation for a disturbance in an optical sourceInfo
- Publication number
- SG11201703971VA SG11201703971VA SG11201703971VA SG11201703971VA SG11201703971VA SG 11201703971V A SG11201703971V A SG 11201703971VA SG 11201703971V A SG11201703971V A SG 11201703971VA SG 11201703971V A SG11201703971V A SG 11201703971VA SG 11201703971V A SG11201703971V A SG 11201703971VA
- Authority
- SG
- Singapore
- Prior art keywords
- disturbance
- compensation
- optical source
- optical
- source
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/104—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/09705—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser with particular means for stabilising the discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10069—Memorized or pre-programmed characteristics, e.g. look-up table [LUT]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
- H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/139—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
- H01S3/2251—ArF, i.e. argon fluoride is comprised for lasing around 193 nm
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
- H01S3/2256—KrF, i.e. krypton fluoride is comprised for lasing around 248 nm
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/02—ASE (amplified spontaneous emission), noise; Reduction thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/136—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity
- H01S3/137—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity for stabilising of frequency
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lasers (AREA)
- General Physics & Mathematics (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/565,016 US9261794B1 (en) | 2014-12-09 | 2014-12-09 | Compensation for a disturbance in an optical source |
PCT/US2015/063802 WO2016094193A1 (en) | 2014-12-09 | 2015-12-03 | Compensation for a disturbance in an optical source |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201703971VA true SG11201703971VA (en) | 2017-06-29 |
Family
ID=55275394
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201703971VA SG11201703971VA (en) | 2014-12-09 | 2015-12-03 | Compensation for a disturbance in an optical source |
Country Status (7)
Country | Link |
---|---|
US (2) | US9261794B1 (en) |
JP (2) | JP6538843B2 (en) |
KR (2) | KR101935303B1 (en) |
CN (2) | CN107003622B (en) |
SG (1) | SG11201703971VA (en) |
TW (2) | TWI752676B (en) |
WO (1) | WO2016094193A1 (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9261794B1 (en) * | 2014-12-09 | 2016-02-16 | Cymer, Llc | Compensation for a disturbance in an optical source |
JP6333799B2 (en) * | 2015-12-04 | 2018-05-30 | ファナック株式会社 | Control device for controlling laser oscillator |
US10036963B2 (en) * | 2016-09-12 | 2018-07-31 | Cymer, Llc | Estimating a gain relationship of an optical source |
US9997888B2 (en) * | 2016-10-17 | 2018-06-12 | Cymer, Llc | Control of a spectral feature of a pulsed light beam |
US11081852B2 (en) * | 2017-04-24 | 2021-08-03 | Cymer, Llc | Laser light energy and dose control using repetition rate based gain estimators |
US10234769B2 (en) * | 2017-05-22 | 2019-03-19 | Cymer, Llc | Monitoring system for an optical lithography system |
US10050407B1 (en) * | 2017-07-12 | 2018-08-14 | Raytheon Company | Cavity stabilized laser drift compensation |
KR102158044B1 (en) * | 2019-01-16 | 2020-09-21 | 국방과학연구소 | Spectrally beam combined laser system, Method for controlling the same, and Computer readable storage medium having the method |
WO2020157839A1 (en) * | 2019-01-29 | 2020-08-06 | ギガフォトン株式会社 | Laser apparatus wavelength control method and method for manufacturing electronic device |
KR102530873B1 (en) * | 2019-02-25 | 2023-05-09 | 사이머 엘엘씨 | Optical Elements for Deep Ultraviolet Light Sources |
CN114144731B (en) | 2019-07-23 | 2024-04-09 | 西默有限公司 | Method for compensating wavelength error caused by repetition rate deviation |
WO2021091730A1 (en) * | 2019-11-08 | 2021-05-14 | Cymer, Llc | A radiation system for controlling bursts of pulses of radiation |
CN113783100B (en) * | 2021-05-31 | 2023-04-11 | 北京科益虹源光电技术有限公司 | Energy compensation method and device of laser |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
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CA1313688C (en) * | 1987-10-28 | 1993-02-16 | Hitsoshi Wakata | Method of stabilizing a wavelength of a laser beam and wavelength stabilizing laser device |
