JP6966036B2 - 有機太陽電池の製造方法 - Google Patents
有機太陽電池の製造方法 Download PDFInfo
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- JP6966036B2 JP6966036B2 JP2019549540A JP2019549540A JP6966036B2 JP 6966036 B2 JP6966036 B2 JP 6966036B2 JP 2019549540 A JP2019549540 A JP 2019549540A JP 2019549540 A JP2019549540 A JP 2019549540A JP 6966036 B2 JP6966036 B2 JP 6966036B2
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- solar cell
- organic solar
- photoactive layer
- drying
- electrode
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- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
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- H10K71/811—Controlling the atmosphere during processing
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- H10K71/10—Deposition of organic active material
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- H10K71/15—Deposition of organic active material using liquid deposition, e.g. spin coating characterised by the solvent used
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- H10K30/211—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising organic-organic junctions, e.g. donor-acceptor junctions comprising multiple junctions, e.g. double heterojunctions
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Description
[数式1]
η=FF*[Jsc*Voc/(照射される光の強度)]
(上記中、FFは充填率(充填因子)、Jscは光短絡電流密度、Vocは光開放電圧である)
下記化合物1で表される化合物とPCBM({(6,6)−phenyl−C61−butyric acid methylester)}]とを1:2の質量比でクロロベンゼン(Chlorobenzene、CB)に溶かして複合溶液(composite solution)を製造した。この時、前記化合物とPCBMとの複合溶液に対する濃度は3wt%に調節した。
ITO/ZnO/光活性層/MoO3/Agの構造を有する有機太陽電池を製造するために、ITOがstrip typeでコーティングされたガラス基板(117cm2)に対して、蒸留水、アセトン、2−プロパノールを用いて超音波洗浄し、ITO表面を10分間オゾン処理した。
前記基板上に45nmの厚さにZnOをバーコーティング(Bar−coating)し、100℃で10分間熱処理した。
前記第1電極上に前記複合溶液170μlをバーコーティング(Bar−coating)を利用してコーティングした。
前記複合溶液がコーティングされた積層体を600cm3の体積を有する閉鎖された乾燥空間(closed system)内に投入し、60℃で15分間乾燥した。
その後、3×10−8torrの真空下、熱蒸発器(thermal evaporator)を用いてMoO3を0.5Å/sの速度で10nm蒸着し、100nmの厚さに1Å/sの速度でAgを蒸着して、最終有機太陽電池を製造した。
[化合物1]
乾燥空間の体積が1300cm3であること以外は、前記実施例1と同様の方法で有機太陽電池を作製した。
乾燥空間の体積が150cm3であること以外は、前記実施例1と同様の方法で有機太陽電池を作製した。
乾燥空間が閉鎖された乾燥空間ではない、四方が開かれた大気中で乾燥させた以外は、前記実施例1と同様の方法で有機太陽電池を作製した。
102:第1電極
103:電子輸送層
104:光活性層
105:正孔輸送層
106:第2電極
Claims (7)
- 基板を準備するステップと、
前記基板上に第1電極を形成するステップと、
前記第1電極上に光活性物質および溶媒を含む溶液をコーティングして光活性層を形成するステップと、
前記光活性層を一定体積の閉鎖された乾燥空間(closed system)内で乾燥するステップと、
前記光活性層上に第2電極を形成するステップとを含み、
前記光活性物質は互いに相分離し得る電子供与体と電子受容体とを含み、
前記第1電極上にコーティングされた溶液の体積に対する前記乾燥空間の体積の比率は、1:1,000〜1:5,000であり、
前記第1電極上にコーティングされた溶液の体積は、基板の面積を基準として、0.1μl/cm2以上10μl/cm2以下であり、
前記光活性層を乾燥するステップの実行温度が30℃以上150℃以下であり、
前記光活性層を乾燥するステップの実行時間が5分〜30分であり、
前記溶媒は、クロロベンゼン、クロロホルム、オルトジクロロベンゼン、キシレン、トルエン、シクロヘキサン、および、2−メチルアニソールから選択され、
前記電子供与体は、下記化学式1で表される化合物であり、
前記電子受容体は、フラーレン(fullerene)、PCBM((6,6)−phenyl−C61−butyric acid methylester)、および、PCBC((6,6)−phenyl−C61−butyric acid−cholesteryl ester)から選択される、有機太陽電池の製造方法。
[化学式1]
- 前記乾燥空間は、不活性ガスを含むものである、請求項1に記載の有機太陽電池の製造方法。
- 前記不活性ガスは、アルゴン(Ar)または窒素(N2)である、請求項2に記載の有機太陽電池の製造方法。
- 前記乾燥空間内の相対湿度は、摂氏60℃で30%以下である、請求項1から3のいずれか一項に記載の有機太陽電池の製造方法。
- 前記コーティングの方法が、ディップコーティング、スクリーンプリンティング、スプレーコーティング、スロットダイ、バーコーター、ドクターブレード、およびブラシペインティングからなる群より選択されるいずれか1つである、請求項1から4のいずれか一項に記載の有機太陽電池の製造方法。
- 前記光活性物質は、全体溶液中、0.5重量%以上10重量%以下で含まれるものである、請求項1から5のいずれか一項に記載の有機太陽電池の製造方法。
- 前記溶液は、1,8−ジヨードオクタン(DIO:1,8−diiodooctane)、オクタンジチオール(octane dithiol)、ジフェニルエーテル(Diphenyl ether)、卜リクロロベンゼン(trichlorobenzene)、および1−クロロナフタレン(1−chloronaphthalene)からなる群より選択される1または2種以上の添加剤をさらに含むものである、請求項1から6のいずれか一項に記載の有機太陽電池の製造方法。
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