US6026418A (en) * | 1996-10-28 | 2000-02-15 | Mcdonnell Douglas Corporation | Frequency measurement method and associated apparatus |
US6621846B1 (en) * | 1997-07-22 | 2003-09-16 | Cymer, Inc. | Electric discharge laser with active wavelength chirp correction |
WO2001008205A1 (en) * | 1999-07-23 | 2001-02-01 | Nikon Corporation | Exposure method, exposure system, light source, and method of device manufacture |
US6532247B2 (en) * | 2000-02-09 | 2003-03-11 | Cymer, Inc. | Laser wavelength control unit with piezoelectric driver |
US6650666B2 (en) * | 2000-02-09 | 2003-11-18 | Cymer, Inc. | Laser wavelength control unit with piezoelectric driver |
JP2001257406A (en) * | 2000-03-10 | 2001-09-21 | Nikon Corp | Absolute wavelength stabilizing method of excimer laser, stabilizer and aligner |
KR100545294B1 (en) * | 2002-05-10 | 2006-01-24 | 에이에스엠엘 네델란즈 비.브이. | Lithographic Apparatus, Device Manufacturing Method, Performance Measuring Method, Calibration Method and Computer Program |
JP2004111670A (en) * | 2002-09-19 | 2004-04-08 | Semiconductor Energy Lab Co Ltd | Laser device, laser irradiating method, semiconductor device, or manufacturing method thereof |
TWI304157B (en) * | 2002-11-27 | 2008-12-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
US7471708B2 (en) * | 2005-03-31 | 2008-12-30 | Cymer, Inc. | Gas discharge laser output light beam parameter control |
US20060222034A1 (en) | 2005-03-31 | 2006-10-05 | Cymer, Inc. | 6 Khz and above gas discharge laser system |
KR101302244B1 (en) * | 2005-07-01 | 2013-09-02 | 가부시키가이샤 니콘 | Exposure apparatus, exposure method, device manufacturing method, and system |
US7852889B2 (en) * | 2006-02-17 | 2010-12-14 | Cymer, Inc. | Active spectral control of DUV light source |
US8530871B2 (en) * | 2007-07-13 | 2013-09-10 | Cymer, Llc | Laser produced plasma EUV light source |
US7368207B2 (en) * | 2006-03-31 | 2008-05-06 | Eastman Kodak Company | Dynamic compensation system for maskless lithography |
JP5092604B2 (en) * | 2006-10-30 | 2012-12-05 | 日産自動車株式会社 | Vibration reduction device |
CN101022310A (en) * | 2007-02-16 | 2007-08-22 | 浙江大学 | Light source strength noise suppressing device based on high-speed light attenuator switch and method thereof |
US8254420B2 (en) | 2009-11-18 | 2012-08-28 | Cymer, Inc. | Advanced laser wavelength control |
JP2014017809A (en) * | 2012-06-15 | 2014-01-30 | Canon Inc | Light-receiving circuit, driving device for vibration-type actuator, and system |
CN103076611B (en) * | 2013-01-09 | 2015-05-06 | 中国电子科技集团公司第十一研究所 | Method and device for measuring speed and distance by coherent detecting laser |
KR102529578B1 (en) * | 2014-08-29 | 2023-05-09 | (주)아모레퍼시픽 | Novel adamatan derivative compound |
US9261794B1 (en) * | 2014-12-09 | 2016-02-16 | Cymer, Llc | Compensation for a disturbance in an optical source |
-
2014
- 2014-12-09 US US14/565,016 patent/US9261794B1/en active Active
-
2015
- 2015-12-03 JP JP2017526683A patent/JP6538843B2/en active Active
- 2015-12-03 CN CN201580066989.9A patent/CN107003622B/en active Active
- 2015-12-03 CN CN201910744324.9A patent/CN110441995B/en active Active
- 2015-12-03 KR KR1020177015984A patent/KR101935303B1/en active IP Right Grant
- 2015-12-03 KR KR1020187037877A patent/KR102042023B1/en active IP Right Grant
- 2015-12-03 SG SG11201703971VA patent/SG11201703971VA/en unknown
- 2015-12-03 WO PCT/US2015/063802 patent/WO2016094193A1/en active Application Filing
- 2015-12-08 TW TW109135841A patent/TWI752676B/en active
- 2015-12-08 TW TW104141170A patent/TWI709822B/en active
-
2016
- 2016-02-03 US US15/014,149 patent/US9634460B2/en active Active
-
2019
- 2019-06-06 JP JP2019106342A patent/JP6970141B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
KR101935303B1 (en) | 2019-01-04 |
US9634460B2 (en) | 2017-04-25 |
JP6970141B2 (en) | 2021-11-24 |
TWI752676B (en) | 2022-01-11 |
JP2019176173A (en) | 2019-10-10 |
US9261794B1 (en) | 2016-02-16 |
TW202107225A (en) | 2021-02-16 |
CN107003622B (en) | 2019-08-30 |
KR20190002746A (en) | 2019-01-08 |
JP2017538963A (en) | 2017-12-28 |
KR102042023B1 (en) | 2019-11-07 |
WO2016094193A1 (en) | 2016-06-16 |
CN110441995B (en) | 2021-08-31 |
TW201626114A (en) | 2016-07-16 |
TWI709822B (en) | 2020-11-11 |
JP6538843B2 (en) | 2019-07-03 |
CN110441995A (en) | 2019-11-12 |
CN107003622A (en) | 2017-08-01 |
KR20170085078A (en) | 2017-07-21 |
US20160161859A1 (en) | 2016-06-09 |
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